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Author: Hugh Lawson Porter
Publisher:
ISBN:
Category :
Languages : en
Pages : 149
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Keywords: transmission electron microscopy, zinc oxide, gallium oxide, thin films, photoconductivity, co-doping, pulsed laser deposition, isoelectronic impurities.
![Thin Film Growth and Doping Characteristics of ZnO and [beta]-Ga2O3 PDF](https://books.google.com/books/content/images/frontcover/6VLBDAEACAAJ?fife=w80-h100)
Author: Hugh Lawson Porter
Publisher:
ISBN:
Category :
Languages : en
Pages : 149
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Book Description
Keywords: transmission electron microscopy, zinc oxide, gallium oxide, thin films, photoconductivity, co-doping, pulsed laser deposition, isoelectronic impurities.
Author: Zheng Yang
Publisher:
ISBN:
Category : Photoluminescence
Languages : en
Pages : 149
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Doping in zinc oxide (ZnO) thin films is discussed in this dissertation. The optimizations of undoped ZnO thin film growth using molecular-beam epitaxy (MBE) are discussed. The effect of the oxygen ECR plasma power on the growth rate, structural, electrical, and optical properties of the ZnO thin films were studied. It was found that larger ECR power leads to higher growth rate, better crystallinity, lower electron carrier concentration, larger resistivity, and smaller density of non-radiative luminescence centers in the ZnO thin films. Low-temperature photoluminescence (PL) measurements were carried out in undoped and Ga doped ZnO thin films grown by molecular-beam epitaxy. As the carrier concentration increases from 1.8 x 10 to 1.8 x 10 cm -3, the dominant PL line at 9 K changes from I 1 (3.368 - 3.371 eV), to I DA (3.317 - 3.321 eV), and finally to I 8 (3.359 eV). The dominance of I, due to ionized donor bound excitons, is unexpected in n-type samples, but is shown to be consistent with the temperature-dependent Hall fitting results. We also show that I DA has characteristics of a donor acceptor pair transition, and use a detailed, quantitative analysis to argue that it arises from Ga Zn donors paired with Zn-vacancy (V Zn) acceptors. In this analysis, the Ga Zn 0/+ energy is well-known from two-electron satellite transitions, and the V Zn 0/- energy is taken from a recent theoretical calculation. Typical behaviors of Sb-doped p -type ZnO are presented. The Sb doping mechanisms and preference in ZnO are discussed. Diluted magnetic semiconducting ZnO:Co thin films with above room-temperature T C were prepared. Transmission electron microscopy and x-ray diffraction studies indicate the ZnO:Co thin films are free of secondary phases. The magnetization of the ZnO:Co thin films shows a free electron carrier concentration dependence, which increases dramatically when the free electron carrier concentration exceeds ~10 19 cm -3, indicating a carrier-mediated mechanism for ferromagnetism. The anomalous Hall effect was observed in the ZnO:Co thin films. The anomalous Hall coefficient and its dependence on longitudinal resistivity were analyzed. The presence of a side-jump contribution further supports an intrinsic origin for ferromagnetism in ZnO:Co thin films. These observations together with the magnetic anisotropy and magnetoresistance results, supports an intrinsic carrier-mediated mechanism for ferromagnetic exchange in ZnO:Co diluted magnetic semiconductor materials. Well-above room temperature and electron-concentration dependent ferromagnetism was observed in n -type ZnO:Mn films, indicating long-range ferromagnetic order. Magnetic anisotropy was also observed in these ZnO:Mn films, which is another indication for intrinsic ferromagnetism. The electron-mediated ferromagnetism in n -type ZnO:Mn contradicts the existing theory that the magnetic exchange in ZnO:Mn materials is mediated by holes. Microstructural studies using transmission electron microscopy were performed on a ZnO:Mn diluted magnetic semiconductor thin film. The high-resolution imaging and electron diffraction reveal that the ZnO:Mn thin film has a high structual quality and is free of clustering/segregated phases. High-angle annular dark field imaging and x-ray diffraction patterns further support the absence of phase segregation in the film. Magnetotransport was studied on the ZnO:Mn samples, and from these measurements, the temperature dependence of the resistivity and magnetoresistance, electron carrier concentration, and anomalous Hall coefficient of the sample is discussed. The anomalous Hall coefficient depends on the resistivity, and from this relation, the presence of the quadratic dependence term supports the intrinsic spin-obit origin of the anomalous Hall effect in the ZnO:Mn thin film.
