The Deposition of Chromium Oxide Thin Films by Metallo-organic Chemical Vapor Deposition PDF Download
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Author: Sanghamitra Baral
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 108
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Book Description
Author: Sanghamitra Baral
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 108
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Book Description
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 0815517432
Category : Technology & Engineering
Languages : en
Pages : 507
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Book Description
Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 13
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Book Description
Transparent and conductive films, well known for their historical roles in solar cells and displays, are receiving renewed attention due to the need for increased performance requirements and for advanced applications that are being developed. While there are many methods to deposit thin films, Metal Organic Chemical Vapor Deposition (MOCVD) is of particular importance for producing high quality films over large areas in a manufacturing mode. Important features of MOCVD include excellent conformality of deposited films, elimination of pinhole type defects, the absence of radiation process induced damage, and low particle counts. Over the past several years, we have devoted our efforts to developing and advancing the MOCVD process and systems technology, primarily using Rotating Disk Reactors (RDRs), and advancing the breadth of deposited oxide materials for several applications. The deposition technology, which will be reviewed, has been scaled from a 5 deposition diameter through to 12 diameter. We have found that MOCVD has been able to produce a wide range of oxide materials under a variety of processing conditions and that the technology is readily scalable. Systems technology, processing parameters and results for MOCVD of transparent (visible and IR) and conductive oxides will be reviewed. Advanced materials development and applications such as production of luminescent or p-type ZnO and related oxides, development of amorphous, polycrystalline and single crystal films and applicability in photovoltaics, LEDs or lasers, detectors, and others will also be addressed.
Author: Dan R. Denomme
Publisher:
ISBN:
Category :
Languages : en
Pages : 67
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Book Description
Author: Zhaofeng Wang
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 132
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Author: William Kibbey Stovall
Publisher:
ISBN:
Category :
Languages : en
Pages : 218
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Book Description
Author: Theodor Schneller
Publisher: Springer Science & Business Media
ISBN: 3211993118
Category : Technology & Engineering
Languages : en
Pages : 801
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Book Description
This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: Abon Jason Manuel del Rosario
Publisher:
ISBN:
Category :
Languages : en
Pages : 324
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Book Description
Author: Anjana Devi
Publisher: The Electrochemical Society
ISBN: 9781566774277
Category : Technology & Engineering
Languages : en
Pages : 1128
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Book Description
