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Author: Henning Döscher
Publisher: Springer Science & Business Media
ISBN: 3319028804
Category : Technology & Engineering
Languages : en
Pages : 155
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Book Description
Epitaxial integration of III-V semiconductors on silicon substrates has been desired over decades for high application potential in microelectronics, photovoltaics, and beyond. The performance of optoelectronic devices is still severely impaired by critical defect mechanisms driven by the crucial polar-on-nonpolar heterointerface. This thesis reports almost lattice-matched growth of thin gallium phosphide films as a viable model system for III-V/Si(100) interface investigations. The impact of antiphase disorder on the heteroepitaxial growth surface provides quantitative optical in situ access to one of the most notorious defect mechanisms, even in the vapor phase ambient common for compound semiconductor technology. Precise control over the surface structure of the Si(100) substrates prior to III-V nucleation prevents the formation of antiphase domains. The hydrogen-based process ambient enables the preparation of anomalous double-layer step structures on Si(100), highly beneficial for subsequent III-V integration.
Author: Henning Döscher
Publisher: Springer Science & Business Media
ISBN: 3319028804
Category : Technology & Engineering
Languages : en
Pages : 155
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Book Description
Epitaxial integration of III-V semiconductors on silicon substrates has been desired over decades for high application potential in microelectronics, photovoltaics, and beyond. The performance of optoelectronic devices is still severely impaired by critical defect mechanisms driven by the crucial polar-on-nonpolar heterointerface. This thesis reports almost lattice-matched growth of thin gallium phosphide films as a viable model system for III-V/Si(100) interface investigations. The impact of antiphase disorder on the heteroepitaxial growth surface provides quantitative optical in situ access to one of the most notorious defect mechanisms, even in the vapor phase ambient common for compound semiconductor technology. Precise control over the surface structure of the Si(100) substrates prior to III-V nucleation prevents the formation of antiphase domains. The hydrogen-based process ambient enables the preparation of anomalous double-layer step structures on Si(100), highly beneficial for subsequent III-V integration.
Author: Stuart Irvine
Publisher: John Wiley & Sons
ISBN: 1119313031
Category : Technology & Engineering
Languages : en
Pages : 954
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Book Description
Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).
Author: Halyna Khlyap
Publisher: Bentham Science Publishers
ISBN: 1608050211
Category : Science
Languages : en
Pages : 134
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Book Description
"This well organized reference book covers the newest and most important practically applicable results in thin film-based semiconductor (A2B6-A4B6 and chalcogenide) sensors, heterojunction-based active elements and other devices. This book is written for "
Author: David Ritchie
Publisher: Elsevier
ISBN: 0128220848
Category : Technology & Engineering
Languages : en
Pages : 500
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Book Description
Semiconductor Nanodevices: Physics, Technology and Applications explores recent advances in the field. The behaviour of these devices is controlled by regions of nanoscale dimensions which typically determine the local density of electronic states and lead to the observation of a range of quantum effects with significant potential for exploitation. The book opens with an introduction describing the development of this research field over the past few decades which contrasts quantum-controlled devices to conventional nanoscale electronic devices where an emphasis has often been placed on minimising quantum effects. This introduction is followed by seven chapters describing electrical nanodevices and five chapters describing opto-electronic nanodevices; individual chapters review important recent advances. These chapters include specific fabrication details for the structures and devices described as well as a discussion of the physics made accessible. It is an important reference source for physicists, materials scientists and engineers who want to learn more about how semiconductor-based nanodevices are being developed for both science and potential industrial applications. The section on electrical devices includes chapters describing the study of electron correlation effects using transport in quantum point contacts and tunnelling between one-dimensional wires; the high-frequency pumping of single electrons; thermal effects in quantum dots; the use of silicon quantum dot devices for qubits and quantum computing; transport in topological insulator nanoribbons and a comprehensive discussion of noise in electrical nanodevices. The optical device section describes the use of self-assembled III-V semiconductor nanostructures embedded in devices for a range of applications, including quantum dots for single and entangled photon sources, quantum dots and nanowires in lasers and quantum dots in solar cells. - Explores the major industrial applications of semiconductor nanodevices - Explains fabrication techniques for the production of semiconductor nanodevices - Assesses the challenges for the mass production of semiconductor nanodevices
Author: E. Kasper
Publisher: CRC Press
ISBN: 1351093525
Category : Technology & Engineering
Languages : en
Pages : 411
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Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.
Author:
Publisher: ScholarlyEditions
ISBN: 1464965684
Category : Technology & Engineering
Languages : en
Pages : 673
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Book Description
Issues in Extreme Conditions Technology Research and Application: 2011 Edition is a ScholarlyEditions™ eBook that delivers timely, authoritative, and comprehensive information about Extreme Conditions Technology Research and Application. The editors have built Issues in Extreme Conditions Technology Research and Application: 2011 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about Extreme Conditions Technology Research and Application in this eBook to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Issues in Extreme Conditions Technology Research and Application: 2011 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Author: John E. Ayers
Publisher: CRC Press
ISBN: 1482254360
Category : Technology & Engineering
Languages : en
Pages : 660
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Book Description
In the past ten years, heteroepitaxy has continued to increase in importance with the explosive growth of the electronics industry and the development of a myriad of heteroepitaxial devices for solid state lighting, green energy, displays, communications, and digital computing. Our ever-growing understanding of the basic physics and chemistry underlying heteroepitaxy, especially lattice relaxation and dislocation dynamic, has enabled an ever-increasing emphasis on metamorphic devices. To reflect this focus, two all-new chapters have been included in this new edition. One chapter addresses metamorphic buffer layers, and the other covers metamorphic devices. The remaining seven chapters have been revised extensively with new material on crystal symmetry and relationships, III-nitride materials, lattice relaxation physics and models, in-situ characterization, and reciprocal space maps.
Author: Rajendra Singh
Publisher: Springer Nature
ISBN: 9819715717
Category :
Languages : en
Pages : 406
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Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1140
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Publisher:
ISBN:
Category : Engineering
Languages : en
Pages : 1092
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