Author: David Attwood
Publisher: Cambridge University Press
ISBN: 1139643428
Category : Technology & Engineering
Languages : en
Pages : 611
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Book Description
This detailed, comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author begins by presenting the relevant basic principles such as radiation and scattering, wave propagation, diffraction, and coherence. He then goes on to examine a broad range of phenomena and applications. The topics covered include spectromicroscopy, EUV astronomy, synchrotron radiation, and soft X-ray lasers. The author also provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the life sciences. It will also appeal to practising engineers involved in semiconductor fabrication and materials science.
Author: David Attwood
Publisher: Cambridge University Press
ISBN: 1107062896
Category : Science
Languages : en
Pages : 655
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Book Description
Master the physics and understand the current applications of modern X-ray and EUV sources with this fully updated second edition.
Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446
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Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Author: Kenneth J. H. Phillips
Publisher: Cambridge University Press
ISBN: 0521841607
Category : Science
Languages : en
Pages : 0
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Book Description
This book explores features of the Sun's atmosphere, for graduate students/researchers in astrophysics and solar physics.
Author: Simonpietro Agnello
Publisher: John Wiley & Sons
ISBN: 1119697328
Category : Technology & Engineering
Languages : en
Pages : 500
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Book Description
SPECTROSCOPY FOR MATERIALS CHARACTERIZATION Learn foundational and advanced spectroscopy techniques from leading researchers in physics, chemistry, surface science, and nanoscience In Spectroscopy for Materials Characterization, accomplished researcher Simonpietro Agnello delivers a practical and accessible compilation of various spectroscopy techniques taught and used to today. The book offers a wide-ranging approach taught by leading researchers working in physics, chemistry, surface science, and nanoscience. It is ideal for both new students and advanced researchers studying and working with spectroscopy. Topics such as confocal and two photon spectroscopy, as well as infrared absorption and Raman and micro-Raman spectroscopy, are discussed, as are thermally stimulated luminescence and spectroscopic studies of radiation effects on optical materials. Each chapter includes a basic introduction to the theory necessary to understand a specific technique, details about the characteristic instrumental features and apparatuses used, including tips for the appropriate arrangement of a typical experiment, and a reproducible case study that shows the discussed techniques used in a real laboratory. Readers will benefit from the inclusion of: Complete and practical case studies at the conclusion of each chapter to highlight the concepts and techniques discussed in the material Citations of additional resources ideal for further study A thorough introduction to the basic aspects of radiation matter interaction in the visible-ultraviolet range and the fundamentals of absorption and emission A rigorous exploration of time resolved spectroscopy at the nanosecond and femtosecond intervals Perfect for Master and Ph.D. students and researchers in physics, chemistry, engineering, and biology, Spectroscopy for Materials Characterization will also earn a place in the libraries of materials science researchers and students seeking a one-stop reference to basic and advanced spectroscopy techniques.
Author: Theodore Lyman
Publisher:
ISBN:
Category : Ultraviolet spectra
Languages : en
Pages : 160
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Book Description
Author: K. N. Liou
Publisher: Academic Press
ISBN: 0124514510
Category : Nature
Languages : en
Pages : 599
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Book Description
Fundamentals of radiation for atmospheric applications -- Solar radiation at the top of the atmosphere -- Absorption and scattering of solar radiation in the atmosphere -- Thermal infrared radiation transfer in the atmosphere -- Light scattering by atmospheric particulates -- Principles of radiative transfer in planetary atmospheres -- Application of radiative transfer principles to remote sensing -- Radiation and climate.
Author: Ulla Vogel
Publisher: Elsevier
ISBN: 0124166628
Category : Science
Languages : en
Pages : 377
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Book Description
Handbook of Nanosafety: Measurement, Exposure and Toxicology, written by leading international experts in nanosafety, provides a comprehensive understanding of engineered nanomaterials (ENM), current international nanosafety regulation, and how ENM can be safely handled in the workplace. Increasingly, the importance of safety needs to be considered when promoting the use of novel technologies like ENM. With its use of case studies and exposure scenarios, Handbook of Nanosafety demonstrates techniques to assess exposure and risks and how these assessments can be applied to improve workers' safety. Topics covered include the effects of ENM on human health, characterization of ENM, aerosol dynamics and measurement, exposure and risk assessment, and safe handling of ENM. Based on outcomes from the NANODEVICE initiative, this is an essential resource for those who need to apply current nanotoxicological thinking in the workplace and anyone who advises on nanosafety, such as professionals in toxicology, occupational safety and risk assessment. - Multi-authored book, written by leading researchers in the field of nanotoxicology and nanosafety - Features state-of-the-art physical and chemical characterization of engineered nanomaterials (ENM) - Develops strategies for exposure assessment, risk assessment and risk management - Includes practical case studies and exposure scenarios to demonstrate how you can safely use ENM in the workplace
Author: Martin Wegener
Publisher: Springer Science & Business Media
ISBN: 3540266887
Category : Science
Languages : en
Pages : 225
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Book Description
Following the birth of the laser in 1960, the field of "nonlinear optics" rapidly emerged. Today, laser intensities and pulse durations are readily available, for which the concepts and approximations of traditional nonlinear optics no longer apply. In this regime of "extreme nonlinear optics," a large variety of novel and unusual effects arise, for example frequency doubling in inversion symmetric materials or high-harmonic generation in gases, which can lead to attosecond electromagnetic pulses or pulse trains. Other examples of "extreme nonlinear optics" cover diverse areas such as solid-state physics, atomic physics, relativistic free electrons in a vacuum and even the vacuum itself. This book starts with an introduction to the field based primarily on extensions of two famous textbook examples, namely the Lorentz oscillator model and the Drude model. Here the level of sophistication should be accessible to any undergraduate physics student. Many graphical illustrations and examples are given. The following chapters gradually guide the student towards the current "state of the art" and provide a comprehensive overview of the field. Every chapter is accompanied by exercises to deepen the reader's understanding of important topics, with detailed solutions at the end of the book.
Author: Stuart Bowyer
Publisher: Springer Science & Business Media
ISBN: 9401139881
Category : Science
Languages : en
Pages : 603
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Book Description
From the beginning of Space Astronomy, the Extreme Ultraviolet band of the spectrum (roughly defined as the decade in energy from 90-900 Å) was deemed to be the `unobservable ultraviolet'. Pioneering results from an EUV telescope on the Apollo-Soyuz Mission in 1975 forcibly demonstrated that this view was incorrect; but it required the all-sky surveys of the English Wide-Field Camera and the Extreme Ultraviolet Explorer to demonstrate the broad potential of this field. Over 700 EUV sources have now been detected. Over 150 researchers from 16 countries gathered to share results in this new field at the International Astronomical Union Colloquium No. 152. Papers were presented on a wide variety of topics including cool star coronae, white dwarf atmospheres and evolution, neutron stars, the Io torus, cataclysmic variable stars, active galactic nuclei, the interstellar medium, winds and atmospheres of early type stars, and EUV plasma diagnostics. Selected manuscripts from this meeting are provided in these Conference Proceedings.
