Author: David Walter Peters
Publisher:
ISBN:
Category :
Languages : en
Pages : 410
Book Description
Aluminum and Gallium Hydrazides as Precursors to Metal Nitride Semiconductors
Author: David Walter Peters
Publisher:
ISBN:
Category :
Languages : en
Pages : 410
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 410
Book Description
Chemical Abstracts
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2002
Book Description
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2002
Book Description
Organometallic Compounds
Author:
Publisher:
ISBN:
Category : Organometallic compounds
Languages : en
Pages : 566
Book Description
Publisher:
ISBN:
Category : Organometallic compounds
Languages : en
Pages : 566
Book Description
Characterization of Minerals, Metals, and Materials 2020
Author: Jian Li
Publisher: Springer Nature
ISBN: 3030366286
Category : Technology & Engineering
Languages : en
Pages : 723
Book Description
This collection gives broad and up-to-date results in the research and development of materials characterization and processing. Topics covered include advanced characterization methods, minerals, mechanical properties, coatings, polymers and composites, corrosion, welding, magnetic materials, and electronic materials. The book explores scientific processes to characterize materials using modern technologies, and focuses on the interrelationships and interdependence among processing, structure, properties, and performance of materials.
Publisher: Springer Nature
ISBN: 3030366286
Category : Technology & Engineering
Languages : en
Pages : 723
Book Description
This collection gives broad and up-to-date results in the research and development of materials characterization and processing. Topics covered include advanced characterization methods, minerals, mechanical properties, coatings, polymers and composites, corrosion, welding, magnetic materials, and electronic materials. The book explores scientific processes to characterize materials using modern technologies, and focuses on the interrelationships and interdependence among processing, structure, properties, and performance of materials.
Handbook of Silicon Based MEMS Materials and Technologies
Author: Markku Tilli
Publisher: Elsevier
ISBN: 0815519885
Category : Technology & Engineering
Languages : en
Pages : 670
Book Description
A comprehensive guide to MEMS materials, technologies and manufacturing, examining the state of the art with a particular emphasis on current and future applications. Key topics covered include: - Silicon as MEMS material - Material properties and measurement techniques - Analytical methods used in materials characterization - Modeling in MEMS - Measuring MEMS - Micromachining technologies in MEMS - Encapsulation of MEMS components - Emerging process technologies, including ALD and porous silicon Written by 73 world class MEMS contributors from around the globe, this volume covers materials selection as well as the most important process steps in bulk micromachining, fulfilling the needs of device design engineers and process or development engineers working in manufacturing processes. It also provides a comprehensive reference for the industrial R&D and academic communities. - Veikko Lindroos is Professor of Physical Metallurgy and Materials Science at Helsinki University of Technology, Finland. - Markku Tilli is Senior Vice President of Research at Okmetic, Vantaa, Finland. - Ari Lehto is Professor of Silicon Technology at Helsinki University of Technology, Finland. - Teruaki Motooka is Professor at the Department of Materials Science and Engineering, Kyushu University, Japan. - Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques - Shows how to protect devices from the environment and decrease package size for dramatic reduction of packaging costs - Discusses properties, preparation, and growth of silicon crystals and wafers - Explains the many properties (mechanical, electrostatic, optical, etc), manufacturing, processing, measuring (incl. focused beam techniques), and multiscale modeling methods of MEMS structures
Publisher: Elsevier
ISBN: 0815519885
Category : Technology & Engineering
Languages : en
Pages : 670
Book Description
A comprehensive guide to MEMS materials, technologies and manufacturing, examining the state of the art with a particular emphasis on current and future applications. Key topics covered include: - Silicon as MEMS material - Material properties and measurement techniques - Analytical methods used in materials characterization - Modeling in MEMS - Measuring MEMS - Micromachining technologies in MEMS - Encapsulation of MEMS components - Emerging process technologies, including ALD and porous silicon Written by 73 world class MEMS contributors from around the globe, this volume covers materials selection as well as the most important process steps in bulk micromachining, fulfilling the needs of device design engineers and process or development engineers working in manufacturing processes. It also provides a comprehensive reference for the industrial R&D and academic communities. - Veikko Lindroos is Professor of Physical Metallurgy and Materials Science at Helsinki University of Technology, Finland. - Markku Tilli is Senior Vice President of Research at Okmetic, Vantaa, Finland. - Ari Lehto is Professor of Silicon Technology at Helsinki University of Technology, Finland. - Teruaki Motooka is Professor at the Department of Materials Science and Engineering, Kyushu University, Japan. - Provides vital packaging technologies and process knowledge for silicon direct bonding, anodic bonding, glass frit bonding, and related techniques - Shows how to protect devices from the environment and decrease package size for dramatic reduction of packaging costs - Discusses properties, preparation, and growth of silicon crystals and wafers - Explains the many properties (mechanical, electrostatic, optical, etc), manufacturing, processing, measuring (incl. focused beam techniques), and multiscale modeling methods of MEMS structures
Handbook of Environmental Analysis
Author: Pradyot Patnaik
Publisher: CRC Press
ISBN: 1498745628
Category : Nature
Languages : en
Pages : 661
Book Description
The Handbook will cover all aspects of environmental analysis and will examine the emergence of many new classes of pollutants in recent years. It will provide information on an array of topics from instrumentation, analytical techniques, and sample preparations to statistical calculations, chemical structures, and equations. It will present the tools and techniques required to measure a wide range of toxic pollutants in our environment. It will be fully revised throughout, and will add four new chapters (Microbial Analysis, Chlorophyll, Chlorine, Chloramines and Chlorine Dioxide, and Derivatization Reactions in Environmental Analysis).
