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Author: Yasuhiko Arakawa
Publisher:
ISBN:
Category :
Languages : en
Pages : 4
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Book Description
Mesoscopic and/or quantum microstructures have recently received great attentions, since new physical phenomena with possible applications to optical devices are expected in these structures'. For this purpose, fabrication technologies including fractional layer superlattice growth, the laser assisted atomic layer epitaxy, and the facet wire growth are intensively investigated. In particular, use of both metal-organic chemical vapor deposition (MOCVD) selective growth technique and electron beam (EB) lithography technique would play important roles. In this paper, we discuss fabrication technologies for quantum wires and quantum boxes with emphasis on these electron-beam assisted MOCVD technologies. In addition, physics of the mesoscopic structures for laser applications is also discussed.
Author: Yasuhiko Arakawa
Publisher:
ISBN:
Category :
Languages : en
Pages : 4
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Book Description
Mesoscopic and/or quantum microstructures have recently received great attentions, since new physical phenomena with possible applications to optical devices are expected in these structures'. For this purpose, fabrication technologies including fractional layer superlattice growth, the laser assisted atomic layer epitaxy, and the facet wire growth are intensively investigated. In particular, use of both metal-organic chemical vapor deposition (MOCVD) selective growth technique and electron beam (EB) lithography technique would play important roles. In this paper, we discuss fabrication technologies for quantum wires and quantum boxes with emphasis on these electron-beam assisted MOCVD technologies. In addition, physics of the mesoscopic structures for laser applications is also discussed.
Author: Susumu Namba
Publisher: Springer Science & Business Media
ISBN: 4431669221
Category : Science
Languages : en
Pages : 477
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Book Description
The International Symposium on the Science and Technology of Mesoscopic Structures was held at Shin-Kohkaido in Nara from November 6-8, 1991. The symposium was sponsored by the International Institute for Advanced Study and partly by Nara Prefecture, Nara City, Nara Convention Bureau, and the Ministry of Education, Science and Culture of Japan, as well as industrial organizations. We would like to acknowledge the support of the symposium by these or ganizations. The scope of the symposium was planned by the organizing committee to cover outstanding contributors in the fields of (1) ballistic transport, (2) electron wave guides and interference effects, (3) quantum confinement effects, (4) tunneling phenomena, (5) optical nonlinearity, and (6) fabrication technology of meso scopic structures. Twenty-six invited speakers were selected from the United States, Europe, and Japan. In addition twenty-four contributed papers were accepted for presentation at the poster session. These papers are included in the proceedings. We are grateful to the organizing committee, Ms. Y oshiko Kusaki of the Inter national Institute for Advanced Study for the secretarial service, and Dr. Nobuya Mori, Osaka University, for his scientific cooperation. Thanks are also due to the authors and the participants for their contributions to a successful symposium.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 100
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Book Description
The development of the processes necessary for fabrication of sub-100nm heteroepitaxial Si(x)G3e(1 -x) structures in Si (100) substrates is described. The structures are required to be planar and definable by available patterning techniques (e.g. X-ray, e-beam, ion beam, or optical lithography). The report describes the investigation of two candidate patterning processes, enhanced ion beam etching, and standard e-beam lift off. The formation of the heteroepitaxial structures, in the form of nano-wires, is carried out using pulsed laser induced epitaxy, an ultra-rapid (
Author: Jouni Ahopelto
Publisher:
ISBN: 9789516664593
Category :
Languages : en
Pages : 48
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Book Description
Author: Saburo Nonogaki
Publisher: CRC Press
ISBN: 1482273764
Category : Technology & Engineering
Languages : en
Pages : 336
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Book Description
"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
Author: A.S Edelstein
Publisher: CRC Press
ISBN: 9780750305785
Category : Science
Languages : en
Pages : 1244
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Book Description
Nanomaterials: Synthesis, Properties and Applications provides a comprehensive introduction to nanomaterials, from how to make them to example properties, processing techniques, and applications. Contributions by leading international researchers and teachers in academic, government, and industrial institutions in nanomaterials provide an accessible guide for newcomers to the field. The coverage ranges from isolated clusters and small particles to nanostructured materials, multilayers, and nanoelectronics. The book contains a wealth of references for further reading. Individual chapters deal with relevant aspects of the underlying physics, materials science, and physical chemistry.
