Modeling and Control of Advanced Chemical Vapor Deposition Processes: The Control of Defects in Mixed III-V Compound Heterstructures PDF Download

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Modeling and Control of Advanced Chemical Vapor Deposition Processes: The Control of Defects in Mixed III-V Compound Heterstructures

Modeling and Control of Advanced Chemical Vapor Deposition Processes: The Control of Defects in Mixed III-V Compound Heterstructures PDF Author:
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Languages : en
Pages : 32

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Book Description
We report progress on the construction and testing of two high pressure organometallic chemical vapor deposition (HPOMCVD) reactors, real time feedback control of pulsed chemical beam epitaxy, reduced order model feedback control design, defect formation in heteroepitaxial growth of films, and remote plasma processing.