Numerical Investigation of the Physical Vapor Deposition of Titanium PDF Download
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Author: Jitendra Balakrishnan
Publisher:
ISBN:
Category :
Languages : en
Pages : 388
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Book Description
Author: Jitendra Balakrishnan
Publisher:
ISBN:
Category :
Languages : en
Pages : 388
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Book Description
Author: D. M. Mattox
Publisher: Cambridge University Press
ISBN: 0080946585
Category : Technology & Engineering
Languages : en
Pages : 947
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Book Description
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704
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Book Description
Author: Donald M. Mattox
Publisher: William Andrew
ISBN: 0128130857
Category : Technology & Engineering
Languages : en
Pages : 383
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Book Description
The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 834
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Book Description
Author:
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 816
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Book Description
Author: Rafael Alvarez
Publisher: MDPI
ISBN: 3036503943
Category : Science
Languages : en
Pages : 178
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Book Description
This Special Issue deals with the synthesis of nanostructured surfaces and thin films by means of physical vapor deposition techniques such as pulsed laser deposition, magnetron sputtering, HiPIMS, or e-beam evaporation, among others. The nanostructuration of the surface modifies the way a material interacts with the environment, changing its optical, mechanical, electrical, tribological, or chemical properties. This can be applied in the development of photovoltaic cells, tribological coatings, optofluidic sensors, or biotechnology to name a few. This issue includes research presenting novel or improved applications of nanostructured thin films, such as photovoltaic solar cells, thin-film transistors, antibacterial coatings or chemical and biological sensors, while also studying the nanostructuration mechanisms, from a fundamental point of view, that produce rods, columns, helixes or hexagonal grids at the nanoscale.
Author: Peter M. Martin
Publisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932
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Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.
Author: Fernand D. S. Marquis
Publisher: John Wiley & Sons
ISBN: 1118792130
Category : Technology & Engineering
Languages : en
Pages : 3600
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Book Description
PRICM-8 features the most prominent and largest-scale interactions in advanced materials and processing in the Pacific Rim region. The conference is unique in its intrinsic nature and architecture which crosses many traditional discipline and cultural boundaries. The CD is a comprehensive collection of papers from the 15 symposia presented at this event.
Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
ISBN: 0080480314
Category : Technology & Engineering
Languages : en
Pages : 1173
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Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.* Offers detailed derivation of important formulae.* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
