Author: National Aeronautics and Space Administration (NASA)
Publisher: Createspace Independent Publishing Platform
ISBN: 9781722966454
Category :
Languages : en
Pages : 112
Book Description
Evaporated copper films were exposed to an atomic oxygen flux of 1.4 x 10(exp 17) atoms/sq cm per sec at temperatures in the range 285 to 375 F (140 to 191 C) for time intervals between 2 and 50 minutes. Rutherford backscattering spectroscopy (RBS) was used to determine the thickness of the oxide layers formed and the ratio of the number of copper to oxygen atoms in the layers. Oxide film thicknesses ranged from 50 to 3000 A (0.005 to 0.3 microns, or equivalently, 5 x 10(exp -9) to 3 x 10(exp -7); it was determined that the primary oxide phase was Cu2O. The growth law was found to be parabolic (L(t) varies as t(exp 1/2)), in which the oxide thickness L(t) increases as the square root of the exposure time t. The analysis of the data is consistent with either of the two parabolic growth laws. (The thin-film parabolic growth law is based on the assumption that the process is diffusion controlled, with the space charge within the growing oxide layer being negligible. The thick-film parabolic growth law is also based on a diffusion controlled process, but space-charge neutrality prevails locally within very thick oxides.) In the absence of a voltage measurement across the growing oxide, a distinction between the two mechanisms cannot be made, nor can growth by the diffusion of neutral atomic oxygen be entirely ruled out. The activation energy for the reaction is on the order of 1.1 eV (1.76 x 10(exp -19) joule, or equivalently, 25.3 kcal/mole). Fromhold, A. T. and Williams, J. R. Unspecified Center ACTIVATION ENERGY; CHEMICAL REACTIONS; COPPER; ELECTRICAL MEASUREMENT; FILM THICKNESS; OXIDE FILMS; OXYGEN ATOMS; BACKSCATTERING; NEUTRAL ATOMS; NEUTRAL GASES; SPACE CHARGE; SPECTROSCOPY...
Chemical Reaction of Atomic Oxygen with Evaporated Films of Copper
Author: National Aeronautics and Space Administration (NASA)
Publisher: Createspace Independent Publishing Platform
ISBN: 9781722966454
Category :
Languages : en
Pages : 112
Book Description
Evaporated copper films were exposed to an atomic oxygen flux of 1.4 x 10(exp 17) atoms/sq cm per sec at temperatures in the range 285 to 375 F (140 to 191 C) for time intervals between 2 and 50 minutes. Rutherford backscattering spectroscopy (RBS) was used to determine the thickness of the oxide layers formed and the ratio of the number of copper to oxygen atoms in the layers. Oxide film thicknesses ranged from 50 to 3000 A (0.005 to 0.3 microns, or equivalently, 5 x 10(exp -9) to 3 x 10(exp -7); it was determined that the primary oxide phase was Cu2O. The growth law was found to be parabolic (L(t) varies as t(exp 1/2)), in which the oxide thickness L(t) increases as the square root of the exposure time t. The analysis of the data is consistent with either of the two parabolic growth laws. (The thin-film parabolic growth law is based on the assumption that the process is diffusion controlled, with the space charge within the growing oxide layer being negligible. The thick-film parabolic growth law is also based on a diffusion controlled process, but space-charge neutrality prevails locally within very thick oxides.) In the absence of a voltage measurement across the growing oxide, a distinction between the two mechanisms cannot be made, nor can growth by the diffusion of neutral atomic oxygen be entirely ruled out. The activation energy for the reaction is on the order of 1.1 eV (1.76 x 10(exp -19) joule, or equivalently, 25.3 kcal/mole). Fromhold, A. T. and Williams, J. R. Unspecified Center ACTIVATION ENERGY; CHEMICAL REACTIONS; COPPER; ELECTRICAL MEASUREMENT; FILM THICKNESS; OXIDE FILMS; OXYGEN ATOMS; BACKSCATTERING; NEUTRAL ATOMS; NEUTRAL GASES; SPACE CHARGE; SPECTROSCOPY...
Publisher: Createspace Independent Publishing Platform
ISBN: 9781722966454
Category :
Languages : en
Pages : 112
Book Description
Evaporated copper films were exposed to an atomic oxygen flux of 1.4 x 10(exp 17) atoms/sq cm per sec at temperatures in the range 285 to 375 F (140 to 191 C) for time intervals between 2 and 50 minutes. Rutherford backscattering spectroscopy (RBS) was used to determine the thickness of the oxide layers formed and the ratio of the number of copper to oxygen atoms in the layers. Oxide film thicknesses ranged from 50 to 3000 A (0.005 to 0.3 microns, or equivalently, 5 x 10(exp -9) to 3 x 10(exp -7); it was determined that the primary oxide phase was Cu2O. The growth law was found to be parabolic (L(t) varies as t(exp 1/2)), in which the oxide thickness L(t) increases as the square root of the exposure time t. The analysis of the data is consistent with either of the two parabolic growth laws. (The thin-film parabolic growth law is based on the assumption that the process is diffusion controlled, with the space charge within the growing oxide layer being negligible. The thick-film parabolic growth law is also based on a diffusion controlled process, but space-charge neutrality prevails locally within very thick oxides.) In the absence of a voltage measurement across the growing oxide, a distinction between the two mechanisms cannot be made, nor can growth by the diffusion of neutral atomic oxygen be entirely ruled out. The activation energy for the reaction is on the order of 1.1 eV (1.76 x 10(exp -19) joule, or equivalently, 25.3 kcal/mole). Fromhold, A. T. and Williams, J. R. Unspecified Center ACTIVATION ENERGY; CHEMICAL REACTIONS; COPPER; ELECTRICAL MEASUREMENT; FILM THICKNESS; OXIDE FILMS; OXYGEN ATOMS; BACKSCATTERING; NEUTRAL ATOMS; NEUTRAL GASES; SPACE CHARGE; SPECTROSCOPY...
Scientific and Technical Aerospace Reports
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704
Book Description
Monthly Catalogue, United States Public Documents
Author:
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 752
Book Description
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 752
Book Description
Monthly Catalog of United States Government Publications
Author:
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages :
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ISBN:
Category : Government publications
Languages : en
Pages :
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Government Reports Announcements & Index
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 970
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 970
Book Description
An Oxidation Study of Thin Evaporated Copper Films by Electron Diffraction
Author: Joseph Joy Yee Shin
Publisher:
ISBN:
Category : Copper
Languages : en
Pages : 290
Book Description
Publisher:
ISBN:
Category : Copper
Languages : en
Pages : 290
Book Description
Government Reports Annual Index
Author:
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 1232
Book Description
Publisher:
ISBN:
Category : Government publications
Languages : en
Pages : 1232
Book Description
Technical News Bulletin
Author:
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 20
Book Description
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 20
Book Description
Technical News Bulletin
Author: United States. National Bureau of Standards
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 490
Book Description
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 490
Book Description
Technical News Bulletin of the National Bureau of Standards
Author:
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 732
Book Description
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 732
Book Description