Laser-induced Chemical Vapor Deposition of Silicon Nitride Films PDF Download
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Author: Eric Ting-Shan Pan
Publisher:
ISBN:
Category :
Languages : en
Pages : 61
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Author: Eric Ting-Shan Pan
Publisher:
ISBN:
Category :
Languages : en
Pages : 61
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Author: Joseph Zahavi
Publisher:
ISBN:
Category :
Languages : en
Pages : 60
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Book Description
This report results from a contract tasking Technion as follows: Investigate the characteristics of thin silicon nitride films deposited on substrates via the use of chemical laser deposition techniques. This report summarized the research activities during the first year of work as was planned in the proposal. It completes the information which was given in the previous two progress reports. Basically, the aim of the first year was to study the possibility of deposition of silicon nitride thin films from silane and ammonia at low temperatures. The investigation was carried out by studying the effect of substrate temperature on deposition rate and film quality. In addition, the photochemical reaction was studied by analyzing the composition of gas molecules prior and during laser irradiation. At the end of the first year it was also possible to start doing experiments for deposition of silicon carbide from silane and acetylene.
Author: Tongsan Xiao
Publisher:
ISBN:
Category : Laser-plasma interactions
Languages : en
Pages : 94
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Author: Sui-Yuan Lynn
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 212
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Author: Todd Alan Brooks
Publisher:
ISBN:
Category :
Languages : en
Pages : 286
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Author: Lance Robert Thompson
Publisher:
ISBN:
Category : Semiconductor films
Languages : en
Pages : 206
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Author: Hideki Matsumura
Publisher: John Wiley & Sons
ISBN: 3527818669
Category : Technology & Engineering
Languages : en
Pages : 604
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Book Description
The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Author: Giridhar Nallapati
Publisher:
ISBN:
Category :
Languages : en
Pages : 108
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Author: Chue-san Yoo
Publisher:
ISBN:
Category :
Languages : en
Pages : 210
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Author: Ezgi Abacıoğlu
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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