Author: Emmanuel Ifeanyi Ugwu
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 0
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The review of the effect of annealing and doping zinc oxide thin films on both the structural and optical properties has been carried out for different growth techniques such as sol,Äìgel growth technique. The structural and optical properties were carried out using thin films were characterized SEM, XRD while TE and TM guided mode spectra, UV,ÄìVIS,ÄìNIR (HR4000Ocean Optics) and UV,ÄìVisible spectrometry were used accordingly respectively. From the results, it was clearly observed the both the morphological and the crystal characteristics structural characteristic, although increase in the percent of doping element affected it as the diffraction peak was shifts slightly to a lower angle side with report that crystal structure of the film deteriorate at a higher doping concentration of doping element as it decreases the c-lattice. There was also adjustment on the band gap of the material when it was annealed at various temperatures and also when the doping concentration was varied. The film exhibited lower absorbance, high transmittance depend on the regions of electromagnetic wave spectra.
Author: Johnny Eng Gee Goh
Publisher:
ISBN:
Category :
Languages : en
Pages : 346
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Author: Michelle Anne Myers
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Applications of zinc oxide (ZnO) for optoelectronic devices, including light emitting diodes, semiconductor lasers, and solar cells have not yet been realized due to the lack of high-quality p-type ZnO. In the research presented herein, pulsed laser deposition is employed to grow Ag-doped ZnO thin films, which are characterized in an attempt to understand the ability of Ag to act as a p-type dopant. By correlating the effects of the substrate temperature, oxygen pressure, and laser energy on the electrical and microstructural properties of Ag-doped ZnO films grown on c-cut sapphire substrates, p-type conductivity is achieved under elevated substrate temperatures. Characteristic stacking fault features have been continuously observed by transmission electron microscopy in all of the p-type films. Photoluminescence studies on n-type and p-type Ag-doped ZnO thin films demonstrate the role of stacking faults in determining the conductivity of the films. Exciton emission attributed to basal plane stacking faults suggests that the acceptor impurities are localized nearby the stacking faults in the n-type films. The photoluminescence investigation provides a correlation between microstructural characteristics and electrical properties of Ag- doped ZnO thin films; a link that enables further understanding of the doping nature of Ag impurities in ZnO. Under optimized deposition conditions, various substrates are investigated as potential candidates for ZnO thin film growth, including r -cut sapphire, quartz, and amorphous glass. Electrical results indicated that despite narrow conditions for obtaining p-type conductivity at a given substrate temperature, flexibility in substrate choice enables improved electrical properties. In parallel, N+-ion implantation at elevated temperatures is explored as an alternative approach to achieve p-type ZnO. The ion implantation fluence and temperature have been optimized to achieve p-type conductivity. Transmission electron microscopy reveals that characteristic stacking fault features are present throughout the p-type films, however in n-type N-doped films high-density defect clusters are observed. These results suggest that the temperature under which ion implantation is performed plays a critical role in determining the amount of dynamic defect re- combination that can take place, as well as defect cluster formation processes. Ion implantation at elevated temperatures is shown to be an effective method to introduce increased concentrations of p-type N dopants while reducing the amount of stable post-implantation disorder. Finally, the fabrication and properties of p-type Ag-doped ZnO/n-type ZnO and p-type N-doped ZnO/n-type ZnO thin film junctions were reported. For the N-doped sample, a rectifying behavior was observed in the I-V curve, consistent with N-doped ZnO being p-type and forming a p-n junction. The turn-on voltage of the device was -2.3 V under forward bias. The Ag-doped samples did not result in rectifying behavior as a result of conversion of the p-type layer to n-type behavior under the n- type layer deposition conditions. The systematic studies in this dissertation provide possible routes to grow p-type Ag-doped ZnO films and in-situ thermal activation of N-implanted dopant ions, to overcome the growth temperature limits, and to push one step closer to the future integration of ZnO-based devices. The electronic version of this dissertation is accessible from http://hdl.handle.net/1969.1/149354
Author: 龔柏誠
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Author: Takafumi Yao
Publisher: Springer Science & Business Media
ISBN: 3540888470
Category : Technology & Engineering
Languages : en
Pages : 525
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This is a unique book devoted to the important class of both oxide and nitride semiconductors. It covers processing, properties and applications of ZnO and GaN. The aim of this book is to provide the fundamental and technological issues for both ZnO and GaN.
