Author: Youxue Zahng
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 1501508393
Category : Science
Languages : en
Pages : 1056
Book Description
Volume 72 of Reviews in Mineralogy and Geochemistry represents an extensive compilation of the material presented by the invited speakers at a short course on Diffusion in Minerals and Melts held prior (December 11-12, 2010) to the Annual fall meeting of the American Geophysical Union in San Francisco, California. The short course was held at the Napa Valley Marriott Hotel and Spa in Napa, California and was sponsored by the Mineralogical Society of America and the Geochemical Society.
Diffusion in Minerals and Melts
Author: Youxue Zahng
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 1501508393
Category : Science
Languages : en
Pages : 1056
Book Description
Volume 72 of Reviews in Mineralogy and Geochemistry represents an extensive compilation of the material presented by the invited speakers at a short course on Diffusion in Minerals and Melts held prior (December 11-12, 2010) to the Annual fall meeting of the American Geophysical Union in San Francisco, California. The short course was held at the Napa Valley Marriott Hotel and Spa in Napa, California and was sponsored by the Mineralogical Society of America and the Geochemical Society.
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 1501508393
Category : Science
Languages : en
Pages : 1056
Book Description
Volume 72 of Reviews in Mineralogy and Geochemistry represents an extensive compilation of the material presented by the invited speakers at a short course on Diffusion in Minerals and Melts held prior (December 11-12, 2010) to the Annual fall meeting of the American Geophysical Union in San Francisco, California. The short course was held at the Napa Valley Marriott Hotel and Spa in Napa, California and was sponsored by the Mineralogical Society of America and the Geochemical Society.
International Aerospace Abstracts
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 512
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 512
Book Description
Beryllium
Author: Edward S. Grew
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 1501508849
Category : Science
Languages : en
Pages : 704
Book Description
Volume 50 of Reviews in Mineralogy and Geochemistry treats Beryllium and its cosmogenic isotopes. This volume includes an overview of Be studies in the earth sciences and a systematic classification of Be minerals based on their crystal structure. It treats the analysis of these minerals by the secondary ion mass spectroscopy as well as experimental studies of systems involving Be. Moreover, this volume reviews the behavior of Be in the Solar System, with an emphasis on meteorites, the Moon and Mars, and the implications of this behavior for the evolution of the solar system. It gives an overview of the terrestrial geochemistry of Be and discusses the contamination of the environment by this anthropogenic toxin. It reports use of the longer lived Be-10 to assess erosion rates and other surficial processes and how this isotope can yield independent temporal records of geomagnetic field variations for comparison with records obtained by measuring natural remnant magnetization, be a chemical tracer for processes in convergent margins, and can date events in Cenozoic tectonics. It reviews applications of the shorter lived isotope Be-7 in environmental studies as well. Residual phases include acidic plutonic and volcanic rocks, whose geochemistry and evolution are covered, while granitic pegmatites, which are well-known for their remarkable, if localized, Be enrichments and a wide variety of Be mineral assemblages, are reviewed. Not all Be concentrations have obvious magmatic affinities; for example, one class of emerald deposits results from Be being introduced by heated brines. Pelitic rocks are an important reservoir of Be in the Earth's crust and their metamorphism plays a critical role in recycling of Be in subduction zones, eventually, anatectic processes complete the cycle, providing a source of Be for granitic rocks.
