Author:
Publisher:
ISBN:
Category :
Languages : un
Pages :
Book Description
Symposium on the Chemical Vapor Deposition of Refractory Metals and Ceramics
Author:
Publisher:
ISBN:
Category :
Languages : un
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : un
Pages :
Book Description
Materials Research Society symposium proceedings
Author: Materials Research Society
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Chemical Vapor Deposition of Refractory Metals and Ceramics
Author:
Publisher:
ISBN:
Category : Ceramic coating
Languages : en
Pages : 316
Book Description
Publisher:
ISBN:
Category : Ceramic coating
Languages : en
Pages : 316
Book Description
Chemical Vapor Deposition of Refractory Metals and Ceramics:
Author: Theodore M. Besmann
Publisher: Cambridge University Press
ISBN: 9781107410275
Category : Technology & Engineering
Languages : en
Pages : 426
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Cambridge University Press
ISBN: 9781107410275
Category : Technology & Engineering
Languages : en
Pages : 426
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Chemical Vapor Deposition of Refractory Metals and Ceramics III: Volume 363
Author: Bernard M. Gallois
Publisher: Materials Research Society
ISBN: 9781558992641
Category : Technology & Engineering
Languages : en
Pages : 0
Book Description
CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.
Publisher: Materials Research Society
ISBN: 9781558992641
Category : Technology & Engineering
Languages : en
Pages : 0
Book Description
CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.
Chemical Vapor Deposition of Refractory Metals and Ceramics II:
Author: Theodore M. Besman
Publisher: Cambridge University Press
ISBN: 9781107409743
Category : Technology & Engineering
Languages : en
Pages : 392
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Cambridge University Press
ISBN: 9781107409743
Category : Technology & Engineering
Languages : en
Pages : 392
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Chemical Vapor Deposition of Refractory Metals and Ceramics. Volume 168. Materials Research Society Symposium Proceedings Held in Boston, Massachusetts on 29 November-1 December 1989
Author: Theodore M. Besmann
Publisher:
ISBN:
Category :
Languages : en
Pages : 422
Book Description
Contents: Fundamentals/Modeling; Diagnostics; Process-Microstructure Relationships; Microstructure-Mechanical Property Relationships; Novel/Large-Scale Technologies; Metal-Organic Chemical Vapor Deposition. Keywords: Chemical vapor, Gas phase reactions, Thin alumina films, Tungsten films, Glass. (KR).
Publisher:
ISBN:
Category :
Languages : en
Pages : 422
Book Description
Contents: Fundamentals/Modeling; Diagnostics; Process-Microstructure Relationships; Microstructure-Mechanical Property Relationships; Novel/Large-Scale Technologies; Metal-Organic Chemical Vapor Deposition. Keywords: Chemical vapor, Gas phase reactions, Thin alumina films, Tungsten films, Glass. (KR).
Chemical Vapor Deposition of Refractory Metals and Ceramics 2. Materials Research Society Symposium Proceedings Held in Boston, Massachusetts on December 4-6, 1991
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 375
Book Description
The production of thin or thin films of metals or ceramics by chemical vapor deposition has often been achieved by the use of halide gas precursors. In certain cases, this choice was made purely for reasons of simplicity: gas cylinder, gas species already used in another field, etc. Experience has subsequently shown, however, that this choice can give rise to significant changes in the nature and proportions of deposited phases. These are highly dependent upon: the value of the oxidiser: reducer ratio in the gas phase, the degree of metal oxidation in the halide considered, and possible competition between two reducing agents designed to reduce the halide. These factors, among others, strongly influence the thermochemistry of the deposition reaction. Their roles must therefore be clearly understood, interpreted and predicted by the thermochemical analysis. Based on examples relating to silicide, nitride and boride deposits, an attempt will be made to determine sensitive parameters and deduce selection criteria.
Publisher:
ISBN:
Category :
Languages : en
Pages : 375
Book Description
The production of thin or thin films of metals or ceramics by chemical vapor deposition has often been achieved by the use of halide gas precursors. In certain cases, this choice was made purely for reasons of simplicity: gas cylinder, gas species already used in another field, etc. Experience has subsequently shown, however, that this choice can give rise to significant changes in the nature and proportions of deposited phases. These are highly dependent upon: the value of the oxidiser: reducer ratio in the gas phase, the degree of metal oxidation in the halide considered, and possible competition between two reducing agents designed to reduce the halide. These factors, among others, strongly influence the thermochemistry of the deposition reaction. Their roles must therefore be clearly understood, interpreted and predicted by the thermochemical analysis. Based on examples relating to silicide, nitride and boride deposits, an attempt will be made to determine sensitive parameters and deduce selection criteria.
Chemical Vapor Deposition of Refractory Metals and Ceramics III: Volume 363
Author: Bernard M. Gallois
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 312
Book Description
CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 312
Book Description
CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), "smart" material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.
Proceedings of the Conference on Chemical Vapor Deposition of Refractory Metals, Alloys, and Compounds
Author:
Publisher:
ISBN:
Category : Refractory materials
Languages : en
Pages : 480
Book Description
Publisher:
ISBN:
Category : Refractory materials
Languages : en
Pages : 480
Book Description