Aluminium Oxynitride Thin Films by Reactive Magnetron Sputtering and Their Applications

Aluminium Oxynitride Thin Films by Reactive Magnetron Sputtering and Their Applications PDF Author: Zhenhui Gou
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Aluminium Oxynitride Thin Films by Reactive Magnetron Sputtering and Their Applications

Aluminium Oxynitride Thin Films by Reactive Magnetron Sputtering and Their Applications PDF Author: Zhenhui Gou
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Processes, Properties and Applications

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods: Processes, Properties and Applications PDF Author: Filipe Vaz
Publisher: Bentham Science Publishers
ISBN: 1608051560
Category : Technology & Engineering
Languages : en
Pages : 363

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Book Description
Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better understanding of the relationships between deposition processes, structure and composition of the deposited films is critical to the continued evolution of these applications. This e-book provides valuable information about the process modeling, fabrication and characterization of metallic oxynitride-based thin films produced by reactive sputtering and some related deposition processes. Its contents are spread in twelve main and concise chapters through which the book thoroughly reviews the bases of oxynitride thin film technology and deposition processes, sputtering processes and the resulting behaviors of these oxynitride thin films. More importantly, the solutions for the growth of oxynitride technology are given in detail with an emphasis on some particular compounds. This is a valuable resource for academic learners studying materials science and industrial coaters, who are concerned not only about fundamental aspects of oxynitride synthesis, but also by their innate material characteristics.

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods

Metallic Oxynitride Thin Films by Reactive Sputtering and Related Deposition Methods PDF Author: Vladimir V. Arabadzhi
Publisher:
ISBN: 9781608051571
Category : Technology & Engineering
Languages : en
Pages :

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"Oxynitride thin film technology is rapidly impacting a broad spectrum of applications, ranging from decorative functions (through optoelectronics) to corrosion resistance. Developing a better understanding of the relationships between deposition processes"

Quantitative Characterisation of Silicon- and Aluminium Oxynitride Films Produced by Reactive Dc-magnetron Sputtering

Quantitative Characterisation of Silicon- and Aluminium Oxynitride Films Produced by Reactive Dc-magnetron Sputtering PDF Author: Sabine Dreer
Publisher:
ISBN:
Category :
Languages : en
Pages : 137

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Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films

Pulsed DC Reactive Magnetron Sputtering of Aluminum Nitride Thin Films PDF Author:
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Category :
Languages : en
Pages :

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Aluminum nitride thin films have been deposited by pulsed DC reactive magnetron sputtering. The pulsed DC power provides arc-free deposition of insulating films. Two types of pulsed DC (unipolar and asymmetric bipolar) were studied with respect to characteristics and properties of resultant films. The unipolar power supply generates a series of 75 kHz DC pulses modulated with 2.5 kHz frequency. The frequency of asymmetric power supply can be varied from 50 kHz to 250 kHz. The duty cycle, which is a ratio of negative pulse time to total time, can be varied from 60% to 98%. Very fast oscillation and overshoot were observed when the polarity of the target voltage was changed. The control of crystal orientation of deposited film is important since the properties of AlN film is related with the orientation. For example, the acoustic velocity is high along the c-axis. The electromechanical coupling coefficient is large in a-axis direction. The crystal orientation and microstructure of the AlN films were strongly affected by the deposition conditions such as sputtering power, growth temperature, sputtering gas pressure and frequency/duty cycle. The crystal orientation of AlN films was closely related with the energy of sputtered atoms and mobility of adatoms on substrate. The c-axis oriented films were obtained when the target power and growth temperature were high. This provided higher energy of sputtered atoms and mobility of adatoms. The deposited AlN films have a columnar structure. The crystal orientation of the AlN films was changed from (101) to (002) by applying an RF bias was applied to the substrate in unipolar pulsed DC sputtering. The columnar structure disappeared when the RF bias was applied to the substrate. Applying bias was thought to increase mobility of adatoms by ion bombardment. MIM (aluminum-AlN-aluminum or molybdenum) structure was fabricated to measure electric properties of AlN films. Dielectric constants of 8.5 to 11.5 were obtained at 100 kHz. Th.

Handbook of Thin Film Process Technology

Handbook of Thin Film Process Technology PDF Author: David A Glocker
Publisher: CRC Press
ISBN: 1351081233
Category : Science
Languages : en
Pages : 90

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Book Description
The Handbook of Thin Film Process Technology is a practical handbook for the thin film scientist, engineer and technician. This handbook is regularly updated with new material, and this volume is a special issue on reactive sputtering which will be of interest to a wide range of industrial and academic researchers in addition to owners of the main Handbook. Some recent developments in the reactive sputtering field are covered, including unbalanced magnetron sputtering and pulsed reactive sputtering. The articles contain a wealth of practical information relating to applications, practice and manufacturing techniques.

Investigation of Industrially-Suited Processes for Deposition of Oxide Thin Films by High Power Impulse Magnetron Sputtering

Investigation of Industrially-Suited Processes for Deposition of Oxide Thin Films by High Power Impulse Magnetron Sputtering PDF Author: Felipe de Campos Carreri
Publisher: Fraunhofer Verlag
ISBN: 9783839612873
Category : Technology & Engineering
Languages : en
Pages : 0

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Book Description
The scope of this work is to investigate and to develop advanced HIPIMS processes for deposition of oxides, utilizing industrial-scale equipment and technology. Two classes of oxide materials were studied: insulating (aluminum oxide) and conducting oxides (indium-tin oxide and aluminum-doped zinc oxide). The electrical properties of the oxides have a significant influence on the process design, as the issues and approaches for deposition of insulating materials are fairly different from conducting materials. Different types of reactive process control were also investigated, utilizing optical emission spectroscopy to control the oxygen flow and lambda probes to control the discharge power. A non-reactive process was also studied for indium-tin oxide.

International Conference on Thin Film Physics and Applications

International Conference on Thin Film Physics and Applications PDF Author:
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 924

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Multicomponent Nitride Thin Films by Reactive Magnetron Sputtering

Multicomponent Nitride Thin Films by Reactive Magnetron Sputtering PDF Author: Kristina Johansson
Publisher:
ISBN:
Category :
Languages : en
Pages :

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Modern Aspects of Bulk Crystal and Thin Film Preparation

Modern Aspects of Bulk Crystal and Thin Film Preparation PDF Author: Nikolai Kolesnikov
Publisher: BoD – Books on Demand
ISBN: 9533076100
Category : Science
Languages : en
Pages : 622

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Book Description
In modern research and development, materials manufacturing crystal growth is known as a way to solve a wide range of technological tasks in the fabrication of materials with preset properties. This book allows a reader to gain insight into selected aspects of the field, including growth of bulk inorganic crystals, preparation of thin films, low-dimensional structures, crystallization of proteins, and other organic compounds.