Author: Ken Ostrikov
Publisher: John Wiley & Sons
ISBN: 3527611568
Category : Technology & Engineering
Languages : en
Pages : 315

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Book Description
In this single work to cover the use of plasma as nanofabrication tool in sufficient depth internationally renowned authors with much experience in this important method of nanofabrication look at reactive plasma as a nanofabrication tool, plasma production and development of plasma sources, as well as such applications as carbon-based nanostructures, low-dimensional quantum confinement structures and hydroxyapatite bioceramics. Written principally for solid state physicists and chemists, materials scientists, and plasma physicists, the book concludes with the outlook for such applications.

Author: Kostya Ostrikov
Publisher: John Wiley & Sons
ISBN: 9783527407408
Category : Technology & Engineering
Languages : en
Pages : 572

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Book Description
Filling the need for a single work specifically addressing how to use plasma for the fabrication of nanoscale structures, this book is the first to cover plasma deposition in sufficient depth. The author has worked with numerous R&D institutions around the world, and here he begins with an introductory overview of plasma processing at micro- and nanoscales, as well as the current problems and challenges, before going on to address surface preparation, generation and diagnostics, transport and the manipulation of nano units.

Author: R. Mohan Sankaran
Publisher: CRC Press
ISBN: 1351832948
Category : Science
Languages : en
Pages : 433

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Book Description
We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

Author: Nong Moon Hwang
Publisher: Springer
ISBN: 9401776164
Category : Science
Languages : en
Pages : 338

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Book Description
This book provides a comprehensive introduction to a recently-developed approach to the growth mechanism of thin films and nanostructures via chemical vapour deposition (CVD). Starting from the underlying principles of the low pressure synthesis of diamond films, it is shown that diamond growth occurs not by individual atoms but by charged nanoparticles. This newly-discovered growth mechanism turns out to be general to many CVD and some physical vapor deposition (PVD) processes. This non-classical crystallization is a new paradigm of crystal growth, with active research taking place on growth in solution, especially in biomineralization processes. Established understanding of the growth of thin films and nanostructures is based around processes involving individual atoms or molecules. According to the author’s research over the last two decades, however, the generation of charged gas phase nuclei is shown to be the rule rather than the exception in the CVD process, and charged gas phase nuclei are actively involved in the growth of films or nanostructures. This new understanding is called the theory of charged nanoparticles (TCN). This book describes how the non-classical crystallization mechanism can be applied to the growth of thin films and nanostructures in gas phase synthesis. Based on the author’s graduate lecture course, the book is aimed at senior undergraduate and graduate students and researchers in the field of thin film and nanostructure growth or crystal growth. It is hoped that a new understanding of the growth processes of thin films and nanostructures will reduce trial-and-error in research and in industrial fabrication processes.

Author: J. Leon Shohet
Publisher: CRC Press
ISBN: 1351204939
Category : Technology & Engineering
Languages : en
Pages : 2883

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Book Description
Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]

Author: Declan Diver
Publisher: John Wiley & Sons
ISBN: 3527653279
Category : Science
Languages : en
Pages : 211

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Book Description
Plasmaphysik hat sich in den letzen Jahren rapide entwickelt und Einfluss auf verschiedene andere Forschungsgebiete in Physik, Chemie und Astrophysik, aber auch in der industriellen Praxis gewonnen. An all jene, die sich mit Plasmen oder ionisierten Gasen beschäftigen, wendet sich diese Nachschlagewerk: Es bietet eine kompakte, übersichtliche Zusammenstellung grundlegender Formeln und Definitionen, illustriert durch Tabellen und Abbildungen. Auf langwierige Ableitungen wird verzichtet; ein mathematischer Anhang vermittelt die wichtigsten verwendeten Methoden. Ein Literaturverzeichnis auf dem neuesten Stand gibt Anregungen zum tieferen Eindringen in die Materie. Alle Aspekte der Plasmaphysik werden erfasst, inklusive Fusionsplasma - ein unverzichtbares Nachschlagewerk für Physiker, Astrophysiker und Ingenieure.

Author: Maria Stepanova
Publisher: Springer Science & Business Media
ISBN: 3709104246
Category : Technology & Engineering
Languages : en
Pages : 344

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Book Description
Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.

Author: Rajdeep Singh Rawat
Publisher: Springer
ISBN: 9811042179
Category : Science
Languages : en
Pages : 804

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Book Description
This book highlights plasma science and technology-related research and development work at institutes and universities networked through Asian African Association for Plasma Training (AAAPT) which was established in 1988. The AAAPT, with 52 member institutes in 24 countries, promotes the initiation and intensification of plasma research and development through cooperation and technology sharing. With 13 chapters on fusion-relevant, laboratory and industrial plasmas for wide range of applications and basic research and a chapter on AAAPT network, it demonstrates how, with collaborations, high-quality, industrially relevant academic and scientific research on fusion, industrial and laboratory plasmas and plasma diagnostics can be successfully pursued in small research labs. These plasma sciences and technologies include pioneering breakthroughs and applications in (i) fusion relevant research in the quest for long-term, clean energy source development using high-temperature, high- density plasmas and (ii) multibillion-dollar, low-temperature, non-equilibrium and thermal industrial plasmas used in processing, synthesis and electronics.

Author: Oleg O. Baranov
Publisher: Springer Nature
ISBN: 3031020359
Category : Technology & Engineering
Languages : en
Pages : 82

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Book Description
Plasma-based techniques are widely and successfully used across the field of materials processing, advanced nanosynthesis, and nanofabrication. The diversity of currently available processing architectures based on or enhanced by the use of plasmas is vast, and one can easily get lost in the opportunities presented by each of these configurations. This mini-book provides a concise outline of the most important concepts and architectures in plasma-assisted processing of materials, helping the reader navigate through the fundamentals of plasma system selection and optimization. Architectures discussed in this book range from the relatively simple, user-friendly types of plasmas produced using direct current, radio-frequency, microwave, and arc systems, to more sophisticated advanced systems based on incorporating and external substrate architectures, and complex control mechanisms of configured magnetic fields and distributed plasma sources.

Author: Mo-lin Ge
Publisher: World Scientific
ISBN: 9814471569
Category : Science
Languages : en
Pages : 581

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Book Description
The Conference on Statistical Physics, High Energy, Condensed Matter and Mathematical Physics was held in honor of Professor Chen-Ning Yang's 85th birthday in Singapore in Oct-Nov 2007. The conference paid tribute to the breadth and depth of Professor Yang's achievements in physics and science education since he received his Nobel Prize in Physics fifty years ago.This notable birthday volume is a collection of the presentations made at the conference by many eminent scientists who had worked closely with him or who have been influenced to some extent by his work.