Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition PDF Download
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Author: Theodore M. Besmann
Publisher: The Electrochemical Society
ISBN: 9781566771559
Category : Science
Languages : en
Pages : 922
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Book Description
Author: Theodore M. Besmann
Publisher: The Electrochemical Society
ISBN: 9781566771559
Category : Science
Languages : en
Pages : 922
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Book Description
Author: Nuggehalli M. Ravindra
Publisher: Minerals, Metals, & Materials Society
ISBN:
Category : Electronics
Languages : en
Pages : 192
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Book Description
This volume presents a research update of silicon and non-silicon transient processing techniques such as rapid thermal processing, pulsed laser processes, flash evaporation, jet processes, and more. Also covered are process sensors, equipment issues, and the manufacturing perspective.
Author: Materials Research Society
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 432
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Book Description
Author:
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 914
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Book Description
Author: Electrochemical Society. Meeting
Publisher:
ISBN:
Category : Electrochemistry
Languages : en
Pages : 1700
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Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 860
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Author:
Publisher:
ISBN:
Category : Molecular beam epitaxy
Languages : en
Pages : 738
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Book Description
Author: J. C. Gelpey
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 416
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Book Description
This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2240
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Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2002
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