Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 770
Book Description
Metrology, Inspection, and Process Control for Microlithography XVIII
Nanoscience
Author: Neerish Revaprasadu
Publisher: Royal Society of Chemistry
ISBN: 1837674140
Category : Technology & Engineering
Languages : en
Pages : 305
Book Description
With a vast landscape of material, careful distillation of the most important discoveries helps researchers find the key information. Publications in nanoscience cross conventional boundaries from chemistry to specialised areas of physics and nanomedicine. This volume provides a critical and comprehensive assessment of the most recent research and opinion from across the globe. Topics covered include, but are not limited to, advancing lithium-ion battery technology, sonochemistry in nanomaterial synthesis, mechanoluminescence and electronic and optical features of 2D materials. Appealing to anyone practising in nano-allied fields or wishing to enter the nano-world, this useful resource provides a succinct reference on recent developments in this area now and looking to the future.
Publisher: Royal Society of Chemistry
ISBN: 1837674140
Category : Technology & Engineering
Languages : en
Pages : 305
Book Description
With a vast landscape of material, careful distillation of the most important discoveries helps researchers find the key information. Publications in nanoscience cross conventional boundaries from chemistry to specialised areas of physics and nanomedicine. This volume provides a critical and comprehensive assessment of the most recent research and opinion from across the globe. Topics covered include, but are not limited to, advancing lithium-ion battery technology, sonochemistry in nanomaterial synthesis, mechanoluminescence and electronic and optical features of 2D materials. Appealing to anyone practising in nano-allied fields or wishing to enter the nano-world, this useful resource provides a succinct reference on recent developments in this area now and looking to the future.
Microlithography
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Metrology, Inspection, and Process Control for Microlithography XVIII
Author:
Publisher:
ISBN: 9780819452887
Category : Integrated circuits
Languages : en
Pages : 1398
Book Description
Publisher:
ISBN: 9780819452887
Category : Integrated circuits
Languages : en
Pages : 1398
Book Description
Istc/cstic 2009 (cistc)
Author: David Huang
Publisher: The Electrochemical Society
ISBN: 1566777038
Category : Science
Languages : en
Pages : 1124
Book Description
ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Publisher: The Electrochemical Society
ISBN: 1566777038
Category : Science
Languages : en
Pages : 1124
Book Description
ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Handbook of Thin Film Deposition
Author: Dominic Schepis
Publisher: Elsevier
ISBN: 044313524X
Category : Technology & Engineering
Languages : en
Pages : 428
Book Description
Handbook of Thin Film Deposition, Fifth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry. When pursuing patents, there is a phase called 'reduction to practice' where the idea for a technology transitions from a concept to actual use. The section 'Thin Film Reduction to Practice' includes chapters that review the most relevant methods to fabricate thin films towards practical applications. Then, the latest applications of thin film deposition technologies are discussed. Handbook of Thin Film Deposition, 5th Edition is suitable for materials scientists and engineers in academia and working in semiconductor R&D. - Offers a practical survey of thin film technologies including design, fabrication, and reliability - Covers core processes and applications in the semiconductor industry and discusses latest advances in new thin film development - Features new chapters that review methods on front-end and back-end thin films
Publisher: Elsevier
ISBN: 044313524X
Category : Technology & Engineering
Languages : en
Pages : 428
Book Description
Handbook of Thin Film Deposition, Fifth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry. When pursuing patents, there is a phase called 'reduction to practice' where the idea for a technology transitions from a concept to actual use. The section 'Thin Film Reduction to Practice' includes chapters that review the most relevant methods to fabricate thin films towards practical applications. Then, the latest applications of thin film deposition technologies are discussed. Handbook of Thin Film Deposition, 5th Edition is suitable for materials scientists and engineers in academia and working in semiconductor R&D. - Offers a practical survey of thin film technologies including design, fabrication, and reliability - Covers core processes and applications in the semiconductor industry and discusses latest advances in new thin film development - Features new chapters that review methods on front-end and back-end thin films
Analytical and Diagnostic Techniques for Semiconductor Materials, Devices and Processes
Author: Bernd O. Kolbesen (Chemiker.)
Publisher: The Electrochemical Society
ISBN: 9781566772396
Category : Technology & Engineering
Languages : en
Pages : 568
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566772396
Category : Technology & Engineering
Languages : en
Pages : 568
Book Description
Electrochemical Processes in ULSI and MEMS
Author: Hariklia Deligianni
Publisher: The Electrochemical Society
ISBN: 9781566774727
Category : Computers
Languages : en
Pages : 494
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566774727
Category : Computers
Languages : en
Pages : 494
Book Description
National Semiconductor Metrology Program
Author: National Institute of Standards and Technology (U.S.)
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 160
Book Description
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 160
Book Description
National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 160
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 160
Book Description