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Author: Kasturi L. Chopra
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 872
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Book Description
Author: Kasturi L. Chopra
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 872
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Book Description
Author: Seungbum Hong
Publisher: Springer Science & Business Media
ISBN: 1441990445
Category : Technology & Engineering
Languages : en
Pages : 294
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Book Description
This book presents the recent advances in the field of nanoscale science and engineering of ferroelectric thin films. It comprises two main parts, i.e. electrical characterization in nanoscale ferroelectric capacitor, and nano domain manipulation and visualization in ferroelectric materials. Well known le'adingexperts both in relevant academia and industry over the world (U.S., Japan, Germany, Switzerland, Korea) were invited to contribute to each chapter. The first part under the title of electrical characterization in nanoscale ferroelectric capacitors starts with Chapter 1, "Testing and characterization of ferroelectric thin film capacitors," written by Dr. I. K. Yoo. The author provides a comprehensive review on basic concepts and terminologies of ferroelectric properties and their testing methods. This chapter also covers reliability issues in FeRAMs that are crucial for commercialization of high density memory products. In Chapter 2, "Size effects in ferroelectric film capacitors: role ofthe film thickness and capacitor size," Dr. I. Stolichnov discusses the size effects both in in-plane and out-of-plane dimensions of the ferroelectric thin film. The author successfully relates the electric performance and domain dynamics with proposed models of charge injection and stress induced phase transition. The author's findings present both a challenging problem and the clue to its solution of reliably predicting the switching properties for ultra-thin ferroelectric capacitors. In Chapter 3, "Ferroelectric thin films for memory applications: nanoscale characterization by scanning force microscopy," Prof. A.
Author: Jagannathan Thirumalai
Publisher: BoD – Books on Demand
ISBN: 9535130676
Category : Science
Languages : en
Pages : 222
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Book Description
The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.
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Author: Kasturi L. Chopra
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 844
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Book Description
Author: Srinivasan Sivaram
Publisher: Springer Science & Business Media
ISBN: 1475747519
Category : Technology & Engineering
Languages : en
Pages : 302
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Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Author: Nini Pryds
Publisher: Elsevier
ISBN: 0081017529
Category : Technology & Engineering
Languages : en
Pages : 560
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Book Description
Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike
Author: Professor K.S. K.S Sree Harsha
Publisher: Elsevier
ISBN: 9780080480312
Category : Technology & Engineering
Languages : en
Pages : 1176
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Book Description
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
Author: Ralf Blossey
Publisher: Springer Science & Business Media
ISBN: 9400744552
Category : Science
Languages : en
Pages : 158
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Book Description
This book is a treatise on the thermodynamic and dynamic properties of thin liquid films at solid surfaces and, in particular, their rupture instabilities. For the quantitative study of these phenomena, polymer thin films (sometimes referred to as “ultrathin”) have proven to be an invaluable experimental model system. What is it that makes thin film instabilities special and interesting? First, thin polymeric films have an important range of applications. An understanding of their instabilities is therefore of practical relevance for the design of such films. The first chapter of the book intends to give a snapshot of current applications, and an outlook on promising future ones. Second, thin liquid films are an interdisciplinary research topic, which leads to a fairly heterogeneous community working on the topic. It justifies attempting to write a text which gives a coherent presentation of the field which researchers across their specialized communities might be interested in. Finally, thin liquid films are an interesting laboratory for a theorist to confront a well-established theory, hydrodynamics, with its limits. Thin films are therefore a field in which a highly fruitful exchange and collaboration exists between experimentalists and theorists. The book stretches from the more concrete to more abstract levels of study: we roughly progress from applications via theory and experiment to rigorous mathematical theory. For an experimental scientist, the book should serve as a reference and guide to what is the current consensus of the theoretical underpinnings of the field of thin film dynamics. Controversial problems on which such a consensus has not yet been reached are clearly indicated in the text, as well as discussed in a final chapter. From a theoretical point of view, the field of dewetting has mainly been treated in a mathematically ‘light’ yet elegant fashion, often making use of scaling arguments. For the untrained researcher, this approach is not always easy to follow. The present book attempts to bridge between the ‘light’ and the ‘rigorous’, always with the ambition to enhance insight and understanding - and to not let go the elegance of the theory.
Author: Hans Lüth
Publisher: Springer Science & Business Media
ISBN: 3662043521
Category : Technology & Engineering
Languages : en
Pages : 566
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Book Description
This book emphasises both experimental and theoretical aspects of surface, interface and thin film physics. Compa- red to the earlier editions, which bore the title "Surfaces and Interfaces of Solid Materials", the book now places more emphasis on thin films, including also their superconducting and ferromagnetic properties. The present 4th edition thus presents techniques of preparing well-defined solid surfaces and interfaces, fundamental aspects of adsorption and layer growth, as well as basic models for the descripti- on of structural, vibronic and electronic properties of sur- faces, interfaces and thin films. Because of their importan- ce for modern information technology, significant attention is paid to the electronic properties of semiconductor inter- faces and heterostructures. Collective phenomena , such as superconductivity and ferromagnetism, also feature promi- nently. Experimental sections covering essential measurement and preparation techniques are presented in separate panels.
Author: Milton Ohring
Publisher: Academic Press
ISBN: 9780125249904
Category : Science
Languages : en
Pages : 744
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Book Description
Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.