Publisher: CRC Press
ISBN: 1498745628
Category : Nature
Languages : en
Pages : 661
Book Description
The Handbook will cover all aspects of environmental analysis and will examine the emergence of many new classes of pollutants in recent years. It will provide information on an array of topics from instrumentation, analytical techniques, and sample preparations to statistical calculations, chemical structures, and equations. It will present the tools and techniques required to measure a wide range of toxic pollutants in our environment. It will be fully revised throughout, and will add four new chapters (Microbial Analysis, Chlorophyll, Chlorine, Chloramines and Chlorine Dioxide, and Derivatization Reactions in Environmental Analysis).
Atomic Layer Processing
Author: Thorsten Lill
Publisher: John Wiley & Sons
ISBN: 3527346686
Category : Technology & Engineering
Languages : en
Pages : 306
Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Publisher: John Wiley & Sons
ISBN: 3527346686
Category : Technology & Engineering
Languages : en
Pages : 306
Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Functional Oxides
Author: Duncan W. Bruce
Publisher: John Wiley & Sons
ISBN: 1119972949
Category : Technology & Engineering
Languages : en
Pages : 413
Book Description
Functional oxides have a wide variety of applications in the electronic industry. The discovery of new metal oxides with interesting and useful properties continues to drive much research in chemistry, physics, and materials science. In Functional Oxides five topical areas have been selected to illustrate the importance of metal oxides in modern materials chemistry: Noncentrosymmetric Inorganic Oxide Materials Geometrically Frustrated Magnetic Materials Lithium Ion Conduction in Oxides Thermoelectric Oxides Transition Metal Oxides - Magnetoresistance and Half-Metallicity The contents highlight structural chemistry, magnetic and electronic properties, ionic conduction and other emerging areas of importance, such as thermoelectricity and spintronics. Functional Oxides covers these complex concepts in a clear and accessible manner providing an excellent introduction to this broad subject area.
Publisher: John Wiley & Sons
ISBN: 1119972949
Category : Technology & Engineering
Languages : en
Pages : 413
Book Description
Functional oxides have a wide variety of applications in the electronic industry. The discovery of new metal oxides with interesting and useful properties continues to drive much research in chemistry, physics, and materials science. In Functional Oxides five topical areas have been selected to illustrate the importance of metal oxides in modern materials chemistry: Noncentrosymmetric Inorganic Oxide Materials Geometrically Frustrated Magnetic Materials Lithium Ion Conduction in Oxides Thermoelectric Oxides Transition Metal Oxides - Magnetoresistance and Half-Metallicity The contents highlight structural chemistry, magnetic and electronic properties, ionic conduction and other emerging areas of importance, such as thermoelectricity and spintronics. Functional Oxides covers these complex concepts in a clear and accessible manner providing an excellent introduction to this broad subject area.
Applied Nanotechnology
Author: Vladimir Ivanovitch Kodolov
Publisher: CRC Press
ISBN: 1315342103
Category : Science
Languages : en
Pages : 383
Book Description
This important book presents a collection of scientific papers on recent theoretical and practical advances in nanostructures, nanomaterials, and nanotechnologies. Highlighting some of the latest developments and trends in the field, the volume presents the developments of advanced nanostructured materials and the respective tools to characterize and predict their properties and behavior.
Publisher: CRC Press
ISBN: 1315342103
Category : Science
Languages : en
Pages : 383
Book Description
This important book presents a collection of scientific papers on recent theoretical and practical advances in nanostructures, nanomaterials, and nanotechnologies. Highlighting some of the latest developments and trends in the field, the volume presents the developments of advanced nanostructured materials and the respective tools to characterize and predict their properties and behavior.
Nano-Antimicrobials
Author: Nicola Cioffi
Publisher: Springer Science & Business Media
ISBN: 3642244270
Category : Technology & Engineering
Languages : en
Pages : 563
Book Description
There is a high demand for antimicrobials for the treatment of new and emerging microbial diseases. In particular, microbes developing multidrug resistance have created a pressing need to search for a new generation of antimicrobial agents, which are effective, safe and can be used for the cure of multidrug-resistant microbial infections. Nano-antimicrobials offer effective solutions for these challenges; the details of these new technologies are presented here. The book includes chapters by an international team of experts. Chemical, physical, electrochemical, photochemical and mechanical methods of synthesis are covered. Moreover, biological synthesis using microbes, an option that is both eco-friendly and economically viable, is presented. The antimicrobial potential of different nanoparticles is also covered, bioactivity mechanisms are elaborated on, and several applications are reviewed in separate sections. Lastly, the toxicology of nano-antimicrobials is briefly assessed.
Publisher: Springer Science & Business Media
ISBN: 3642244270
Category : Technology & Engineering
Languages : en
Pages : 563
Book Description
There is a high demand for antimicrobials for the treatment of new and emerging microbial diseases. In particular, microbes developing multidrug resistance have created a pressing need to search for a new generation of antimicrobial agents, which are effective, safe and can be used for the cure of multidrug-resistant microbial infections. Nano-antimicrobials offer effective solutions for these challenges; the details of these new technologies are presented here. The book includes chapters by an international team of experts. Chemical, physical, electrochemical, photochemical and mechanical methods of synthesis are covered. Moreover, biological synthesis using microbes, an option that is both eco-friendly and economically viable, is presented. The antimicrobial potential of different nanoparticles is also covered, bioactivity mechanisms are elaborated on, and several applications are reviewed in separate sections. Lastly, the toxicology of nano-antimicrobials is briefly assessed.