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Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2540
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Book Description
Author: Qizhi Liu
Publisher:
ISBN:
Category :
Languages : en
Pages : 372
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Book Description
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2540
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Book Description
Author:
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ISBN:
Category : Integrated optics
Languages : en
Pages : 346
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Book Description
Author:
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ISBN:
Category : Electrical engineering
Languages : en
Pages : 1360
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Book Description
Author:
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ISBN:
Category : Aeronautics
Languages : en
Pages : 994
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Book Description
Author:
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ISBN:
Category : Electrical engineering
Languages : en
Pages : 1904
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Book Description
Author:
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ISBN:
Category : Aeronautics
Languages : en
Pages : 614
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Book Description
Author:
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ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 784
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Book Description
Author: P. D. Townsend
Publisher: Cambridge University Press
ISBN: 9780521394307
Category : Science
Languages : en
Pages : 296
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Book Description
This book is the first to give a detailed description of the factors and processes that govern the optical properties of ion implanted materials, as well as an overview of the variety of devices that can be produced in this way. Beginning with an overview of the basic physics and practical methods involved in ion implantation, the topics of optical absorption and luminescence are then discussed. A chapter on waveguide analysis then provides the background for a description of particular optical devices, such as waveguide lasers, mirrors, and novel nonlinear materials. The book concludes with a survey of the exciting range of potential applications.
Author: A. Borghesi
Publisher: North Holland
ISBN:
Category : Science
Languages : en
Pages : 624
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Book Description
Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry.The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.
