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Author: Uzodinma Okoroanyanwu
Publisher: SPIE Press
ISBN: 9781118030028
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
Author: Uzodinma Okoroanyanwu
Publisher: SPIE Press
ISBN: 9781118030028
Category : Technology & Engineering
Languages : en
Pages : 0
Get Book Here
Book Description
Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.
Author: Alois Senefelder
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 413
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Book Description
Author: Burn Jeng Lin
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9781510639959
Category : Lasers
Languages : en
Pages : 0
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Book Description
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
Author: Alfred Seymour
Publisher:
ISBN:
Category : Lithography
Languages : en
Pages : 160
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Book Description
Author: W. D. Richmond
Publisher: Cambridge University Press
ISBN: 1108009077
Category : History
Languages : en
Pages : 278
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Book Description
A comprehensive practical guide to the many lithographic techniques current in the nineteenth century.
Author: Raymond N. Blair
Publisher:
ISBN:
Category : Art
Languages : en
Pages : 598
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Book Description
Author: David Huang
Publisher: The Electrochemical Society
ISBN: 1566777038
Category : Science
Languages : en
Pages : 1124
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Book Description
ISTC/CSTIC is an annual semiconductor technology conference covering all the aspects of semiconductor technology and manufacturing, including devices, design, lithography, integration, materials, processes, manufacturing as well as emerging semiconductor technologies and silicon material applications. ISTC/CSTIC 2009 was merged by ISTC (International Semiconductor Technology Conference) and CSTIC (China Semiconductor Technology International Conference), the two industry leading technical conferences in China, and consisted of one plenary session and nine technical symposia. This issue of ECS Transactions contains 159 papers from the conference.
Author: Queensland. Dept. of Labour
Publisher:
ISBN:
Category :
Languages : en
Pages : 1146
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Book Description
Author: Clivia M. Sotomayor Torres
Publisher: Springer Science & Business Media
ISBN: 1441992049
Category : Science
Languages : en
Pages : 343
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Book Description
Good old Gutenberg could not have imagined that his revolutionary printing concept which so greatly contributed to dissemination of knowledge and thus today 's wealth, would have been a source of inspiration five hundred years later. Now, it seems intuitive that a simple way to produce a large number of replicates is using a mold to emboss pattern you need, but at the nanoscale nothing is simple: the devil is in the detail. And this book is about the "devil". In the following 17 chapters, the authors-all of them well recognized and active actors in this emerging field-describe the state-of-the-art, today 's technological bottlenecks and the prospects for micro-contact printing and nanoimprint lithography. Many results of this book originate from projects funded by the European Com mission through its "Nanotechnology Information Devices" (NID) initiative. NID was launched with the objective to develop nanoscale devices for the time when the red brick scenario of the ITRS roadmap would be reached. It became soon clear however, that there was no point to investigate only alternative devices to CMOS, but what was really needed was an integrated approach that took into account more facets of this difficult undertaking. Technologically speaking , this meant to have a coherent strategy to develop novel devices, nanofabrication tools and circuit & system architectures at the same time.
Author: Joseph Rosenblum
Publisher: Scarecrow Press
ISBN: 9780810830097
Category : History
Languages : en
Pages : 446
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Book Description
"...skillfully compiled...should be useful to anyone interested in placing his or her studies in the context of printed and bound literature..." --ENGLISH LITERATURE IN TRANSITION 1880-1920
