Author: Emile Knystautas
Publisher: CRC Press
ISBN: 1351836757
Category : Technology & Engineering
Languages : en
Pages : 362
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Engineering Thin Films and Nanostructures with Ion Beams
Author: Emile Knystautas
Publisher: CRC Press
ISBN: 1351836757
Category : Technology & Engineering
Languages : en
Pages : 362
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Publisher: CRC Press
ISBN: 1351836757
Category : Technology & Engineering
Languages : en
Pages : 362
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Engineering Thin Films and Nanostructures with Ion Beams
Author: Emile Knystautas
Publisher: CRC Press
ISBN: 1420028294
Category : Technology & Engineering
Languages : en
Pages : 592
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Publisher: CRC Press
ISBN: 1420028294
Category : Technology & Engineering
Languages : en
Pages : 592
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Nanomagnetism
Author: A. Hernando
Publisher: Springer Science & Business Media
ISBN: 9401120544
Category : Science
Languages : en
Pages : 225
Book Description
The NATO Advanced Research Workshop on "Nanomagnetic Devices" was held in Miraflores de la Sierra, Madrid, Spain, from 14 to 19 September 1992. This book contains 21 invited articles related to suggestive and relevant aspects of Magnetism. The NATO Advanced Research Workshop was Co-directed by R.C. O'Handley, B. Heinrich and A. Hernando. The organisers as well as the participants are gratefully acknowledged to the NATO Science Committee. I also wish to thank the publishers for their advice and help in organizing the book. xi DESIDERATA OF STORAGE DEVICES C.E. YEACK-SCRANTON IBM Corporation, E02/005 5600 Cottle Road San Jose, CA 95139 USA ABSTRACT. Typical requirements on cost, capacity, and performance of today's magnetic storage devices and industry trends in these attributes are given. Scaling components, devices, and materials is shown to be a key factor in further improvement, Challenges to continued scaling are reviewed, particularly as they relate to magnetic nano-structures, materials, and characterization techniques.
Publisher: Springer Science & Business Media
ISBN: 9401120544
Category : Science
Languages : en
Pages : 225
Book Description
The NATO Advanced Research Workshop on "Nanomagnetic Devices" was held in Miraflores de la Sierra, Madrid, Spain, from 14 to 19 September 1992. This book contains 21 invited articles related to suggestive and relevant aspects of Magnetism. The NATO Advanced Research Workshop was Co-directed by R.C. O'Handley, B. Heinrich and A. Hernando. The organisers as well as the participants are gratefully acknowledged to the NATO Science Committee. I also wish to thank the publishers for their advice and help in organizing the book. xi DESIDERATA OF STORAGE DEVICES C.E. YEACK-SCRANTON IBM Corporation, E02/005 5600 Cottle Road San Jose, CA 95139 USA ABSTRACT. Typical requirements on cost, capacity, and performance of today's magnetic storage devices and industry trends in these attributes are given. Scaling components, devices, and materials is shown to be a key factor in further improvement, Challenges to continued scaling are reviewed, particularly as they relate to magnetic nano-structures, materials, and characterization techniques.
Ion Beam Induced Defects and Their Effects in Oxide Materials
Author: Parmod Kumar
Publisher: Springer Nature
ISBN: 303093862X
Category : Science
Languages : en
Pages : 68
Book Description
This book provides an overview of the applications of ion beam techniques in oxide materials. Oxide materials exhibit defect-induced physical properties relevant to applications in sensing, optoelectronics and spintronics. Defects in these oxide materials also lead to magnetism in non-magnetic materials or to a change of magnetic ordering in magnetic materials. Thus, an understanding of defects is of immense importance. To date, ion beam tools are considered the most effective techniques for producing controlled defects in these oxides. This book will detail the ion beam tools utilized for creating defects in oxides.
