Characterization of Growth and Thermal Behaviors of Thin Films for the Advanced Gate Stack Grown by Chemical Vapor Deposition PDF Download
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Author: Taek Soo Jeon
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
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Book Description
Author: Taek Soo Jeon
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages :
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Book Description
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 768
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Author:
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 776
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![Nucleation, Epitaxial Growth, and Characterization of [beta]-SiC Thin Films on Si by Rapid Thermal Chemical Vapor Deposition PDF](https://books.google.com/books/content/images/frontcover/TWLutgAACAAJ?fife=w80-h100)
Author: JiPing Li
Publisher:
ISBN:
Category :
Languages : en
Pages : 278
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Book Description
Author: Mehmet C. Öztürk
Publisher: The Electrochemical Society
ISBN: 1566775507
Category : Gate array circuits
Languages : en
Pages : 484
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Book Description
These proceedings describe processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.
Author: Steven P. Consiglio
Publisher:
ISBN:
Category : Dielectric films
Languages : en
Pages : 155
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Book Description
Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
ISBN: 0080480314
Category : Technology & Engineering
Languages : en
Pages : 1173
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Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2304
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Book Description
Author: R. Kumar Pandey
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 296
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Book Description
Offers 21 selected papers from a May 1997 symposium, organized in two sections on film growth techniques and applications, and characterization and effects of processing conditions. Subjects include controlled growth of perovskite thin films, single crystal silicon as a micromechanical material, gro
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
