Application of Chemical Vapor Deposition to the Production of Tungsten Tubing PDF Download
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Languages : en
Pages : 27
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Author:
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Category :
Languages : en
Pages : 27
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Category : Nuclear energy
Languages : en
Pages : 934
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Author:
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ISBN:
Category : Aeronautics
Languages : en
Pages : 1038
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Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
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Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
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Category : Nuclear fuels
Languages : en
Pages : 536
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Author: Hector O. McDonald
Publisher:
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Category : Government publications
Languages : en
Pages : 36
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Category : Metallurgy
Languages : en
Pages : 782
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Category : Mineral industries
Languages : en
Pages : 1308
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Author: United States. National Aeronautics and Space Administration. Scientific and Technical Information Division
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1680
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Author:
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Category : Vapor-plating
Languages : en
Pages : 878
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