H° Temperature and Density Measurements in a Penning Surface-plasma H− Ion Source PDF Download
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Languages : en
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Using vacuum ultraviolet laser-absorption spectroscopy, the H° density and temperature are measured as a function of discharge current and H2-gas flow in both the plasma column and the drift region between the plasma column and the emitter in the 4X source. For typical source operating parameters, the atom temperature is 1.5 eV in the plasma column and 0.6 eV in the drift region; the atom density, 7 x 1014 cm/sup /minus/3/ in the plasma column and 4 x 1014 cm/sup /minus/3/ in the drift region. Separate measurements give 2% for the ratio of H2 molecules in the first vibrational level to the total H2 density. 8 refs., 6 figs., 1 tab.
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Using vacuum ultraviolet laser-absorption spectroscopy, the H° density and temperature are measured as a function of discharge current and H2-gas flow in both the plasma column and the drift region between the plasma column and the emitter in the 4X source. For typical source operating parameters, the atom temperature is 1.5 eV in the plasma column and 0.6 eV in the drift region; the atom density, 7 x 1014 cm/sup /minus/3/ in the plasma column and 4 x 1014 cm/sup /minus/3/ in the drift region. Separate measurements give 2% for the ratio of H2 molecules in the first vibrational level to the total H2 density. 8 refs., 6 figs., 1 tab.
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Languages : en
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Beam-intensity and emittance measurements show that the H− beam from our Penning surface-plasma source (SPS) has twice the intensity and ten times the brightness of the H− beam from an asymmetric, grooved magnetron SPS. We deduce H− ion temperatures of 5 eV for the Penning SPS and 22 eV for the asymmetric, grooved magnetron.
Author: ERIC JOHN PITCHER
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Languages : en
Pages : 236
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parameters of beam current, brightness, quiescence, reliability, and duty-factor.
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Category : Aeronautics
Languages : en
Pages : 836
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Category : Power resources
Languages : en
Pages : 420
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Category : Power resources
Languages : en
Pages : 848
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Languages : en
Pages : 16
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Simple analysis of the nearly-Maxwellian angular distribution of the ribbon H− ions beams extracted from a long, narrow slit on the 8X source yields the H− temperature, kT{sub H-}. The derived kT{sub H-} are 0.1--0.3 eV for a 2-A dc discharge and 0.7-1.3 eV for a 400-A pulsed discharge. Because this diagnostic method relies on simple electronic techniques, it allows rapid study of the dependencies of kT{sub H-} on the source parameters, such as gas flow and discharge current. These variations of kT{sub H-} in the 8X source are qualitatively similar to those observed for the H-atom temperature, kT{sub H}o, in the 4X source, another Penning surface-plasma source. 10 refs., 4 figs.
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Category : Plasma (Ionized gases)
Languages : en
Pages : 558
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Author: J. Leon Shohet
Publisher: CRC Press
ISBN: 1482214318
Category : Technology & Engineering
Languages : en
Pages : 1654
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Technical plasmas have a wide range of industrial applications. The Encyclopedia of Plasma Technology covers all aspects of plasma technology from the fundamentals to a range of applications across a large number of industries and disciplines. Topics covered include nanotechnology, solar cell technology, biomedical and clinical applications, electronic materials, sustainability, and clean technologies. The book bridges materials science, industrial chemistry, physics, and engineering, making it a must have for researchers in industry and academia, as well as those working on application-oriented plasma technologies. Also Available Online This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail)
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Author: Christine Petit-jean-genaz
Publisher: World Scientific
ISBN: 9814550272
Category :
Languages : en
Pages : 2968
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These proceedings aim to provide a comprehensive overview of research, technology and applications in the field of accelerators. Contributions from the entire field of accelerators are presented, including low and high energy machines, and medical and industrial accelerators.
