Physico-chemical Study of the Focused Electron Beam Induced Deposition Process PDF Download
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Author: Tristan Bret
Publisher:
ISBN:
Category :
Languages : en
Pages : 220
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Author: Tristan Bret
Publisher:
ISBN:
Category :
Languages : en
Pages : 220
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Author: Ivo Utke
Publisher: OUP USA
ISBN: 0199734216
Category : Technology & Engineering
Languages : en
Pages : 830
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Book Description
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Author: Anthony Dominic Garetto
Publisher:
ISBN:
Category :
Languages : en
Pages : 121
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Book Description
Keywords: chemical vapor deposition, nanofabrication, electron beam induced deposition, Electron Beam Induced Chemistry.
Author: Toivo T. Kodas
Publisher: John Wiley & Sons
ISBN: 3527615849
Category : Technology & Engineering
Languages : en
Pages : 562
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Book Description
High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Author: Frances M. Ross
Publisher: Cambridge University Press
ISBN: 1107116570
Category : Science
Languages : en
Pages : 529
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2.6.2 Electrodes for Electrochemistry
Author:
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Category :
Languages : en
Pages :
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The purpose of this research has been to investigate the mechanisms and develop techniques for electron beam induced chemistry. Applications for electron beam chemistry include repair and fabrication of lithographic masks, integrated circuit repair and rewiring, nanofabrication of functional nanoscale tools and scanned probe microscopy tips and damage free transmission electron microscope sample preparation. The use of hydrocarbon contamination as a precursor has been investigated and complex three dimensional nanostructures have been successfully fabricated. Accelerating voltage and scan speed can be used to control the morphology of the deposits. The development and implementation of an internal precursor reservoir and introduction device that is transferable to various scanning electron microscope and focused ion beam instruments has been performed. The effects of beam and scan parameters on the deposition efficiency of carbon structures utilizing a phenanthrene precursor has been investigated. Deposition efficiency is maximized for low beam current, large scan areas exposed for short times using the experimental conditions in this work. However, the use of a focused ion beam provides a significantly higher deposition efficiency (over 45 times) than that of an electron beam.
Author: Bharat Bhushan
Publisher: Springer Science & Business Media
ISBN: 3540740805
Category : Technology & Engineering
Languages : en
Pages : 512
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Book Description
The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. This is the first book to summarize the state-of-the-art of this technique. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely comprehensive overview of SPM applications.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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High temperature alloys for application to power generation and aircraft engine gas turbine components are presently at their performance limits. New alloys that use intermetallic matrix composites (IMCs) offer a path to higher efficiency engines. Cost-effective synthesis of these revolutionary materials will depend on the development of more efficient processing techniques. Electron beam physical vapor deposition (EB-PVD), enhanced by refractory element addition, offers a key to both increased deposition rate and composition control for these demanding new materials. Initial results with tungsten-assisted EB-PVD had been so dramatic that it became important to investigate the mechanism of this process and to determine the ease with which it could be implemented in EB-PVD machines of different design. The research presented in this report investigates the effects of refractory metal addition on electron beam physical vapor deposition (EB-PVD) of Ni-base alloys containing Co, Cr and Al. Experiments were conducted in which W, Nb, Ta, Mo, or Re was added to pure Ni or Ni-base alloy evaporation pools to study the effects that the various refractory elements had on evaporation rate and the composition control of the deposit. These experiments employed three distinctly different sets of evaporation equipment, so that the effects of processing variables could also be examined. Deposit compositions, deposition rates, and evaporation pool compositions were evaluated in order to determine the effects of refractory addition on the evaporation process. The relationship between deposit properties such as deposition rate, chemistry, and microstructure, and processing parameters such as applied power, electron beam pattern frequency, beam focus, and height of the liquid pool in the crucible were also investigated.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 200
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To elucidate the effects of beam heating in electron beam-induced deposition (EBID), a Monte-Carlo electron-solid interaction model has been employed to calculate the energy deposition profiles in bulk and nanostructured SiO2. Using these profiles, a finite element model was used to predict the nanostructure tip temperatures for standard experimental EBID conditions. Depending on the beam energy, beam current, and nanostructure geometry, the heat generated can be substantial. This heat source can subsequently limit the EBID growth by thermally reducing the mean stay time of the precursor gas. Temperature dependent EBID growth experiments qualitatively verified the results of the electron beam-heating model. Additionally, experimental trends for the growth rate as a function of deposition time supported the conclusion that electron beam-induced heating can play a major role in limiting the EBID growth rate of SiO2 nanostructures. In an EBID application development, two approaches to maskless, direct-write lithography using electron beam-induced deposition (EBID) to produce ultra-thin masking layers were investigated. A single layer process used directly written SiO[subscript x] features deposited from a tetraethoxysilane (TEOS) precursor vapor as a masking layer for amorphous silicon thin films. A bilayer process implemented a secondary masking layer consisting of standard photoresist into which a pattern--directly written by EBID tungsten from WF6 precursor--was transferred. The single layer process was found to be extremely sensitive to the etch selectivity of the plasma etch. As a result, patterns were successfully transferred into silicon, but only to a minimal depth. In the bilayer process, EBID tungsten was written onto photoresist and the pattern transferred by means of an oxygen plasma dry development. A brief refractory descum plasma etch was implemented to remove the peripheral tungsten contamination prior to the development process. Conditions were developed to reduce the spatial spread of electrons in the photoresist layer and obtain minimal linewidths, which enabled patterning of [sim] 35 nm lines. Additionally, an EBID-based technique for field emitter repair was applied to the Digital Electrostatically focused e-beam Array Lithography (DEAL) parallel electron beam lithography configuration. Damaged or missing carbon nanofiber (CNF) emitters are very common in these prototype devices, so there is a need for a deterministic repair process. Relatively carbon-free, high aspect ratio tungsten nanofibers were deposited from a WF6 precursor in a gated cathode and a damaged triode (DEAL) device. The I-V response of the devices during vacuum FE testing indicated stable, cold field emission from the EBID cathodes. The field emission threshold voltage was shown to decrease from -130 V to -90 V after a short initiation period. Finally, lithography was performed using the repaired device to write a series of lines in PMMA with variable focus voltage. Successful focusing of the beam with increased focus voltage was evident in the patterned and developed PMMA. The I-V and lithography results were comparable to CNF-based DEAL devices indicating a successful repair technique.
Author: Marcel Winhold
Publisher:
ISBN:
Category :
Languages : en
Pages :
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