Characterization of Mechanical Properties of Microelectronic Thin Films PDF Download
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Author: Fariborz Maseeh
Publisher:
ISBN:
Category :
Languages : en
Pages : 392
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Book Description
Author: Fariborz Maseeh
Publisher:
ISBN:
Category :
Languages : en
Pages : 392
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Book Description
Author: Fariborz Maseeh-Tehrani
Publisher:
ISBN:
Category : Microstructure
Languages : en
Pages : 392
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Book Description
Author: Patrick Waters
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
ABSTRACT: Thin films are used for a variety of applications, which can include electronic devices, optical coatings and decorative parts. They are used for their physical, electrical, magnetic, optical and mechanical properties, and many times these properties are required simultaneously. Obtaining these desired properties starts with the deposition process and they are verified by a number of analysis techniques after deposition. A DC magnetron sputter system was used here to deposit tungsten films, with film thickness and residual stress uniformity being of primary interest. The film thickness was measured to vary by up to 45 % from the center to outer edge of a 4" wafer. Ar pressure was found to influence the thin film residual stress with lower Ar pressures leading to compressive residual stress ( -1.5 GPa) and higher Ar pressures leading to tensile residual stress (1 GPa). Residual stress measurements of the tungsten films were made using a wafer curvature technique and X-ray diffraction. The results of the two techniques were compared and found to be within 20 %. Nanoindentation was used to analyze the mechanical properties of several types of thin films that are commonly used in microelectronic devices. Thin film reduced modulus, hardness, interfacial toughness and fracture toughness were some of the mechanical properties measured. Difficulties with performing shallow indents (less than 100 nm) were addressed, with proper calibration procedures for the indentation equipment and tip area function detailed. Pile-up during the indentation of soft films will lead to errors in the indentation contact depth and area, leading to an overestimation of the films' reduced modulus and hardness. A method was developed to account for pile-up in determining the indentation contact depth and calculating a new contact area for improving the analysis of reduced modulus and hardness. Residual stresses in thin films are normally undesired because in extreme cases they may result in thru-film cracking or interfacial film delamination. With the use of lithography techniques to pattern wafers with areas of an adhesion reducing layer, thin film delamination was controlled. The patterned delamination microchannels may be used as an alternative method of creating microchannels for fluid transport in MEMS devices. Delamination morphology was influenced by the amount of residual stress in the film and the critical buckling stress, which was primarily controlled by the width of the adhesion reducing layers.
Author: Chung-Jen Lu
Publisher:
ISBN:
Category :
Languages : en
Pages : 384
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Book Description
Author: Klaus Wetzig
Publisher: John Wiley & Sons
ISBN: 3527606475
Category : Science
Languages : en
Pages : 388
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Book Description
This up-to-date handbook covers the main topics of preparation, characterization and properties of complex metal-based layer systems. The authors -- an outstanding group of researchers -- discuss advanced methods for structure, chemical and electronic state characterization with reference to the properties of thin functional layers, such as metallization and barrier layers for microelectronics, magnetoresistive layers for GMR and TMR, sensor and resistance layers. As such, the book addresses materials specialists in industry, especially in microelectronics, as well as scientists, and can also be recommended for advanced studies in materials science, analytics, surface and solid state science.
Author: K. N. Tu
Publisher: Elsevier
ISBN: 1483218295
Category : Technology & Engineering
Languages : en
Pages : 351
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Book Description
Treatise on Materials Science and Technology, Volume 24: Preparation and Properties of Thin Films covers the progress made in the preparation of thin films and the corresponding study of their properties. The book discusses the preparation and property correlations in thin film; the variation of microstructure of thin films; and the molecular beam epitaxy of superlattices in thin film. The text also describes the epitaxial growth of silicon structures (thermal-, laser-, and electron-beam-induced); the characterization of grain boundaries in bicrystalline thin films; and the mechanical properties of thin films on substrates. The ion beam modification of thin film; the use of thin alloy films for metallization in microelectronic devices; and the fabrication and physical properties of ultrasmall structures are also encompassed. Materials scientists and materials engineers will find the book invaluable.
Author: Mikhail Baklanov
Publisher: John Wiley & Sons
ISBN: 0470065419
Category : Technology & Engineering
Languages : en
Pages : 508
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Book Description
The topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments made by the scientific leaders in the area of modern dielectric films for advanced microelectronic applications. It contains clear, concise explanations of material science of dielectric films and their problem for device operation, including high-k, low-k, medium-k dielectric films and also specific features and requirements for dielectric films used in the packaging technology. A broad range of related topics are covered, from physical principles to design, fabrication, characterization, and applications of novel dielectric films.
Author: Ajay Pasupuleti
Publisher:
ISBN:
Category : Microelectromechanical systems
Languages : en
Pages : 290
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Book Description
"This research aims at analyzing the effective mechanical properties of thin film materials that are used in MEMS. Using the effective mechanical properties, reliable simulations of new or slightly altered designs can be performed successfully. The main reason for investigating effective material properties of MEMS devices is that the existing techniques can not provide consistent prediction of the mechanical properties without timely and costly physical prototyping if the device or the fabrication recipe is slightly altered. To achieve this goal, two approaches were investigated: soft computing and analytical. In the soft computing approach, the effective material properties are empirically modeled and estimated based on experimental data and the relationships between the parameters affecting the mechanical properties of devices are discovered. In this approach, 2D-search, Micro Genetic Algorithms, neural networks, and Radial Basis Functions Networks were explored for the search of the effective material properties of the thin films with the help of a Finite Element Analysis (FEA) and modeling the mechanical behavior such that the effective material properties can be estimated for a new device. In the analytical approach, the physical behavior of the thin films is modeled analytically using standard elastic theories such as Stoney's formulae. As a case study, bilayer cantilevers of various dimensions were fabricated for extracting the effective Young's modulus of thin film materials: Aluminum, TetraEthylOrthoSilicate (TEOS) based SiO2, and Polyimide. In addition, a Matlab® graphical user interface (GUI), STEAM, is developed which interfaces with Ansys®. In STEAM, a fuzzy confidence factor is also developed which interfaces with Ansys®. In STEAM, a fuzzy confidence factor is also developed to validate the reliability of the estimates based on factors such as facility and recipe dependent variables. The results obtained from both approaches generated comparable effective material properties which are in accord with the experimental measurements. The results show that effective material properties of thin films can be estimated so that reliable MEMS devices can be designed without timely and costly physical prototyping"--Abstract.
Author: Hartmut Frey
Publisher: Springer Science & Business Media
ISBN: 3642054307
Category : Technology & Engineering
Languages : en
Pages : 385
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Book Description
“Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.
Author: Mohamed Gad-el-Hak
Publisher: CRC Press
ISBN: 9781420050905
Category : Technology & Engineering
Languages : en
Pages : 1386
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Book Description
The revolution is well underway. Our understanding and utilization of microelectromechanical systems (MEMS) are growing at an explosive rate with a worldwide market approaching billions of dollars. In time, microdevices will fill the niches of our lives as pervasively as electronics do right now. But if these miniature devices are to fulfill their mammoth potential, today's engineers need a thorough grounding in the underlying physics, modeling techniques, fabrication methods, and materials of MEMS. The MEMS Handbook delivers all of this and more. Its team of authors-unsurpassed in their experience and standing in the scientific community- explore various aspects of MEMS: their design, fabrication, and applications as well as the physical modeling of their operations. Designed for maximum readability without compromising rigor, it provides a current and essential overview of this fledgling discipline.