Publisher: Springer Nature
ISBN: 303093862X
Category : Science
Languages : en
Pages : 68
Book Description
This book provides an overview of the applications of ion beam techniques in oxide materials. Oxide materials exhibit defect-induced physical properties relevant to applications in sensing, optoelectronics and spintronics. Defects in these oxide materials also lead to magnetism in non-magnetic materials or to a change of magnetic ordering in magnetic materials. Thus, an understanding of defects is of immense importance. To date, ion beam tools are considered the most effective techniques for producing controlled defects in these oxides. This book will detail the ion beam tools utilized for creating defects in oxides.
Nanostructured Thin Films and Coatings
Author: Sam Zhang
Publisher: CRC Press
ISBN: 1420093975
Category : Technology & Engineering
Languages : en
Pages : 415
Book Description
Authored by leading experts from around the world, the three-volume Handbook of Nanostructured Thin Films and Coatings gives scientific researchers and product engineers a resource as dynamic and flexible as the field itself. The first two volumes cover the latest research and application of the mechanical and functional properties of thin films an
Publisher: CRC Press
ISBN: 1420093975
Category : Technology & Engineering
Languages : en
Pages : 415
Book Description
Authored by leading experts from around the world, the three-volume Handbook of Nanostructured Thin Films and Coatings gives scientific researchers and product engineers a resource as dynamic and flexible as the field itself. The first two volumes cover the latest research and application of the mechanical and functional properties of thin films an
Advances in Thin Films, Nanostructured Materials, and Coatings
Author: Alexander D. Pogrebnjak
Publisher: Springer
ISBN: 9811361339
Category : Technology & Engineering
Languages : en
Pages : 380
Book Description
This book highlights the latest advances in chemical and physical methods for thin-film deposition and surface engineering, including ion- and plasma-assisted processes, focusing on explaining the synthesis/processing–structure–properties relationship for a variety of thin-film systems. It covers topics such as advances in thin-film synthesis; new thin-film materials: diamond-like films, granular alloys, high-entropy alloys, oxynitrides, and intermetallic compounds; ultra-hard, wear- and oxidation-resistant and multifunctional coatings; superconducting, magnetic, semiconducting, and dielectric films; electrochemical and electroless depositions; thin-film characterization and instrumentation; and industrial applications.
Publisher: Springer
ISBN: 9811361339
Category : Technology & Engineering
Languages : en
Pages : 380
Book Description
This book highlights the latest advances in chemical and physical methods for thin-film deposition and surface engineering, including ion- and plasma-assisted processes, focusing on explaining the synthesis/processing–structure–properties relationship for a variety of thin-film systems. It covers topics such as advances in thin-film synthesis; new thin-film materials: diamond-like films, granular alloys, high-entropy alloys, oxynitrides, and intermetallic compounds; ultra-hard, wear- and oxidation-resistant and multifunctional coatings; superconducting, magnetic, semiconducting, and dielectric films; electrochemical and electroless depositions; thin-film characterization and instrumentation; and industrial applications.