Author: Vladimir Petukhov
Publisher: Cuvillier Verlag
ISBN: 373694084X
Category : Science
Languages : en
Pages : 112
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Book Description
For the electronic and optoelectronic device realization a precise control of the electrical properties in the utilized material is a very important issue. Doping profiles in realized p-njunctions influence the functionality of the devices. The morphological and crystal properties of a device material directly influence the electrical ones. Dislocations present in a region of p-n-junctions can short circuit them leading to malfunctions. Too rough surfaces during epitaxial growth could lead to inhomogeneities in a single or multiple quantum wells and superlattices. The main goal of the present work was to provide the basis for a reliable p-type doping of ZnO grown by molecular beam epitaxy. Firstly, the well established heteroepitaxial growth on c-sapphire substrates has been employed. Based on the theoretical and experimental works, suggesting nitrogen to be the impurity that builds the most shallow acceptor level in ZnO comparing to other group-V elements, it has been implied as a dopant. To generate reactive nitrogen atoms an rf-plasma source has been utilized in the MBE process. The resulting samples have been characterized by such methods as AFM, XRD, TEM, PL spectroscopy, temperature domain Hall measurements (TDHM) and ECV-profiling. First results of TDHM have shown that even in undoped samples the temperature dependencies of the electron mobility and carrier concentration have regions which are difficult to interpret. It is necessary to fit them with theoretical curves in order to extract the correct values. This task has proven to be very difficult. The complicated character of the dependencies has been explained in terms of the multilayer conduction model dividing a layer in thin interfacial region with mobility and carrier concentration μ1 and n1 respectivly and bulk region with a higher mobility μ2 and lower carrier concentration n2. The electrical transport in the bulk region has been modeled in terms of the general scattering theory in polar semiconductors. Such scattering mechanisms as scattering on polar-optical phonons, piezoelectric phonons, acoustic deformation potential, strain induced fields, dislocations, ionized and neutral impurities have been taken into account. Two cases have been considered to model transport in the interfacial region: 1) transport takes place in the conduction band of a highly doped degenerate semiconductor; 2) transport takes place in the impurity band formed by intermediate concentration of impurities and in conduction band in parallel. In the second case transport at the interface in conduction band has been neglected in the region of the low temperatures due to the impurities freeze-out and carrier concentration has been taken temperature independent like in the first case. To investigate experimentally the transport character in these two regions independently a mobility-spectrum analysis has been conducted. Theoretical results utilizing the two models have been compared with experimentally extracted mobility and carrier concentration in the interfacial region. It has been concluded that the concentration of donors in the layers is not high enough for the impurity band to merge with the conduction band and the second model is more consistent. The theoretically acquired donor concentration profiles have been compared with ECV-profiles. The agreement is very good. Simulations have revealed a shallow donor state with the ionization energy of approximately 45 meV . In the literature, this donor state in ZnO is attributed to hydrogen. However, due to the high diffusion mobility of hydrogen in ZnO, an annealing process would obviously decrease the carrier concentration in the samples which has not been the case. It has been suggested that the main donor centers are the electrically active crystal point defects generated by dislocations. Layers doped with nitrogen have been grown at very low temperatures (≈ 200°C) and at temperatures ranging from 400°C to 500°C, which are optimal for the epitaxial growth of ZnO. The samples grown at low temperatures are single crystalline with mosaic structure. In both cases, the introduction of the dopant increased the carrier concentration. This has been accounted for a bad crystal quality resulting in the inhomogeneous incorporation of nitrogen and for high background donor concentration due to the high dislocations densities. Additionally, the incorporation of acceptor centers shifts the Fermi-level increasing the formation probability of the compensating point defects. The analysis of TDHM showed an inconsistency of the one donor level model in the case of nitrogen doped samples. This fact and the decrease in the carrier concentration after annealing at 800°C for 30 minutes in ambient air can be explained by nitrogen forming donor-like defect complexes. In an