Novel Materials and Processes for Advanced CMOS: Volume 745 PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Novel Materials and Processes for Advanced CMOS: Volume 745 PDF full book. Access full book title Novel Materials and Processes for Advanced CMOS: Volume 745 by Mark I. Gardner. Download full books in PDF and EPUB format.
Author: Mark I. Gardner
Publisher:
ISBN:
Category : Computers
Languages : en
Pages : 408
Get Book Here
Book Description
Progress in MOS integrated-circuit technology is largely driven by the ability to dimensionally scale the constituent components of individual devices and their associated interconnections. Given a set of materials with fixed properties, this scaling is finite and its predicted limits are rapidly approaching. The International Technology Roadmap for Semiconductors establishes the pace at which this scaling occurs and identifies many of the technological challenges ahead. This volume assembles representatives from the fields of materials science, physics, electrical and chemical engineering to provide an insightful review of current technology and understanding. Specifically, the intent is to discuss materials issues stemming from device scaling to sub-100nm technology nodes. Topics include: high-k characterization; atomic layer deposition; gate metal materials and integration; contacts and ultrashallow junction formation; theory and modeling and crystalline oxides for gate dielectrics.
Author: Mark I. Gardner
Publisher:
ISBN:
Category : Computers
Languages : en
Pages : 408
Get Book Here
Book Description
Progress in MOS integrated-circuit technology is largely driven by the ability to dimensionally scale the constituent components of individual devices and their associated interconnections. Given a set of materials with fixed properties, this scaling is finite and its predicted limits are rapidly approaching. The International Technology Roadmap for Semiconductors establishes the pace at which this scaling occurs and identifies many of the technological challenges ahead. This volume assembles representatives from the fields of materials science, physics, electrical and chemical engineering to provide an insightful review of current technology and understanding. Specifically, the intent is to discuss materials issues stemming from device scaling to sub-100nm technology nodes. Topics include: high-k characterization; atomic layer deposition; gate metal materials and integration; contacts and ultrashallow junction formation; theory and modeling and crystalline oxides for gate dielectrics.
Author: Shufeng Zhang
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 306
Get Book Here
Book Description
This book combines the proceedings of Symposium Q, Magnetoelectronics-Novel Magnetic Phenomena in Nanostructures, and Symposium R, Advanced Characterization of Artificially Structured Magnetic Materials, both from the 2002 MRS Fall Meeting in Boston. The common focus is on artificially engineered nanostructured magnetic systems. The two symposia address new phenomena in magnetoelectronic applications, their preparation, and advanced methodology for characterization. Interest in nanomagnetism has been catalyzed by advances in two fields of research. 1) Advances in materials synthesis of structures whose length scales transcend magnetic length scales and open the possibility for creating materials with new magnetic properties. Such structures include interfaces, superlattices, tunneling devices, nanostructures, and single-molecule magnets. 2) Advances in sample characterization techniques for nano-magnetism which allow detailed exploration of structure-property relationships in nanostructured magnetic systems. The volume highlights current trends in both fields and offers an outlook for further advances and new capabilities.
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Computers
Languages : en
Pages : 336
Get Book Here
Book Description
In the future, because fundamental materials and process limits are being approached, continued transistor scaling will not be as straightforward. Future complementary metal-oxide semiconductor (MOS) transistors will require high-permittivity (high-k) gate dielectrics and metal gate electrodes, as well as low-resistance ultrashallow junctions, in order to meet the stringent specifications of the International Technology Roadmap for Semiconductors. Techniques to improve transconductance and drive current may also be required. Process integration issues must be solved, and reliability must be assured, before any new material or processing technique can be used in IC manufacture. A further complication is that the key challenges will differ according to application. This book reports research results from industry, government labs and academia covering a wide scope of front-end process issues for future CMOS technologies. Topics include: advanced materials and structures; high-k dielectrics; advanced gate stack materials; heterogeneous integration and strained Si technologies; ultrashallow junction technology; strained Si and source/drain technology; and laser annealing and silicide processes.
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Dielectric films
Languages : en
Pages : 544
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category : Dielectric films
Languages : en
Pages : 562
Get Book Here
Book Description
Author: D. G. Schlom
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 408
Get Book Here
Book Description
This book contains the proceedings of two symposia held at the 2002 MRS Fall Meeting in Boston. Papers from Symposium T, Crystalline Oxides on Semiconductors, bring together experts from different technology areas - high-k gate dielectrics, novel memories, and ferroelectrics, for example - to examine commonality among the fields. These papers offer an overview of the field, highlight interesting experimental results and device ideas, and feature innovative theoretical approaches to understanding these systems. Symposium V, Interfacial Issues for Oxide-Based Electronics, covers a wide range of topics involving the interfaces between electro-optical oxide layers and other materials. Overall, it is clear that a new generation of materials and heterostructures has been enabled by the increasing control of interfacial phenomena. Topics include: epitaxial oxide-silicon heterostructures; ferroelectric thin films on silicon; theory and modeling; crystalline oxides for gate dielectrics; transparent conducting oxides; transparent conducting oxides and oxide growth and properties; field effect devices and gate dielectrics; ferroelectrics, capacitors and sensors; organic devices and interfacial growth issues.
