Optical and Microstructural Properties of Sputtered Thin Films for Photovoltaic Applications PDF Download
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Author: Dipendra Adhikari
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 150
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Book Description
Author: Dipendra Adhikari
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 150
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Book Description
Author: Jaydeep Sarkar
Publisher: William Andrew
ISBN: 0815519877
Category : Technology & Engineering
Languages : en
Pages : 614
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Book Description
An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . - Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements - Practical information on technology trends, role of sputtering and major OEMs - Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. - Practical case-studies on target performance and troubleshooting - Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry
Author: Ying Xiao
Publisher:
ISBN:
Category :
Languages : en
Pages : 194
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Book Description
Author: Armand R. Tanguay
Publisher:
ISBN:
Category : Electrooptics
Languages : en
Pages : 134
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Book Description
Author: Fredrick Madaraka Mwema
Publisher: CRC Press
ISBN: 1000597318
Category : Technology & Engineering
Languages : en
Pages : 309
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Book Description
Thin Film Coatings: Properties, Deposition, and Applications discusses the holistic subject of conventional and emerging thin film technologies without bias to a specific technology based on the existing literature. It covers properties and delves into the various methods of thin film deposition, including the most recent techniques and a direction for future developments. It also discusses the cutting-edge applications of thin film coatings such as self-healing and smart coatings, biomedical, hybrid, and scalable thin films. Finally, the concept of Industry 4.0 in thin film coating technology is examined. This book: Explores a wide range and is not specific to material and method of deposition Demonstrates the application of thin film coatings in nearly all sectors, such as energy and anti-microbial applications Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications Provides detailed bibliometric analyses on applications of thin film coatings Discusses Industry 4.0 and 3D printing in thin film technology With its broad coverage, this comprehensive reference will appeal to a wide audience of materials scientists and engineers and others studying and developing advanced thin film technologies.
Author: Cliff Orori Mosiori
Publisher: GRIN Verlag
ISBN: 3656718407
Category : Science
Languages : en
Pages : 118
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Book Description
Master's Thesis from the year 2011 in the subject Physics - Applied physics, grade: A, Kenyatta University, course: Master of Science ( Physics), language: English, abstract: In this research an n-type CdxZn1-xS and p-type PbS thin films were optimised for solar cell applications employing chemical bath deposition technique. The thin films were prepared using thiourea and nitrates of cadmium, zinc and lead. Deposition of optimised CdxZn1-xS was done by CBD at 820 C and in alkaline conditions while that of PbS was done at room temperature and both films at normal atmospheric pressure utilizing aqueous conditions. This study concentrated on optimising optical and electrical characterization of the films. Optical constant suitable for photovoltaic applications were sort for and for this purpose a UV VIS IR spectrophotometer 3700 DUV was utilised while the electrical properties were investigated using a four point probe connected to a Keithley 2400 source meter interfaced with computer. The optical band gap of the as deposited CdxZn1-xS films varied from 2.47eV (x =0.6) to 2.72 eV (x =1.0), and transmittance above 79% in the VIS - NIR region for the concentration range of x = 0.6 to 1.0, that is, the band gap increased with increasing Zn concentration of the alloy and Cd06Zn0.4S sample showed the widest band gap. It was obtained that the presence of zinc increased optical band gap. The average extinction coefficients for the as deposited CdxZn1-xS samples were very low revealing that they absorb very little radiation hence a good window layer material. As measured by the four point probe connected to a Keithley 2400 source meter, electrical resistivity increased with increase in Zn in the bath in CdxZn1-xS and a resistivity range of 9.5×101 – 1.22× 102 Ω-cm was obtained. These properties are appropriate for window layers used for photovoltaic cell applications. PbS thin films had a band gap of 0.89 eV and a transmittance of below 55% appropriate for absorber layers of photovoltaic cells and a resistivity range of 6.78 × 103 to 1.26 × 104 Ω-cm. The fabricated photovoltaic cell had a short circuit current, Isc = 0.031 A, open voltage, Voc = 0.37V, efficiency, η = 0.9% and a fill factor, FF = 0.66 implying that the two materials are appropriate for photovoltaic applications especially in the VIS and IR light spectrum.
Author: Peter M. Martin
Publisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932
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Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author: Anouar Hajjaji
Publisher: Springer
ISBN: 3319133535
Category : Technology & Engineering
Languages : en
Pages : 139
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Book Description
This book presents co-sputtered processes ways to produce chrome doped TiO2 thin films onto various substrates such as quartz, silicon and porous silicon. Emphasis is given on the link between the experimental preparation and physical characterization in terms of Cr content. Moreover, the structural, optical and optoelectronic investigations are emphasized throughout. The book explores the potencial applications of devices based on Cr doped TiO2 thin films as gas sensors and in photocatalysis and in the photovoltaic industry. Also, this book provides extensive leads into research literature, and each chapter contains details which aim to develop awareness of the subject and the methods used. The content presented here will be useful for graduate students as well as researchers in materials science, physics, chemistry and engineering.
Author: Frederick Madaraka Mwema
Publisher: CRC Press
ISBN: 1000371484
Category : Science
Languages : en
Pages : 213
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Book Description
Sputtered Thin Films: Theory and Fractal Descriptions provides an overview of sputtered thin films and demystifies the concept of fractal theory in analysis of sputtered thin films. It simplifies the use of fractal tools in studying the growth and properties of thin films during sputtering processes. Part 1 of the book describes the basics and theory of thin film sputtering and fractals. Part 2 consists of examples illustrating specific descriptions of thin films using fractal methods. Discusses thin film growth, structure, and properties Covers fractal theory Presents methods of fractal measurements Offers typical examples of fractal descriptions of thin films grown via magnetron sputtering processes Describes application of fractal theory in prediction of thin film growth and properties This reference book is aimed at engineers and scientists working across a variety of disciplines including materials science and metallurgy as well as mechanical, manufacturing, electrical, and biomedical engineering.
Author: Efstathios I. Meletis
Publisher: Trans Tech Publications Ltd
ISBN: 3035728151
Category : Science
Languages : en
Pages : 148
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Book Description
The 70th volume of "Journal of Nano Research" contains papers that reflect research results in nanoscience. Under the focus of this volume is the study of thin films, such as titanium nitride (TiN), titanium dioxide (TiO2), zinc sulfide (ZnS) films, and Heterostructure thin films of Indium oxide (ITO) and zinc oxide (ZnO). The investigation of thin films Structure, Morphology, Optical, Electrical, and Adhesion properties are presented. Furthermore, papers are devoted to the synthesis of nanoparticles, a numerical study on nanofluids, a study of the key performance metrics of field transistors, the development of novel nanocomposite, and research in the nanomedicine field.
