Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 700
Book Description
Annual Symposium on Photomask Technology and Management
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 700
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 700
Book Description
13th Annual Symposium on Photomask Technology and Management
Author:
Publisher: Society of Photo Optical
ISBN: 9780819413567
Category : Technology & Engineering
Languages : en
Pages : 422
Book Description
Publisher: Society of Photo Optical
ISBN: 9780819413567
Category : Technology & Engineering
Languages : en
Pages : 422
Book Description
Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography
Author: P. Rai-Choudhury
Publisher: SPIE Press
ISBN: 9780819423788
Category : Technology & Engineering
Languages : en
Pages : 780
Book Description
The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Publisher: SPIE Press
ISBN: 9780819423788
Category : Technology & Engineering
Languages : en
Pages : 780
Book Description
The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Standards, Methods and Solutions of Metrology
Author: Luigi Cocco
Publisher: BoD – Books on Demand
ISBN: 1789844622
Category : Technology & Engineering
Languages : en
Pages : 108
Book Description
The goal of acceptable quality, cost, and time is a decisive challenge in every engineering development process. To be familiar with metrology requires choosing the best combination of techniques, standards, and tools to control a project from advanced simulations to final performance measurements and periodic inspections. This book contains a cluster of chapters from international academic authors who provide a meticulous way to discover the impacts of metrology in both theoretical and application fields. The approach is to discuss the key aspects of a selection of untraditional metrological topics, covering the analysis procedures and set of solutions obtained from experimental studies.
Publisher: BoD – Books on Demand
ISBN: 1789844622
Category : Technology & Engineering
Languages : en
Pages : 108
Book Description
The goal of acceptable quality, cost, and time is a decisive challenge in every engineering development process. To be familiar with metrology requires choosing the best combination of techniques, standards, and tools to control a project from advanced simulations to final performance measurements and periodic inspections. This book contains a cluster of chapters from international academic authors who provide a meticulous way to discover the impacts of metrology in both theoretical and application fields. The approach is to discuss the key aspects of a selection of untraditional metrological topics, covering the analysis procedures and set of solutions obtained from experimental studies.
Photomask and X-ray Mask Technology
Author:
Publisher:
ISBN:
Category : Masks (Electronics)
Languages : en
Pages : 644
Book Description
Publisher:
ISBN:
Category : Masks (Electronics)
Languages : en
Pages : 644
Book Description
New Trends and Developments in Metrology
Author: Luigi Cocco
Publisher: BoD – Books on Demand
ISBN: 9535124773
Category : Technology & Engineering
Languages : en
Pages : 294
Book Description
Investigating the incessant technology growth and the even higher complexity of engineering systems, one of the crucial requirements to confidently steer both scientific and industrial challenges is to identify an appropriate measurement approach. A general process can be considered effective and under control if the following elements are consciously and cyclically managed: numeric target, adequate tools, output analysis, and corrective actions. The role of metrology is to rigorously harmonize this virtuous circle, providing guidance in terms of instruments, standards, and techniques to improve the robustness and the accuracy of the results. This book is designed to offer an interdisciplinary experience into the science of measurement, not only covering high-level measurement strategies but also supplying analytical details and experimental setups.
Publisher: BoD – Books on Demand
ISBN: 9535124773
Category : Technology & Engineering
Languages : en
Pages : 294
Book Description
Investigating the incessant technology growth and the even higher complexity of engineering systems, one of the crucial requirements to confidently steer both scientific and industrial challenges is to identify an appropriate measurement approach. A general process can be considered effective and under control if the following elements are consciously and cyclically managed: numeric target, adequate tools, output analysis, and corrective actions. The role of metrology is to rigorously harmonize this virtuous circle, providing guidance in terms of instruments, standards, and techniques to improve the robustness and the accuracy of the results. This book is designed to offer an interdisciplinary experience into the science of measurement, not only covering high-level measurement strategies but also supplying analytical details and experimental setups.
Annual Symposium on Photomask Technology
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 606
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 606
Book Description
国立国会図書館所蔵科学技術関係欧文会議錄目錄
Author: 国立国会図書館 (Japan)
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1592
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1592
Book Description
Istc/cstic 2009 (cistc)
Author: David Huang
Publisher: The Electrochemical Society
ISBN: 1566777038
Category : Science
Languages : en
Pages : 1124
Book Description
ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Publisher: The Electrochemical Society
ISBN: 1566777038
Category : Science
Languages : en
Pages : 1124
Book Description
ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Emerging Lithographic Technologies
Author:
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 854
Book Description
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 854
Book Description