Electron Beam Physical Vapor Deposition Through Tungsten

Electron Beam Physical Vapor Deposition Through Tungsten PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Book Description
High temperature alloys for application to power generation and aircraft engine gas turbine components are presently at their performance limits. New alloys that use intermetallic matrix composites (IMCs) offer a path to higher efficiency engines. Cost-effective synthesis of these revolutionary materials will depend on the development of more efficient processing techniques. Electron beam physical vapor deposition (EB-PVD), enhanced by refractory element addition, offers a key to both increased deposition rate and composition control for these demanding new materials. Initial results with tungsten-assisted EB-PVD had been so dramatic that it became important to investigate the mechanism of this process and to determine the ease with which it could be implemented in EB-PVD machines of different design. The research presented in this report investigates the effects of refractory metal addition on electron beam physical vapor deposition (EB-PVD) of Ni-base alloys containing Co, Cr and Al. Experiments were conducted in which W, Nb, Ta, Mo, or Re was added to pure Ni or Ni-base alloy evaporation pools to study the effects that the various refractory elements had on evaporation rate and the composition control of the deposit. These experiments employed three distinctly different sets of evaporation equipment, so that the effects of processing variables could also be examined. Deposit compositions, deposition rates, and evaporation pool compositions were evaluated in order to determine the effects of refractory addition on the evaporation process. The relationship between deposit properties such as deposition rate, chemistry, and microstructure, and processing parameters such as applied power, electron beam pattern frequency, beam focus, and height of the liquid pool in the crucible were also investigated.

Electron Beam Physical Vapor Deposition Through Tungsten

Electron Beam Physical Vapor Deposition Through Tungsten PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Book Description
High temperature alloys for application to power generation and aircraft engine gas turbine components are presently at their performance limits. New alloys that use intermetallic matrix composites (IMCs) offer a path to higher efficiency engines. Cost-effective synthesis of these revolutionary materials will depend on the development of more efficient processing techniques. Electron beam physical vapor deposition (EB-PVD), enhanced by refractory element addition, offers a key to both increased deposition rate and composition control for these demanding new materials. Initial results with tungsten-assisted EB-PVD had been so dramatic that it became important to investigate the mechanism of this process and to determine the ease with which it could be implemented in EB-PVD machines of different design. The research presented in this report investigates the effects of refractory metal addition on electron beam physical vapor deposition (EB-PVD) of Ni-base alloys containing Co, Cr and Al. Experiments were conducted in which W, Nb, Ta, Mo, or Re was added to pure Ni or Ni-base alloy evaporation pools to study the effects that the various refractory elements had on evaporation rate and the composition control of the deposit. These experiments employed three distinctly different sets of evaporation equipment, so that the effects of processing variables could also be examined. Deposit compositions, deposition rates, and evaporation pool compositions were evaluated in order to determine the effects of refractory addition on the evaporation process. The relationship between deposit properties such as deposition rate, chemistry, and microstructure, and processing parameters such as applied power, electron beam pattern frequency, beam focus, and height of the liquid pool in the crucible were also investigated.

Encyclopedia of Nanotechnology

Encyclopedia of Nanotechnology PDF Author: Bharat Bhushan
Publisher: Springer
ISBN: 9789048197521
Category : Technology & Engineering
Languages : en
Pages : 2868

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Book Description
The Encyclopedia of Nanotechnology provides a comprehensive and multi-disciplinary reference to the many fields relevant to the general field of nanotechnology. It aims to be a comprehensive and genuinely international reference work and will be aimed at graduate students, researchers, and practitioners. The Encyclopedia of Nanotechnology introduces a large number of terms, devices and processes which are related to the multi-disciplinary field of Nanotechnology. For each entry in this 4 volume set a 4-10 page description is provided by an expert in the field. Contributions are made by experts from the US, Europe and Asia, making this a comprehensive and truly international Reference Work. The authors are typically from academia, however one quarter of all entries were written by persons from industry. Topics covered in the Reference Work include: - Nano- Microfabrication Processes and Materials for Fabrication - Nanoscale Measurement Techniques - Nanostructures - Nanomaterials - Nanomechanics - Molecular Modeling and Its Role in Advancing Nanotechnology - MEMS/NEMS - Microfluidics and Nanofluidics - Biomedical Engineering and Biodevices - Bio/Nanotechnology and Nanomedicine - Bio/Nanotechnology for cellular engineering - Drug Delivery – Technology and Applications - Assembly - Organic Electronics - Nano-optical Devices - Micro/nano Integration - Materials, Coatings and Surface Treatments for Nanotribology - Micro/NanoReliability – thermal, mechanical etc. - Biomimetics

