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Author: Lhadi Merhari
Publisher: Cambridge University Press
ISBN: 9781107414174
Category : Technology & Engineering
Languages : en
Pages : 360
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Book Description
The exploding market of information technology requires ultrahigh-speed integrated circuits, which imposes formidable challenges in terms of nanofabrication, advanced materials, atomic-scale measurements and modeling. The enormous costs of next-generation lithographic machines to mass produce integrated circuits with sub-100nm resolution justify alternative approaches where the use of advanced materials and techniques for nanofabrication, including epitaxial growth and their powerful modeling, can lead to more cost-effective strategies. This book contains the proceedings of two symposia held at the 1999 MRS Fall Meeting in Boston that address these issues - Advanced Materials and Techniques for Nanolithography, and Atomic-Scale Measurements and Atomistic Models of Epitaxial Growth and Lithography. The reader will find an overview of the state of the art, both theoretical and experimental in this technologically important field. Topics include: advanced techniques for sub-100nm resolution lithography and molecular electronics; epitaxial growth and morphology; novel concepts of resists for nanolithography; atomic-scale characterization and measurement; modeling and atomistic simulations; and nanodevices and nanostructures.
Author: Lhadi Merhari
Publisher: Cambridge University Press
ISBN: 9781107414174
Category : Technology & Engineering
Languages : en
Pages : 360
Get Book Here
Book Description
The exploding market of information technology requires ultrahigh-speed integrated circuits, which imposes formidable challenges in terms of nanofabrication, advanced materials, atomic-scale measurements and modeling. The enormous costs of next-generation lithographic machines to mass produce integrated circuits with sub-100nm resolution justify alternative approaches where the use of advanced materials and techniques for nanofabrication, including epitaxial growth and their powerful modeling, can lead to more cost-effective strategies. This book contains the proceedings of two symposia held at the 1999 MRS Fall Meeting in Boston that address these issues - Advanced Materials and Techniques for Nanolithography, and Atomic-Scale Measurements and Atomistic Models of Epitaxial Growth and Lithography. The reader will find an overview of the state of the art, both theoretical and experimental in this technologically important field. Topics include: advanced techniques for sub-100nm resolution lithography and molecular electronics; epitaxial growth and morphology; novel concepts of resists for nanolithography; atomic-scale characterization and measurement; modeling and atomistic simulations; and nanodevices and nanostructures.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Book Description
The exploding market of information technology requires ultra-high-speed integrated circuits, which imposes formidable challenges in terms of nanofabrication, advanced materials, atomic scale measurements and modeling. The enormous costs of next-generation lithographic machines to mass produce integrated circuits with sub-100 nm resolution justify alternative approaches where the use of advanced materials and techniques for nanofabrication including epitaxial growth, and their powerful modeling, can lead to more cost-effective strategies. This volume contains most of the papers that were presented during Symposium J, "Advanced Materials and Techniques for Nanolithography," and Symposium N, "Atomic Scale Measurements and Atomistic Models of Epitaxial Growth and Lithography," at the 1999 MRS Fall Meeting in Boston, Massachusetts. Because of the complementary nature of the two subject matters, particularly in their applicability to device nanofabrication, it was felt that a combined proceedings volume offered the best way to present the findings in a unified and comprehensive manner. The editors trust that the reader will find here a nice overview of the state of the art, both theoretical and experimental, as well as an indication of the future trends and remaining challenges in this technologically important field.
Author: Lhadi Merhari
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 368
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: M. S. Rzchowski
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 416
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author:
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Category : Composite materials
Languages : en
Pages : 738
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Book Description
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Category : Detectors
Languages : en
Pages : 384
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ISBN:
Category : Thin films
Languages : en
Pages : 576
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Author:
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ISBN:
Category :
Languages : en
Pages : 608
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Book Description
Author: David Norton
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 244
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Book Description
Epitaxial growth has always been a marriage of convenience between film and substrate. More and more frequently, however, it is impractical to use the same material for both film and substrate because it is not available as large single crystals, it is prohibitively expensive, or its properties are ill-suited for the intended application. To meet these challenges, many strategies have been pursued to achieve highly oriented or single-crystal thin films via epitaxy. Crystalline films have been mechanically bonded to other materials to form composite substrates. Crystals have been cut and rewelded, patterned and regrown, buffer layered and repolished. Each strategy has met with fundamental challenges including lattice mismatch, chemical incompatibility, differences in thermal expansion, and structural dissimilarity. This book, first published in 2000, focuses on developments in novel substrate engineering which enable improved epitaxy. Topics include: biaxially textured substrates for high-Tc-coated conductors; surfaces for oxide epitaxy; wafer bonding and lift off; lattice mismatch engineering; substrate engineering and solid-phase recrystallization and epitaxy.
Author:
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Category : Dielectric films
Languages : en
Pages : 624
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Book Description
