Low-temperature Silicon Epitaxy Deposited by Plasma Enhanced Chemical Vapor Deposition PDF Download
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Author: T. J. Donahue
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 22
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Book Description
Author: T. J. Donahue
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 22
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Book Description
Author: T. J. Donahue
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 17
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Book Description
Author: T. J. Donahue
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 29
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Author: Linda Mason Garverick
Publisher:
ISBN:
Category :
Languages : en
Pages : 374
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Author: Scott Dwight Habermehl
Publisher:
ISBN:
Category :
Languages : en
Pages : 306
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Author: L. R. Reif
Publisher:
ISBN:
Category :
Languages : en
Pages : 12
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Book Description
A reactor system has been developed to deposit specular epitaxial silicon films at temperatures as low as 620 C using a low pressure chemical vapor deposition process both with and without plasma enhancement. This represents the lowest silicon epitaxial deposition temperature ever reported for a thermally driven chemical vapor deposition process. Experiments performed at 775 C indicate that the predeposition in-situ cleaning of the substrate surface is the critical step in determining whether epitaxial deposition will occur. Surface cleaning in these experiments was done by sputtering in an argon plasma ambient at the deposition temperature while applying a dc bias to the susceptor. This is the lowest pre-epitaxial cleaning temperature ever reported for a thermally driven chemical vapor deposition. (Author).
Author: W. R. Burger
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 22
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Author: R. Reif
Publisher:
ISBN:
Category : Autodoping
Languages : en
Pages : 3
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This paper reviews the most recent results obtained using a very low pressure, plasma enhanced chemical vapor deposition technique for low temperature (650-800°C) silicon epitaxy. Initial results on autodoping studies and on p-n junctions and MOS transistors fabricated in these films are briefly discussed.
Author: Philip Willmott
Publisher:
ISBN:
Category :
Languages : en
Pages : 136
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Author: Wayne Robert Burger
Publisher:
ISBN:
Category :
Languages : en
Pages : 238
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