Theoretical Study of Laser-Stimulated Chemical Vapor Deposition Processes of Importance in Microelectronics PDF Download
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Author: T. F. George
Publisher:
ISBN:
Category :
Languages : en
Pages : 36
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Book Description
Recent experiments have demonstrated that laser radiation incident on a gas surface interface can stimulate and control the process of vapor deposition onto the surface. This research project has been a theoretical analysis of the deposition and related laser-stimulated processes, with special attention given to the microscopic dynamics of energy flow associated with such processes. (Author).
Author: T. F. George
Publisher:
ISBN:
Category :
Languages : en
Pages : 36
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Book Description
Recent experiments have demonstrated that laser radiation incident on a gas surface interface can stimulate and control the process of vapor deposition onto the surface. This research project has been a theoretical analysis of the deposition and related laser-stimulated processes, with special attention given to the microscopic dynamics of energy flow associated with such processes. (Author).
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 702
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Author:
Publisher:
ISBN:
Category : Military research
Languages : en
Pages : 588
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Author: S. Sivaram
Publisher: Springer
ISBN:
Category : Science
Languages : en
Pages : 312
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Book Description
In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Author: Arthur Sherman
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 240
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Book Description
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Author:
Publisher:
ISBN:
Category : Lasers
Languages : en
Pages : 836
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Author: J. Mazumder
Publisher:
ISBN: 9781489914316
Category :
Languages : en
Pages : 408
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Book Description
Author: J. T. Lin
Publisher:
ISBN:
Category :
Languages : en
Pages : 58
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Book Description
Theory and experiments are reviewed for how laser radiation can stimulate various component mechanisms which contribute to the complex chemistry involved in heterogeneous catalysis. These mechanisms include the processes of desorption, migration and chemical reactions at a gas-solid interface. Application of laser-induced surface chemistry to microelectronics in circuit deposition, lithography, annealing and final testing of the circuit are discussed. In addition to the review, some new theory is presented.
Author: Ian W. Boyd
Publisher: North Holland
ISBN:
Category : Science
Languages : en
Pages : 494
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Book Description
This volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field. A selection of contents: Deposition. Photo-assisted MOVPE growth of calcium fluoride (K.J. Mackey et al.). XPS characterization of chromium films deposited from Cr(CO) 6 at 248 nm (R. Nowak et al.). The chemistry of alkyl - aluminum compounds during laser-assisted chemical vapor deposition (G.S. Higashi). Influence of dilution in nitrogen on the photodissociation processes of silane and disilane at 193 nm. (E. Boch et al.). Growth processes of epitaxial metal films on semiconductor and insulator substrates by ionized cluster beam (I. Yamada). Kinetics and mechanisms of CW laser induced deposition of metals for microelectronics (G. Auvert). Damage Mechanisms. Modelling of lattice damage accumulation during high energy ion implantation (N. Hecking, E.H. te Kaat). Defects created by 3.5 GeV xenon ions in silicon (P. Mary et al.). Mixing, Crystallisation and Synthesis. Material transformations in semiconductor and magnetic thin films (E.E. Marinero). Explosive crystallization of amorphous silicon: triggering and propagation (W.C. Sinke et al.). Structural changes in Au x Si 1-x alloy films under laser irradiation (J. Marfaing et al.). Ion-assisted recrystallization of amorphous silicon (F. Priola et al.). Ion beam synthesis of buried compound layers: accomplishments and perspectives (A. Golanski). Epitaxial lateral overgrowth of amorphous CVD silicon films induced by ion irradiation (M. Voelskow et al.). Wear resistant coatings produced by C + implantation (C. Neelmeijer et al.). Laser surface alloying of Ni film on A1-based alloy (E. Gaffet et al.). Dielectrics. Photoenhanced CVD of hydrogenated amorphous silicon using an internal hydrogen discharge lamp (W.I. Milne et al.). Laser assisted synthesis of ultrafine silicon powder (R. Fantoni et al.). Doping. Excimer laser induced melting of heavily doped silicon: a contribution to the optimization of the laser doping process (E. Fogarassy et al.). In-situ doping of silicon using the gas immersion laser doping (GILD) process (P.G. Carey et al.). Laser solid-phase doping of semiconductors (A.M. Prokhorov et al.). Ablation. Photoablation of polyimide with IR and UV laser radiation (R. Braun et al.). Resputtering of low-energy implanted inert gases: an angle-resolved time-of-flight study (J. van Zwol et al.). Deposition of Y-Ba-Cu oxide superconducting thin films by Nd:YAG laser evaporation (W. Marine et al.). Cluster ion formation by laser evaporation of solid complex oxides (A. Mele et al.). Geometric optimisation for the deposition of high temperature superconductors (M. Brown et al.). Nucleation and growth of laser-plasma deposited thin films (S. Metev, K. Meteva). Etching. Time of flight study of low pressure laser etching of silicon by chlorine (J. Boulmer et al.). Nanosecond excimer laser-enhanced chemical etching (T.S. Baller, J. Dieleman). Laser patterned desorption within an upflow metalorganic chemical vapor deposition reactor (J.E. Epler et al.). Ion beam assisted etching of silicon with bromine. The role of the adsorbed state (G.C. Tyrrell et al.). Surface modification of low density polyethylene by N + , Ar + ion implantation for space charge devices (S. Kuniyoshi e
Author: Arthur Sherman
Publisher:
ISBN:
Category :
Languages : en
Pages : 215
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Book Description
