Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 252
Book Description
The National Technology Roadmap for Semiconductors
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 252
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 252
Book Description
EUV Lithography
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Journal of Research of the National Institute of Standards and Technology
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 716
Book Description
Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 716
Book Description
Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Technology Roadmaps for Compound Semiconductors
Author:
Publisher: DIANE Publishing
ISBN: 9781422318850
Category :
Languages : en
Pages : 12
Book Description
Publisher: DIANE Publishing
ISBN: 9781422318850
Category :
Languages : en
Pages : 12
Book Description
Proceedings of the Seventh International Symposium on Silicon-on-Insulator Technology and Devices
Author: Peter L. F. Hemment
Publisher: The Electrochemical Society
ISBN: 9781566771535
Category : Science
Languages : en
Pages : 458
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771535
Category : Science
Languages : en
Pages : 458
Book Description
Roadmapping Emergent Technologies
Author: David Tolfree
Publisher: Troubador Publishing Ltd
ISBN: 184876099X
Category : Research, Industrial
Languages : en
Pages : 277
Book Description
This book shows how roadmapping can prepare the policy-maker and planner for the challenges and changes which lie ahead. It provides the reader with a comprehensive introduction on roadmapping methodology, extracts from existing roadmaps covering the key sectors of industry.
Publisher: Troubador Publishing Ltd
ISBN: 184876099X
Category : Research, Industrial
Languages : en
Pages : 277
Book Description
This book shows how roadmapping can prepare the policy-maker and planner for the challenges and changes which lie ahead. It provides the reader with a comprehensive introduction on roadmapping methodology, extracts from existing roadmaps covering the key sectors of industry.
Polyimides and Other High Temperature Polymers: Synthesis, Characterization and Applications
Author: Kash L. Mittal
Publisher: CRC Press
ISBN: 9067644544
Category : Technology & Engineering
Languages : en
Pages : 435
Book Description
This book is mostly based on papers presented at the Fourth International Symposium on this topic held in Savannah, Georgia. However, in addition to these papers, certain very relevant papers have also been included to broaden the scope and thus enhance the value of this book. Currently there is tremendous interest in these material because of their unique properties and applications in diverse technological areas ranging from microelectronics to aerospace to adhesive bonding. This book is divided into three parts: Part 1: Synthesis and Bulk Characterization; Part 2: Surface and Interface Aspects (Composites and Metallization); and Part 3: Applications. The topics covered include: synthesis of a number of polyimides with tailored properties; nanocomposites for high-performance applications; molecular assembly of polyimides; polyimide L-B films; metallization of polyimides; applications of high temperature polymers as proton exchange membranes; dielectrics, and in textile.
Publisher: CRC Press
ISBN: 9067644544
Category : Technology & Engineering
Languages : en
Pages : 435
Book Description
This book is mostly based on papers presented at the Fourth International Symposium on this topic held in Savannah, Georgia. However, in addition to these papers, certain very relevant papers have also been included to broaden the scope and thus enhance the value of this book. Currently there is tremendous interest in these material because of their unique properties and applications in diverse technological areas ranging from microelectronics to aerospace to adhesive bonding. This book is divided into three parts: Part 1: Synthesis and Bulk Characterization; Part 2: Surface and Interface Aspects (Composites and Metallization); and Part 3: Applications. The topics covered include: synthesis of a number of polyimides with tailored properties; nanocomposites for high-performance applications; molecular assembly of polyimides; polyimide L-B films; metallization of polyimides; applications of high temperature polymers as proton exchange membranes; dielectrics, and in textile.
Departments of Commerce, Justice, and State, the Judiciary, and Related Agencies Appropriations for 1998
Author: United States. Congress. House. Committee on Appropriations. Subcommittee on the Departments of Commerce, Justice, and State, the Judiciary, and Related Agencies
Publisher:
ISBN:
Category : United States
Languages : en
Pages : 1522
Book Description
Publisher:
ISBN:
Category : United States
Languages : en
Pages : 1522
Book Description
Developments in Surface Contamination and Cleaning, Vol. 1
Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 0323312705
Category : Technology & Engineering
Languages : en
Pages : 898
Book Description
Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. - Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination - Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry - Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field
Publisher: William Andrew
ISBN: 0323312705
Category : Technology & Engineering
Languages : en
Pages : 898
Book Description
Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. - Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination - Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry - Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field
Design Automation, Languages, and Simulations
Author: Wai-Kai Chen
Publisher: CRC Press
ISBN: 0203009282
Category : Technology & Engineering
Languages : en
Pages : 314
Book Description
As the complexity of electronic systems continues to increase, the micro-electronic industry depends upon automation and simulations to adapt quickly to market changes and new technologies. Compiled from chapters contributed to CRC's best-selling VLSI Handbook, this volume of the Principles and Applications in Engineering series covers a broad rang
Publisher: CRC Press
ISBN: 0203009282
Category : Technology & Engineering
Languages : en
Pages : 314
Book Description
As the complexity of electronic systems continues to increase, the micro-electronic industry depends upon automation and simulations to adapt quickly to market changes and new technologies. Compiled from chapters contributed to CRC's best-selling VLSI Handbook, this volume of the Principles and Applications in Engineering series covers a broad rang