15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 PDF Download
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Author: BACUS (Technical group)
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Computers
Languages : en
Pages : 194
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Book Description
Author: BACUS (Technical group)
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Computers
Languages : en
Pages : 194
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 246
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Book Description
Author: British Library. Document Supply Centre
Publisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 870
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Book Description
Author: Uwe Behringer
Publisher: Margret Schneider
ISBN: 3800728753
Category :
Languages : en
Pages : 301
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Book Description
Author: Syed Rizvi
Publisher: CRC Press
ISBN: 1420028782
Category : Technology & Engineering
Languages : en
Pages : 730
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Book Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Author: Uwe F. W. Behringer
Publisher: Society of Photo Optical
ISBN: 9780819436146
Category : Electronic book
Languages : en
Pages : 252
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Book Description
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 264
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Book Description
Author: Uwe F. W. Behringer
Publisher: Society of Photo Optical
ISBN: 9780819450180
Category : Technology & Engineering
Languages : en
Pages : 264
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Book Description
Author:
Publisher:
ISBN:
Category : American literature
Languages : en
Pages : 2576
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