Beam Optics of Quadruple Probe-Forming Systems, PDF Download
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Author: Geoff W. Grime
Publisher: CRC Press
ISBN:
Category : Art
Languages : en
Pages : 280
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Book Description
Author: Geoff W. Grime
Publisher: CRC Press
ISBN:
Category : Art
Languages : en
Pages : 280
Get Book Here
Book Description
Author: G. W. Grime
Publisher:
ISBN: 9780996002783
Category :
Languages : en
Pages : 280
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Book Description
Author: G.W. Grime
Publisher:
ISBN: 9780783779911
Category : Electron optics
Languages : en
Pages : 172
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Book Description
Author:
Publisher: Academic Press
ISBN: 0080577393
Category : Computers
Languages : en
Pages : 337
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Book Description
Advances in Electronics and Electron Physics
Author: R. Curtis Bird
Publisher: Elsevier
ISBN: 0080916899
Category : Technology & Engineering
Languages : en
Pages : 743
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Book Description
The use of ion beams for materials analysis involves many different ion-atom interaction processes which previously have largely been considered in separate reviews and texts. A list of books and conference proceedings is given in Table 2. This book is divided into three parts, the first which treats all ion beam techniques and their applications in such diverse fields as materials science, thin film and semiconductor technology, surface science, geology, biology, medicine, environmental science, archaeology and so on.
Author: Ragnar Hellborg
Publisher: Springer Science & Business Media
ISBN: 364200623X
Category : Technology & Engineering
Languages : en
Pages : 450
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Book Description
Energetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implantation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.
Author: Ragnar Hellborg
Publisher: Morgan & Claypool Publishers
ISBN: 1643273566
Category : Science
Languages : en
Pages : 150
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Book Description
Electrostatic Accelerators have been at the forefront of modern technology since the development by Sir John Cockroft and Ernest Walton in 1932 of the first accelerator, which was the first to achieve nuclear transmutation and earned them the Nobel Prize in Physics in 1951. The applications of Cockroft and Walton's development have been far reaching, even into our kitchens where it is employed to generate the high voltage needed for the magnetron in microwave ovens. Other electrostatic accelerator related Nobel prize winning developments that have had a major socio-economic impact are; the electron microscope where the beams of electrons are produced by an electrostatic accelerator, X-rays and computer tomography (CT) scanners where the X-rays are produced using an electron accelerator and microelectronic technology where ion implantation is used to dope the semiconductor chips which form the basis of our computers, mobile phones and entertainment systems. Although the Electrostatic Accelerator field is over 90 years old, and only a handful of accelerators are used for their original purpose in nuclear physics, the field and the number of accelerators is growing more rapidly than ever. The objective of this book is to collect together the basic science and technology that underlies the Electrostatic Accelerator field so it can serve as a handbook, reference guide and textbook for accelerator engineers as well as students and researchers who work with Electrostatic Accelerators.
Author: P.B. Kenway
Publisher: CRC Press
ISBN: 1000112276
Category : Science
Languages : en
Pages : 679
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Book Description
The first ICXOM congress held in Cambridge was the brain-child of Dr. Ellis Cosslett, founder of the Electron Optics Section of the Cavendish Laboratory. Dr. Cosslett pioneered research in x-ray optics and microanalysis and retained a close interest in all subject applications for this area of research, including physics, materials science, chemistry, and biology. X-Ray Optics and Microanalysis 1992 was held in his memory. At a special symposium, friends and colleagues reviewed the present status of research in x-ray optics and microanalysis. S.J. Pennycook of Oak Ridge National Laboratory, D.B. Williams of Lehigh University, J.A. Venables et al. of Arizona State University and Sussex University, and C. Jacobsen et al. of SUNY, Stony Brook are among the researchers whose papers are included in this volume.
Author: Peter W. Hawkes
Publisher: Academic Press
ISBN: 0080962432
Category : Science
Languages : en
Pages : 599
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Book Description
This is a complete handbook and reference volume which covers everything that one needs to know about electron optics. It is a comprehensive coverage of theoretical background and modern computing methods. It contains a detailed and unique account of numerical methods and an extensive bibliography.
Author: Miklos Szilagyi
Publisher: Springer Science & Business Media
ISBN: 1461309239
Category : Technology & Engineering
Languages : en
Pages : 550
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Book Description
The field of electron and ion optics is based on the analogy between geometrical light optics and the motion of charged particles in electromagnetic fields. The spectacular development of the electron microscope clearly shows the possibilities of image formation by charged particles of wavelength much shorter than that of visible light. As new applications such as particle accelerators, cathode ray tubes, mass and energy spectrometers, microwave tubes, scanning-type analytical instruments, heavy beam technologies, etc. emerged, the scope of particle beam optics has been exten ded to the formation of fine probes. The goal is to concentrate as many particles as possible in as small a volume as possible. Fabrication of microcircuits is a good example of the growing importance of this field. The current trend is towards increased circuit complexity and pattern density. Because of the diffraction limitation of processes using optical photons and the technological difficulties connected with x-ray processes, charged particle beams are becoming popular. With them it is possible to write directly on a wafer under computer control, without using a mask. Focused ion beams offer especially great possibilities in the submicron region. Therefore, electron and ion beam technologies will most probably playa very important role in the next twenty years or so.