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 240
Get Book Here
Book Description
Since the inauguration of the MRS symposium series on advanced optical processing of materials back in 1990, the number of optical-based techniques applied to process materials and the capabilities of optical systems has continued to expand and improve beyond simple pulsed-laser deposition of thin films. In turn, the scope of materials being investigated has also increased from oxide ceramics to include alloys, polymers and bio-materials. Many of the most exciting areas presented in this interdisciplinary forum include current and future applications in engineering materials at the mesoscopic-to-nanometer scale, optoelectronics, biomaterials, sensors and electronics. Advanced optical processing of materials now includes laser interactions with materials that are specially designed to optimize the beneficial qualities of laser modification. However, femtosecond processing of materials emerged as the dominant theme this year and several papers on this topic are featured. Another hot topic is one connected with biomedical applications--the controlled delivery of drugs to increase their efficacy by coating a fluidized bed of drug powders with biodegradable polymers was realized by conventional pulsed-laser deposition (PLD) and matrix assisted pulsed-laser evaporation (MAPLE) or by microencapsulation.
Author: Alexander A. Demkov
Publisher: Springer Science & Business Media
ISBN: 1402030789
Category : Science
Languages : en
Pages : 477
Get Book Here
Book Description
This book presents materials fundamentals of novel gate dielectrics that are being introduced into semiconductor manufacturing to ensure the continuous scalling of the CMOS devices. This is a very fast evolving field of research so we choose to focus on the basic understanding of the structure, thermodunamics, and electronic properties of these materials that determine their performance in device applications. Most of these materials are transition metal oxides. Ironically, the d-orbitals responsible for the high dielectric constant cause sever integration difficulties thus intrinsically limiting high-k dielectrics. Though new in the electronics industry many of these materials are wel known in the field of ceramics, and we describe this unique connection. The complexity of the structure-property relations in TM oxides makes the use of the state of the art first-principles calculations necessary. Several chapters give a detailed description of the modern theory of polarization, and heterojunction band discontinuity within the framework of the density functional theory. Experimental methods include oxide melt solution calorimetry and differential scanning calorimetry, Raman scattering and other optical characterization techniques, transmission electron microscopy, and x-ray photoelectron spectroscopy. Many of the problems encounterd in the world of CMOS are also relvant for other semiconductors such as GaAs. A comprehensive review of recent developments in this field is thus also given. The book should be of interest to those actively engaged in the gate dielectric research, and to graduate students in Materials Science, Materials Physics, Materials Chemistry, and Electrical Engineering.
Author: Materials Research Society. Meeting
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 376
Get Book Here
Book Description
The objective of this 2003 volume from the Materials Research Society is twofold - to provide an overview of advances in membrane science and technology and to enhance communication among membrane researchers from a variety of disciplines including chemistry, biology, biotechnology, chemical engineering and materials science. Membranes can be used for inert or reactive separations in a variety of fields including gas purification, water treatment, energy storage and conversion, bio-technology and biomedicine. The book brings together scientists involved in the entire spectrum of modern approaches to membrane science and technology to address synthesis, characterization and transport properties and their use in established and emerging applications. Topics include: membrane synthesis and preparation; surface modification and additives; hybrid and composite membranes; membrane characterization; transport phenomena in membranes; charged membranes and ion transfer; gas permeation and separation; pervaporation and vapor permeation; dense membranes for hydrogen separation; applications in biotechnology and biomedicine; and membrane R&D for industrial and emerging applications.
Author: James L. Thomas (Ph. D.)
Publisher:
ISBN:
Category : Medical
Languages : en
Pages : 280
Get Book Here
Book Description
Continued interest in the field of biologically inspired materials is strongly motivated by the fact that the nanoscale and microscale organization found in biological materials often leads to exceptional macroscopic materials properties. The ability to mimic these structures should lead to new synthetic materials with similarly remarkable behavior in both biomedical and materials arenas. This has led to an enormous amount of research in a variety of materials areas, including those aimed at: 1) unique ceramics or composites for use in biomaterials, magnetic and optical applications; 2) self-assembled biopolymeric systems for use in biomaterials and biosensor applications; and 3) colloidal and amphiphilic systems for application in biomedicine, nanotechnology and biosensors. Accordingly, this volume brings together a broad range of researchers whose interests span the full breadth of biology, and in addition, those who find different inspiration in biology itself. For some, that inspiration is in the creation of new materials that have important biological (especially biomedical) applications. For others, it is the imitation of the behavior of a biological material, molecule or process that is of interest. Finally, with increasing frequency, researchers are drawing inspiration from the synthetic pathways that biology uses, exploiting these pathways, and modifying them chemically or genetically to make entirely novel molecules and materials. Biologically inspired materials is a rapidly evolving arena of materials science research, and the work presented here reflects recent advances and new perspectives in the field. Topics include: tissue engineering and biomaterials; novel biomimeticand bioinspired polymers; biomineralization, colloidal and templated materials; and amphiphilic membranes and surfaces.