Intelligent Energy Field Manufacturing
Author: Wenwu Zhang
Publisher: CRC Press
ISBN: 1420071033
Category : Technology & Engineering
Languages : en
Pages : 729
Book Description
Edited by prominent researchers and with contributions from experts in their individual areas, Intelligent Energy Field Manufacturing: Interdisciplinary Process Innovations explores a new philosophy of engineering. An in-depth introduction to Intelligent Energy Field Manufacturing (EFM), this book explores a fresh engineering methodology that not only integrates but goes beyond methodologies such as Design for Six Sigma, Lean Manufacturing, Concurrent Engineering, TRIZ, green and sustainable manufacturing, and more. This book gives a systematic introduction to classic non-mechanical manufacturing processes as well as offering big pictures of some technical frontiers in modern engineering. The book suggests that any manufacturing process is actually a process of injecting human intelligence into the interaction between material and the various energy fields in order to transfer the material into desired configurations. It discusses technological innovation, dynamic M-PIE flows, the generalities of energy fields, logic functional materials and intelligence, the open scheme of intelligent EFM implementation, and the principles of intelligent EFM. The book takes a highly interdisciplinary approach that includes research frontiers such as micro/nano fabrication, high strain rate processes, laser shock forming, materials science and engineering, bioengineering, etc., in addition to a detailed treatment of the so called "non-traditional" manufacturing processes, which covers waterjet machining, laser material processing, ultrasonic material processing, EDM/ECM, etc. Filled with illustrative pictures, figures, and tables that make technical materials more absorbable, the book cuts across multiple engineering disciplines. The majority of books in this area report the facts of proven knowledge, while the behind-the-scenes thinking is usually neglected. This book examines the big picture of manufacturing in depth before diving into the deta
Publisher: CRC Press
ISBN: 1420071033
Category : Technology & Engineering
Languages : en
Pages : 729
Book Description
Edited by prominent researchers and with contributions from experts in their individual areas, Intelligent Energy Field Manufacturing: Interdisciplinary Process Innovations explores a new philosophy of engineering. An in-depth introduction to Intelligent Energy Field Manufacturing (EFM), this book explores a fresh engineering methodology that not only integrates but goes beyond methodologies such as Design for Six Sigma, Lean Manufacturing, Concurrent Engineering, TRIZ, green and sustainable manufacturing, and more. This book gives a systematic introduction to classic non-mechanical manufacturing processes as well as offering big pictures of some technical frontiers in modern engineering. The book suggests that any manufacturing process is actually a process of injecting human intelligence into the interaction between material and the various energy fields in order to transfer the material into desired configurations. It discusses technological innovation, dynamic M-PIE flows, the generalities of energy fields, logic functional materials and intelligence, the open scheme of intelligent EFM implementation, and the principles of intelligent EFM. The book takes a highly interdisciplinary approach that includes research frontiers such as micro/nano fabrication, high strain rate processes, laser shock forming, materials science and engineering, bioengineering, etc., in addition to a detailed treatment of the so called "non-traditional" manufacturing processes, which covers waterjet machining, laser material processing, ultrasonic material processing, EDM/ECM, etc. Filled with illustrative pictures, figures, and tables that make technical materials more absorbable, the book cuts across multiple engineering disciplines. The majority of books in this area report the facts of proven knowledge, while the behind-the-scenes thinking is usually neglected. This book examines the big picture of manufacturing in depth before diving into the deta
Nanostructured Thin Films
Author: Maria Benelmekki
Publisher: Elsevier
ISBN: 0081025734
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Nanostructured Thin Films: Fundamentals and Applications presents an overview of the synthesis and characterization of thin films and their nanocomposites. Both vapor phase and liquid phase approaches are discussed, along with the methods that are sufficiently attractive for large-scale production. Examples of applications in clean energy, sensors, biomedicine, anticorrosion and surface modification are also included. As the applications of thin films in nanomedicine, cell phones, solar cell-powered devices, and in the protection of structural materials continues to grow, this book presents an important research reference for anyone seeking an informed overview on their structure and applications. - Shows how thin films are being used to create more efficient devices in the fields of medicine and energy harvesting - Discusses how to alter the design of nanostructured thin films by vapor phase and liquid phase methods - Explores how modifying the structure of thin films for specific applications enhances their performance
Publisher: Elsevier
ISBN: 0081025734
Category : Technology & Engineering
Languages : en
Pages : 336
Book Description
Nanostructured Thin Films: Fundamentals and Applications presents an overview of the synthesis and characterization of thin films and their nanocomposites. Both vapor phase and liquid phase approaches are discussed, along with the methods that are sufficiently attractive for large-scale production. Examples of applications in clean energy, sensors, biomedicine, anticorrosion and surface modification are also included. As the applications of thin films in nanomedicine, cell phones, solar cell-powered devices, and in the protection of structural materials continues to grow, this book presents an important research reference for anyone seeking an informed overview on their structure and applications. - Shows how thin films are being used to create more efficient devices in the fields of medicine and energy harvesting - Discusses how to alter the design of nanostructured thin films by vapor phase and liquid phase methods - Explores how modifying the structure of thin films for specific applications enhances their performance
Swift Heavy Ions for Materials Engineering and Nanostructuring
Author: Devesh Kumar Avasthi
Publisher: Springer Science & Business Media
ISBN: 9400712294
Category : Science
Languages : en
Pages : 292
Book Description
Ion beams have been used for decades for characterizing and analyzing materials. Now energetic ion beams are providing ways to modify the materials in unprecedented ways. This book highlights the emergence of high-energy swift heavy ions as a tool for tailoring the properties of materials with nanoscale structures. Swift heavy ions interact with materials by exciting/ionizing electrons without directly moving the atoms. This opens a new horizon towards the 'so-called' soft engineering. The book discusses the ion beam technology emerging from the non-equilibrium conditions and emphasizes the power of controlled irradiation to tailor the properties of various types of materials for specific needs.