attempt to improve the crystal quality of the heteroepitaxial layers, 15 periods of a ZnO/Zn0.6Mg0.4O superlattice structure have been inserted between the conventional double HT-MgO/LT-ZnO buffer and a main HT-ZnO layer. TDHM has revealed a very high mobility close to the values measured in a bulk ZnO for the temperature range of 20 - 300 K. However, TEM investigations of the samples have not indicated any decrease in the dislocation density comparing with the similar samples without a superlattice. Such a high mobility has been attributed to an electron transport in the superlattice structure. Heteroepitaxial growth of high quality ZnO-layers has proven to be challenging leaving the homoepitaxial growth as the only possibility to obtain the epitaxial layers with the best structural and electrical properties. The hydrothermally grown bulk ZnO substrates from two supplying companies, CrysTec and TokyoDenpa, have been employed for homoepitaxy. The substrates from CrysTec have not been epi-ready. Although AFM images reveal very flat surface, this has been damaged by the process of the chemomechanical polishing. This damaged layer must be removed. This has been achieved by the thermal annealing for 3 hours at 1050°C in ambient air. The thermally treated surfaces resulted in atomically flat terraces. XRD measurements have indicated an improvement of the crystal quality after annealing. The resistivity of the bulk substrates decreased after the thermal treatment due to out-diffusion of the compensating Li atoms letting Al, Ga and In atoms to contribute to conduction. After the longer annealing processes the etch-pits have been discovered on O-polar faces. The same features could be achieved by the chemical etching in a nitric acid on Zn-polar faces. The density of the threading dislocations on both polar faces for both types of substrates calculated by the etch-pit density investigation is about 105 1/cm2. Further the thermally treated substrates with atomically flat terraces have been utilized for homoepitaxy. The differences in growth kinetics during the molecular beam epitaxy on such substrates with the improved surface quality depending on their polarity have been investigated by RHEED measurements. The growth on a Zn-polar face has a 3D-character independently on a supplier. Morphologies of the resulting O- and Zn-polar layers have shown to be different. This has been explained by the presence of dangling bonds on Opolar face and thus, shorter diffusion time of the impinging Zn atoms on the surface. XRD and TEM measurements have shown a perfect crystal quality of the overgrown layers. The PL spectra of homoepitaxial layers are governed by the donor impurities diffused from the substrates. Considering the SIMS measurements of homoepitaxial layers found in the literature it has been concluded that the diffusion of donors in the layers grown on Zn-polar faces takes less effect then for the O-polar films. This conclusion has enforced the utilization of Zn-polar substrates supplied by CrysTec for the experiments with nitrogen doping of ZnO because of their affordable price. The electrical properties measured by ECV-profiling in series of homoepitaxial layers with varied growth parameters have shown an increase of the carrier concentration with the nitrogen incorporation. In addition, it has also been shown that the resulting electrical properties near the interface are governed mostly by the initial properties of the substrates. With increasing thickness of the layers carrier concentration saturated to the values of around 1016 1/cm3. The recent successful realization of the p-type MgZnO layers on TokyoDenpa substrates by researchers from Japan suggests switching to the p-type doped alloys because the above discussed results indicate that p-type doping with nitrogen of a pure ZnO is very difficult or even impossible. This is due to a rather fundamental reason: the formation of the compensating donor centers with the incorporation of acceptor atoms. As the first step in the future works, it is obvious to try to reproduce the results of the ZnMgO p-type doping with nitrogen employing growth on ZnO substrates.
Author: Joseph Woicik
Publisher: Springer
ISBN: 3319240439
Category : Science
Languages : en
Pages : 576
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This book provides the first complete and up-to-date summary of the state of the art in HAXPES and motivates readers to harness its powerful capabilities in their own research. The chapters are written by experts. They include historical work, modern instrumentation, theory and applications. This book spans from physics to chemistry and materials science and engineering. In consideration of the rapid development of the technique, several chapters include highlights illustrating future opportunities as well.
Author: Jorj Ian Owen
Publisher: Forschungszentrum Jülich
ISBN: 3893367497
Category :
Languages : en
Pages : 231
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