Influence of Copper Content on Grain Growth in Vapor Deposited Al(cu) Thin Films

Influence of Copper Content on Grain Growth in Vapor Deposited Al(cu) Thin Films PDF Author: U. Koester
Publisher:
ISBN:
Category :
Languages : en
Pages : 13

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The Influence of Strain Energy on Abnormal Grain Growth in Copper Thin Films

The Influence of Strain Energy on Abnormal Grain Growth in Copper Thin Films PDF Author: Eden Melody Zielinski
Publisher:
ISBN:
Category :
Languages : en
Pages : 268

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Interfaces, Superlattices, and Thin Films

Interfaces, Superlattices, and Thin Films PDF Author: John D. Dow
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 850

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Effect of Annealing on Copper Thin Films

Effect of Annealing on Copper Thin Films PDF Author: Parag Gadkari
Publisher:
ISBN:
Category :
Languages : en
Pages : 80

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Lastly, it is also observed that the tendency for agglomeration can be reduced by encapsulating the metal film with an oxide overlayer, which in turn improves the resistivity of the thin film due to prolonged grain growth without film breakup.

Grain Growth and Texture Evolution in Copper Thin Films

Grain Growth and Texture Evolution in Copper Thin Films PDF Author: Petra Sonnweber-Ribic
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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13th International Conference on Aluminum Alloys (ICAA 13)

13th International Conference on Aluminum Alloys (ICAA 13) PDF Author: Hasso Weiland
Publisher: Springer
ISBN: 3319487612
Category : Technology & Engineering
Languages : en
Pages : 1857

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This is a collection of papers presented at the 13th International Conference on Aluminum Alloys (ICAA-13), the premier global conference for exchanging emerging knowledge on the structure and properties of aluminum materials. The papers are organized around the topics of the science of aluminum alloy design for a range of market applications; the accurate prediction of material properties; novel aluminum products and processes; and emerging developments in recycling and applications using both monolithic and multi-material solutions.

Metals Abstracts Index

Metals Abstracts Index PDF Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1622

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Proceedings

Proceedings PDF Author:
Publisher:
ISBN:
Category : Electronic apparatus and appliances
Languages : en
Pages : 978

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Metals Abstracts

Metals Abstracts PDF Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 1076

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The Role of Copper on Stress Evolution and Chemical Ordering in Iron-copper-platinum Thin Films

The Role of Copper on Stress Evolution and Chemical Ordering in Iron-copper-platinum Thin Films PDF Author: Ross Hinson
Publisher:
ISBN:
Category : Electronic dissertations
Languages : en
Pages : 97

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The chemical ordering of FePt requires an annealing temperature>500 °C. At these temperatures, grain growth attributed to thermal annealing lowers the areal density in computer hard drives. Multiple paths have been proposed to lower the ordering temperature in order to decrease the grain growth. Ternary additions show promise as a way to lower the ordering temperature and decrease the grain growth. Though multiple studies have been conducted on the incorporation of Cu into FePt, these studies have produced contradictory results on the ordering temperature. Currently, there is no literature on the in situ growth stresses during deposition of FePtCu as a function of ordering temperature. InsituFe_44.5 Pt_51 Cu_4.5 and Fe_50 Pt_50 (for comparison) thin films were produced in order to determine how stress and ordering are affected by the incorporation of Cu. The incorporation of Cu at the amounts studied did not change the stress behavior of FePt when compared to Fe_50 Pt_50 . The addition of Cu raised the ordering temperature and had little to no effect on the grain size as compared to the Fe_50 Pt_50 . This retardation of ordering has been explained by the placement of Cu at lattice sites which minimize the bond distance to Pt and maximize the bond distance to Fe.