Publisher: Springer Science & Business Media
ISBN: 9400712294
Category : Science
Languages : en
Pages : 292
Book Description
Ion beams have been used for decades for characterizing and analyzing materials. Now energetic ion beams are providing ways to modify the materials in unprecedented ways. This book highlights the emergence of high-energy swift heavy ions as a tool for tailoring the properties of materials with nanoscale structures. Swift heavy ions interact with materials by exciting/ionizing electrons without directly moving the atoms. This opens a new horizon towards the 'so-called' soft engineering. The book discusses the ion beam technology emerging from the non-equilibrium conditions and emphasizes the power of controlled irradiation to tailor the properties of various types of materials for specific needs.
Lens Design
Author: Milton Laikin
Publisher: CRC Press
ISBN: 1351838180
Category : Technology & Engineering
Languages : en
Pages : 347
Book Description
There is no shortage of lens optimization software on the market to deal with today's complex optical systems for all sorts of custom and standardized applications. But all of these software packages share one critical flaw: you still have to design a starting solution. Continuing the bestselling tradition of the author's previous books, Lens Design, Fourth Edition is still the most complete and reliable guide for detailed design information and procedures for a wide range of optical systems. Milton Laikin draws on his varied and extensive experience, ranging from innovative cinematographic and special-effects optical systems to infrared and underwater lens systems, to cover a vast range of special-purpose optical systems and their detailed design and analysis. This edition has been updated to replace obsolete glass types and now includes several new designs and sections on stabilized systems, the human eye, spectrographic systems, and diffractive systems. A new CD-ROM accompanies this edition, offering extensive lens prescription data and executable ZEMAX files corresponding to figures in the text. Filled with sage advice and completely illustrated, Lens Design, Fourth Edition supplies hands-on guidance for the initial design and final optimization for a plethora of commercial, consumer, and specialized optical systems.
Publisher: CRC Press
ISBN: 1351838180
Category : Technology & Engineering
Languages : en
Pages : 347
Book Description
There is no shortage of lens optimization software on the market to deal with today's complex optical systems for all sorts of custom and standardized applications. But all of these software packages share one critical flaw: you still have to design a starting solution. Continuing the bestselling tradition of the author's previous books, Lens Design, Fourth Edition is still the most complete and reliable guide for detailed design information and procedures for a wide range of optical systems. Milton Laikin draws on his varied and extensive experience, ranging from innovative cinematographic and special-effects optical systems to infrared and underwater lens systems, to cover a vast range of special-purpose optical systems and their detailed design and analysis. This edition has been updated to replace obsolete glass types and now includes several new designs and sections on stabilized systems, the human eye, spectrographic systems, and diffractive systems. A new CD-ROM accompanies this edition, offering extensive lens prescription data and executable ZEMAX files corresponding to figures in the text. Filled with sage advice and completely illustrated, Lens Design, Fourth Edition supplies hands-on guidance for the initial design and final optimization for a plethora of commercial, consumer, and specialized optical systems.