Author: Vibhu Jindal
Publisher:
ISBN:
Category : Metal organic chemical vapor deposition
Languages : en
Pages : 263

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Author: Jie Su
Publisher:
ISBN:
Category :
Languages : en
Pages : 356

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Author: Zohair Zaidi
Publisher:
ISBN:
Category : Gallium nitride
Languages : en
Pages : 80

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Book Description
III-Nitride nanostructures have been an active area of research.

Author: Zhe Chuan Feng
Publisher: Imperial College Press
ISBN: 1860949037
Category : Technology & Engineering
Languages : en
Pages : 442

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Book Description
III-Nitride semiconductor materials OCo (Al, In, Ga)N OCo are excellent wide band gap semiconductors very suitable for modern electronic and optoelectronic applications. Remarkable breakthroughs have been achieved recently, and current knowledge and data published have to be modified and upgraded. This book presents the new developments and achievements in the field. Written by renowned experts, the review chapters in this book cover the most important topics and achievements in recent years, discuss progress made by different groups, and suggest future directions. Each chapter also describes the basis of theory or experiment. The III-Nitride-based industry is building up and new economic developments from these materials are promising. It is expected that III-Nitride-based LEDs may replace traditional light bulbs to realize a revolution in lighting. This book is a valuable source of information for engineers, scientists and students working towards such goals. Sample Chapter(s). Chapter 1: Hydride Vapor Phase Epitaxy of Group III Nitride Materials (540 KB). Contents: Hydride Vapor Phase Epitaxy of Group III Nitride Materials (V Dmitriev & A Usikov); Planar MOVPE Technology for Epitaxy of III-Nitride Materials (M Dauelsberg et al.); Close-Coupled Showerhead MOCVD Technology for the Epitaxy of GaN and Related Materials (E J Thrush & A R Boyd); Molecular Beam Epitaxy for III-N Materials (H Tang & J Webb); Growth and Properties of Nonpolar GaN Films and Heterostructures (Y J Sun & O Brandt); Indium-Nitride Growth by High-Pressure CVD: Real-Time and Ex-Situ Characterization (N Dietz); A New Look on InN (L-W Tu et al.); Growth and Optical/Electrical Properties of Al x Ga 1-x N Alloys in the Full Composition Range (F Yun); Optical Investigation of InGaN/GaN Quantum Well Structures Grown by MOCVD (T Wang); Clustering Nanostructures and Optical Characteristics in InGaN/GaN Quantum-Well Structures with Silicon Doping (Y-C Cheng et al.); III-Nitrides Micro- and Nano-Structures (H M Ng & A Chowdhury); New Developments in Dilute Nitride Semiconductor Research (W Shan et al.). Readership: Scientists; material growers and evaluators; device design, processing engineers; postgraduate and graduate students in electrical & electronic engineering and materials engineering.

Author: Bed Nidhi Pantha
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Book Description
III-nitride nanostructures and devices were synthesized by metal organic chemical vapor deposition (MOCVD) for their applications in various photonic, optoelectronic, and energy devices such as deep ultraviolet (DUV) photodetectors, solar cells, visible emitters, thermometric (TE) power generators, etc. Structural and optical properties in thicker AlN epilayers were found to be better than those in thinner AlN epilayers. Full-width at half maxima (FWHM) of x-ray diffraction (XRD) rocking curves as small as 63 and 437 arcsec were measured at (002) and (102) reflections, respectively in a thick AlN epilayer (4 mm). The dark current of the fabricated AlN detectors decreases drastically as AlN epilayer thickness increases. DUV photoluminescence (PL) spectroscopy and x-ray diffraction (XRD) measurements were employed to study the effect of biaxial stress in AlN epilayers grown on different substrates. Stress-induced band gap shift of 45 meV/GPa was obtained in AlN epilayers. The potential of InGaN alloys as TE materials for thermopower generation has been investigated. It was found that as In content increases, thermal conductivity decreases and power factor increases, which leads to an increase in the TE figure of merit (ZT). The value of ZT was found to be 0.08 at 300 K and reached 0.23 at 450 K for In0.36Ga0.64N alloy, which is comparable to that of SiGe based alloys. Single phase In[subscript]xGa1[subscript]xN alloys inside the theoretically predicted miscibility gap region (x = 0.4 to 0.7) were successfully synthesized. A single peak of XRD [W-20] scans of the (002) plane in InGaN alloys confirms that there is no phase separation. Electrical properties and surface morphologies were found to be reasonably good. It was found that growth rate should be high enough (>400 nm/hr) to achieve high quality and single phase In[subscript]xGa1[subscript]xN alloys in this miscibility gap region. Mg-doped In[subscript]xGa1−[subscript]xN alloys were synthesized and characterized by Hall-effect and PL measurements for their application as visible emitters. P-type conductivity was measured up to x = 0.35 with accepter activation energy as low as 43 meV, which is about 4 times lower than that of Mg-doped p-type GaN. Resistivity as low as 0.4 [omega]-cm with a free hole concentration as high as 5x1018 cm-3 was measured in Mg-doped In0.22Ga0.--N. PL intensity decreased ~3 orders in magnitude when x increased from 0 to 0.22 in Mg-doped In[subscript]xGa1−[subscript]xN alloys.