Handbook of Physical Vapor Deposition (PVD) Processing

Handbook of Physical Vapor Deposition (PVD) Processing PDF Author: D. M. Mattox
Publisher: Cambridge University Press
ISBN: 0080946585
Category : Technology & Engineering
Languages : en
Pages : 947

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Book Description
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

The Deposition and Microstructure of Tungsten Oxide Films by Physical Vapor Deposition

The Deposition and Microstructure of Tungsten Oxide Films by Physical Vapor Deposition PDF Author: 李泉
Publisher:
ISBN:
Category :
Languages : zh-CN
Pages :

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Book Description


Handbook of Research on Tribology in Coatings and Surface Treatment

Handbook of Research on Tribology in Coatings and Surface Treatment PDF Author: Pakseresht, Amirhossein
Publisher: IGI Global
ISBN: 1799896854
Category : Technology & Engineering
Languages : en
Pages : 470

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Book Description
Advances are continuously being made in applying the coatings and surface treatments by different techniques to reduce the damages from tribology. Engineers need more detailed information to compare the capability of each coating process in wear resistant and lubrication applications. It is also important to focus on the concepts of tribology in various applications such as the manufacturing process, bio implants, machine elements, and corrosive environments. The need for a comprehensive resource addressing these findings in order to improve wear resistance is unavoidable. The Handbook of Research on Tribology in Coatings and Surface Treatment evaluates the latest advances the fabrication of wear-resistant and lubricant coatings by different techniques and investigates wear-resistant coatings and surface treatments in various applications such as the automobile industry. Covering a wide range of topics such as lubricant coatings and wearable electronic devices, it is ideal for engineers, industry professionals, researchers, academicians, scholars, practitioners, instructors, and students.

Tungsten Research and Development Review

Tungsten Research and Development Review PDF Author: J. L. Ratliff
Publisher:
ISBN:
Category : Research and development projects
Languages : en
Pages : 70

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Book Description
Government-sponsored tungsten research and development efforts encompass a broad rage of technological activities. Typifying the extreme limits of efforts since January, 1960, studies have ranged from preparation of unalloyed metal to development of high-integrity fabricated shapes of tungsten-base materials. Nine major areas outline the broad over-all effort, and each is summarized within this report by brief technical discussions of 104 separate studies on 79 research programs. Included are preparation of metal, consolidation, primary and secondary working, joining, fabrication and performance of rocket nozzles, oxidation and other high-temperature reactions, protective coatings, properties, and physical metallurgy.

Preparation and Evaluation of Vapor-deposited Tungsten

Preparation and Evaluation of Vapor-deposited Tungsten PDF Author: R. L. Heestand
Publisher:
ISBN:
Category : Electron microscopy
Languages : en
Pages : 44

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Book Description


EUROCVD 15

EUROCVD 15 PDF Author: Anjana Devi
Publisher: The Electrochemical Society
ISBN: 9781566774277
Category : Technology & Engineering
Languages : en
Pages : 1128

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Book Description


Code of Federal Regulations

Code of Federal Regulations PDF Author:
Publisher:
ISBN:
Category : Administrative law
Languages : en
Pages : 866

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Book Description
Special edition of the Federal Register, containing a codification of documents of general applicability and future effect ... with ancillaries.

Dopant Concentration Influence on Tunnel Formation in Chemically Vapor - Deposited Tungsten on Silicon

Dopant Concentration Influence on Tunnel Formation in Chemically Vapor - Deposited Tungsten on Silicon PDF Author: Lucia My Feng
Publisher:
ISBN:
Category :
Languages : en
Pages : 206

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Book Description