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 1501508849
Category : Science
Languages : en
Pages : 704
Book Description
Volume 50 of Reviews in Mineralogy and Geochemistry treats Beryllium and its cosmogenic isotopes. This volume includes an overview of Be studies in the earth sciences and a systematic classification of Be minerals based on their crystal structure. It treats the analysis of these minerals by the secondary ion mass spectroscopy as well as experimental studies of systems involving Be. Moreover, this volume reviews the behavior of Be in the Solar System, with an emphasis on meteorites, the Moon and Mars, and the implications of this behavior for the evolution of the solar system. It gives an overview of the terrestrial geochemistry of Be and discusses the contamination of the environment by this anthropogenic toxin. It reports use of the longer lived Be-10 to assess erosion rates and other surficial processes and how this isotope can yield independent temporal records of geomagnetic field variations for comparison with records obtained by measuring natural remnant magnetization, be a chemical tracer for processes in convergent margins, and can date events in Cenozoic tectonics. It reviews applications of the shorter lived isotope Be-7 in environmental studies as well. Residual phases include acidic plutonic and volcanic rocks, whose geochemistry and evolution are covered, while granitic pegmatites, which are well-known for their remarkable, if localized, Be enrichments and a wide variety of Be mineral assemblages, are reviewed. Not all Be concentrations have obvious magmatic affinities; for example, one class of emerald deposits results from Be being introduced by heated brines. Pelitic rocks are an important reservoir of Be in the Earth's crust and their metamorphism plays a critical role in recycling of Be in subduction zones, eventually, anatectic processes complete the cycle, providing a source of Be for granitic rocks.
Thermoelectric Module Contact Fabrication and Analysis at Elevated Temperatures by High Temperature Voltage Profiling System (HTVPS)
Author: Muhammad Farhan
Publisher:
ISBN:
Category : Materials at high temperatures
Languages : en
Pages : 486
Book Description
Publisher:
ISBN:
Category : Materials at high temperatures
Languages : en
Pages : 486
Book Description
Metals Abstracts
Author:
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 636
Book Description
Publisher:
ISBN:
Category : Metallurgy
Languages : en
Pages : 636
Book Description
High Temperature Gas-Solid Reactions in Earth and Planetary Processes
Author: Penelope King
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 1501511793
Category : Science
Languages : en
Pages : 534
Book Description
High temperature gas-solid reactions are ubiquitous on planetary bodies, distributing chemical elements over a range of geologic settings and temperatures. This volume reviews the critical role gas-solid reactions play in early solar system formation, volcanism, metamorphism and industrial processes. The field evidence, experimental and theoretical approaches for examining gas-solid reaction are presented, building on advances in fields outside of Earth Sciences. Computational chemistry techniques are used to probe the nature of molecular clusters and solvation in volcanic vapors and mineral-gas reaction mechanisms. Specialised analytical methods for characterising solid reaction products are included since these reactions commonly form thin or dispersed films and metastable minerals. Finally, the volume contains rich field examples, laboratory experiments and thermodynamic modelling and kinetics of gas-solid reactions on Earth, Venus and beyond.
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 1501511793
Category : Science
Languages : en
Pages : 534
Book Description
High temperature gas-solid reactions are ubiquitous on planetary bodies, distributing chemical elements over a range of geologic settings and temperatures. This volume reviews the critical role gas-solid reactions play in early solar system formation, volcanism, metamorphism and industrial processes. The field evidence, experimental and theoretical approaches for examining gas-solid reaction are presented, building on advances in fields outside of Earth Sciences. Computational chemistry techniques are used to probe the nature of molecular clusters and solvation in volcanic vapors and mineral-gas reaction mechanisms. Specialised analytical methods for characterising solid reaction products are included since these reactions commonly form thin or dispersed films and metastable minerals. Finally, the volume contains rich field examples, laboratory experiments and thermodynamic modelling and kinetics of gas-solid reactions on Earth, Venus and beyond.
Dissertation Abstracts International
Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 548
Book Description
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 548
Book Description
Physics Briefs
Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1248
Book Description
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1248
Book Description
American Doctoral Dissertations
Author:
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 552
Book Description
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 552
Book Description
Atomic Layer Processing
Author: Thorsten Lill
Publisher: John Wiley & Sons
ISBN: 3527824200
Category : Technology & Engineering
Languages : en
Pages : 304
Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Publisher: John Wiley & Sons
ISBN: 3527824200
Category : Technology & Engineering
Languages : en
Pages : 304
Book Description
Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.