Author: Supriyo Datta
Publisher: Cambridge University Press
ISBN: 1139643010
Category : Science
Languages : en
Pages : 398
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Book Description
Advances in semiconductor technology have made possible the fabrication of structures whose dimensions are much smaller than the mean free path of an electron. This book gives a thorough account of the theory of electronic transport in such mesoscopic systems. After an initial chapter covering fundamental concepts, the transmission function formalism is presented, and used to describe three key topics in mesoscopic physics: the quantum Hall effect; localisation; and double-barrier tunnelling. Other sections include a discussion of optical analogies to mesoscopic phenomena, and the book concludes with a description of the non-equilibrium Green's function formalism and its relation to the transmission formalism. Complete with problems and solutions, the book will be of great interest to graduate students of mesoscopic physics and nanoelectronic device engineering, as well as to established researchers in these fields.
Author: Miguel Maldonado
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 302
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Book Description
Author: Narendra B. Dahotre
Publisher: John Wiley & Sons
ISBN: 3527347917
Category : Technology & Engineering
Languages : en
Pages : 308
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Book Description
Laser-Based Additive Manufacturing Explore laser-based additive manufacturing processes via multi-scale modeling and computer simulation In Laser-Based Additive Manufacturing: Modeling, Simulation, and Experiments, a distinguished team of researchers delivers an incisive framework for understanding materials processing using laser-based additive manufacturing (LAM). The book describes the use of computational modeling and simulation to explore and describe the LAM technique, to improve the compositional, phase, and microstructural evolution of the material, and to enhance the mechanical, chemical, and functional properties of the manufactured components. The accomplished authors combine a comprehensive overview of multi-scale modeling and simulation with experimental and practical observations, offering a systematic review of laser-material interactions in advanced LAM processes. They also describe the real-world applications of LAM, including component processing and surface functionalization. In addition to explorations of residual stresses, three-dimensional defects, and surface physical texture in LAM, readers will also find: A thorough introduction to additive manufacturing (AM), including the advantages of AM over conventional manufacturing and the challenges involved with using the technology A comprehensive exploration of computation materials science, including length- and time-scales in materials modeling and the current state of computational modeling in LAM Practical discussions of laser-material interaction in LAM, including the conversion of light energy to heat, modes of heat dissipation, and the dynamics of the melt-pool In-depth examinations of the microstructural and mechanical aspects of LAM integrated with modeling Perfect for materials scientists, mechanical engineers, and physicists, Laser-Based Additive Manufacturing: Modeling, Simulation, and Experiments is perfect for anyone seeking an insightful treatment of this cutting-edge technology in the areas of alloys, ceramics, and composites.
Author: Marc J. Madou
Publisher: CRC Press
ISBN: 1351990616
Category : Technology & Engineering
Languages : en
Pages : 3654
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Book Description
Now in its third edition, Fundamentals of Microfabrication and Nanotechnology continues to provide the most complete MEMS coverage available. Thoroughly revised and updated the new edition of this perennial bestseller has been expanded to three volumes, reflecting the substantial growth of this field. It includes a wealth of theoretical and practical information on nanotechnology and NEMS and offers background and comprehensive information on materials, processes, and manufacturing options. The first volume offers a rigorous theoretical treatment of micro- and nanosciences, and includes sections on solid-state physics, quantum mechanics, crystallography, and fluidics. The second volume presents a very large set of manufacturing techniques for micro- and nanofabrication and covers different forms of lithography, material removal processes, and additive technologies. The third volume focuses on manufacturing techniques and applications of Bio-MEMS and Bio-NEMS. Illustrated in color throughout, this seminal work is a cogent instructional text, providing classroom and self-learners with worked-out examples and end-of-chapter problems. The author characterizes and defines major research areas and illustrates them with examples pulled from the most recent literature and from his own work.
