Author:
Publisher:
ISBN:
Category : Microscope and microscopy
Languages : en
Pages : 506
Book Description
Journal of Applied Microscopy
Author:
Publisher:
ISBN:
Category : Microscope and microscopy
Languages : en
Pages : 506
Book Description
Publisher:
ISBN:
Category : Microscope and microscopy
Languages : en
Pages : 506
Book Description
Catalogue
Author:
Publisher:
ISBN:
Category : Catalogs, Booksellers'
Languages : en
Pages : 1124
Book Description
Publisher:
ISBN:
Category : Catalogs, Booksellers'
Languages : en
Pages : 1124
Book Description
Proceedings
Author: Geological Society of America
Publisher:
ISBN:
Category : Geology
Languages : en
Pages : 298
Book Description
Publisher:
ISBN:
Category : Geology
Languages : en
Pages : 298
Book Description
Journal of applied microscopy and laboratory methods
Author:
Publisher:
ISBN:
Category : Microscopy
Languages : en
Pages : 470
Book Description
Publisher:
ISBN:
Category : Microscopy
Languages : en
Pages : 470
Book Description
The Wilson Bulletin
Author:
Publisher:
ISBN:
Category : Birds
Languages : en
Pages : 240
Book Description
Publisher:
ISBN:
Category : Birds
Languages : en
Pages : 240
Book Description
Metallography
Author: Abrams H.
Publisher: ASTM International
ISBN: 9780803105102
Category : Technology & Engineering
Languages : en
Pages : 244
Book Description
Publisher: ASTM International
ISBN: 9780803105102
Category : Technology & Engineering
Languages : en
Pages : 244
Book Description
Microlithography
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Publisher: CRC Press
ISBN: 1351643444
Category : Technology & Engineering
Languages : en
Pages : 913
Book Description
The completely revised Third Edition to the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from fundamental principles to advanced topics of nanoscale lithography. The book is divided into chapters covering all important aspects related to the imaging, materials, and processes that have been necessary to drive semiconductor lithography toward nanometer-scale generations. Renowned experts from the world’s leading academic and industrial organizations have provided in-depth coverage of the technologies involved in optical, deep-ultraviolet (DUV), immersion, multiple patterning, extreme ultraviolet (EUV), maskless, nanoimprint, and directed self-assembly lithography, together with comprehensive descriptions of the advanced materials and processes involved. New in the Third Edition In addition to the full revision of existing chapters, this new Third Edition features coverage of the technologies that have emerged over the past several years, including multiple patterning lithography, design for manufacturing, design process technology co-optimization, maskless lithography, and directed self-assembly. New advances in lithography modeling are covered as well as fully updated information detailing the new technologies, systems, materials, and processes for optical UV, DUV, immersion, and EUV lithography. The Third Edition of Microlithography: Science and Technology authoritatively covers the science and engineering involved in the latest generations of microlithography and looks ahead to the future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current technology, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to better understand the complex world of microlithography science and technology.
Mechanical and Physico-Chemical Characteristics of Modified Materials
Author: Seghir Maamir
Publisher: CRC Press
ISBN: 1498714102
Category : Science
Languages : en
Pages : 338
Book Description
Understanding chemical and solid materials and their properties and behavior is fundamental to chemical and engineering design. With some of the world's leading experts describing their most recent research, this book describes the procedures for material selection and design to ensure that the most suitable materials for a given application are id
Publisher: CRC Press
ISBN: 1498714102
Category : Science
Languages : en
Pages : 338
Book Description
Understanding chemical and solid materials and their properties and behavior is fundamental to chemical and engineering design. With some of the world's leading experts describing their most recent research, this book describes the procedures for material selection and design to ensure that the most suitable materials for a given application are id
Electron Microscopy and Structure of Materials
Author: Gareth Thomas
Publisher: Univ of California Press
ISBN: 9780520021143
Category : Science
Languages : en
Pages : 1318
Book Description
Publisher: Univ of California Press
ISBN: 9780520021143
Category : Science
Languages : en
Pages : 1318
Book Description
Manual on Electron Metallography Techniques
Author: ASTM AUTOR
Publisher: ASTM International
ISBN:
Category :
Languages : en
Pages : 80
Book Description
Publisher: ASTM International
ISBN:
Category :
Languages : en
Pages : 80
Book Description