Author: Zhe Chuan Feng
Publisher: World Scientific
ISBN: 1786343207
Category : Science
Languages : en
Pages : 424

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Book Description
Group III-Nitrides semiconductor materials, including GaN, InN, AlN, InGaN, AlGaN and AlInGaN, i.e. (Al, In, Ga)N, are excellent semiconductors, covering the spectral range from deep ultraviolet (DUV) to UV, visible and infrared, with unique properties very suitable for modern electronic and optoelectronic applications. Remarkable breakthroughs have been achieved in recent years for research and development (R&D) in these materials and devices, such as high-power and high brightness UV-blue-green-white light emitting diodes (LEDs), UV-blue-green laser diodes (LDs), photo-detectors and various optoelectronics and electronics devices and applications.The Nobel Prize in Physics 2014 was awarded jointly to Isamu Akasaki, Hiroshi Amano and Shuji Nakamura 'for the invention of efficient blue light-emitting diodes which has enabled bright and energy-saving white light sources'. Red and green diodes had been invented since 1960s-70s but without blue LED. Despite considerable efforts, the blue LED had remained a challenge for a long time. The success and inventions on GaN-based LEDs were revolutionary and benefiting for mankind. III-Nitrides-based industry has formed and acquired rapid developments over the world. Incandescent light bulbs lit the 20th century and the 21st century will be lit by LED lamps.Before this book, the editor has edited two books, III-Nitride Semiconductor Materials (2006) and III-Nitride Devices and Nanoengineering (2008), both published by ICP/WSP, in the fields of III-Nitride. The developments of these materials and devices are moving rapidly. Many data or knowledge, some even just published only recently, have been modified and needed to be upgraded. This new book, III-Nitride Materials, Devices and Nano-Structures as the third instalment, will cover the rapid new developments and achievements in the III-Nitride fields, particularly those made since 2009.

Author: Zhe Chuan Feng
Publisher: Imperial College Press
ISBN: 1848162243
Category : Technology & Engineering
Languages : en
Pages : 477

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Book Description
Devices, nanoscale science and technologies based on GaN and related materials, have achieved great developments in recent years. New GaN-based devices such as UV detectors, fast p-HEMT and microwave devices are developed far more superior than other semiconductor materials-based devices.Written by renowned experts, the review chapters in this book cover the most important topics and achievements in recent years, discuss progress made by different groups, and suggest future directions. Each chapter also describes the basis of theory and experiment.This book is an invaluable resource for device design and processing engineers, material growers and evaluators, postgraduates and scientists as well as newcomers in the GaN field.

Author: David Wood
Publisher:
ISBN:
Category :
Languages : en
Pages : 166

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Indium gallium nitride nanostructures were grown at a temperature of 600oC and a total V/III ratio of 10,000. Below an indium fraction of 0.20 nanostructures were observed with diameters between 200 and 350 nanometers. The diameters were found to decrease with increasing indium fraction. Texturing in the (0001) c-plane direction was also enhanced as the indium fraction was increased. At indium fractions above 0.20 the formation of metal droplets within a porous indium gallium nitride film were observed. There are several untried deposition recipes that can yet be attempted to grow the nanostructures over the entire compositional range of the indium gallium nitride alloy.

Author: Stuart Irvine
Publisher: John Wiley & Sons
ISBN: 1119313015
Category : Technology & Engineering
Languages : en
Pages : 582

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Book Description
Systematically discusses the growth method, material properties, and applications for key semiconductor materials MOVPE is a chemical vapor deposition technique that produces single or polycrystalline thin films. As one of the key epitaxial growth technologies, it produces layers that form the basis of many optoelectronic components including mobile phone components (GaAs), semiconductor lasers and LEDs (III-Vs, nitrides), optical communications (oxides), infrared detectors, photovoltaics (II-IV materials), etc. Featuring contributions by an international group of academics and industrialists, this book looks at the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring. It covers the most important materials from III-V and II-VI compounds to quantum dots and nanowires, including sulfides and selenides and oxides/ceramics. Sections in every chapter of Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications cover the growth of the particular materials system, the properties of the resultant material, and its applications. The book offers information on arsenides, phosphides, and antimonides; nitrides; lattice-mismatched growth; CdTe, MCT (mercury cadmium telluride); ZnO and related materials; equipment and safety; and more. It also offers a chapter that looks at the future of the technique. Covers, in order, the growth method, material properties, and applications for each material Includes chapters on the fundamentals of MOVPE and the key areas of equipment/safety, precursor chemicals, and growth monitoring Looks at important materials such as III-V and II-VI compounds, quantum dots, and nanowires Provides topical and wide-ranging coverage from well-known authors in the field Part of the Materials for Electronic and Optoelectronic Applications series Metalorganic Vapor Phase Epitaxy (MOVPE): Growth, Materials Properties and Applications is an excellent book for graduate students, researchers in academia and industry, as well as specialist courses at undergraduate/postgraduate level in the area of epitaxial growth (MOVPE/ MOCVD/ MBE).

Author: ConferenceSeries
Publisher: ConferenceSeries
ISBN:
Category :
Languages : en
Pages : 122

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Book Description
September 7-8 2017 Edinburgh, Scotland Key Topics : Advanced Materials Engineering, Advanced Ceramics and Composite Materials, Polymers Science and Engineering, Advancement in Nanomaterials Science And Nanotechnology, Metals, Metallurgy and Materials, Optical, Electronic and Magnetic Materials, Advanced Biomaterials, Bio devices & Tissue Engineering, Materials for Energy application& Energy storage, Carbon Based Nanoscale Materials, Entrepreneurs Investment Meet, Materials Processing and characterization, Processing and Fabrication of Advanced Materials, Emerging Areas of Materials Science, Materials Based Engineering Design and Control, Materials Engineering and Performance, Materials Science and Engineering, Needs, Priorities and Opportunities For Materials, Material Properties at High Temperature Applications, Coatings and Surface Engineering, Functional Materials, Materials For Engineering and Environmental Sustainability,