Author:
Publisher:
ISBN:
Category : Optics
Languages : en
Pages : 720
Book Description
SPIE ... Publications Index
Author:
Publisher:
ISBN:
Category : Optics
Languages : en
Pages : 720
Book Description
Publisher:
ISBN:
Category : Optics
Languages : en
Pages : 720
Book Description
Optical Communications Rules of Thumb
Author: John Lester Miller
Publisher: McGraw Hill Professional
ISBN: 0071500901
Category : Technology & Engineering
Languages : en
Pages : 450
Book Description
This engineering tool provides over 200 time and cost saving rules of thumb--short cuts, tricks, and methods that optical communications veterans have developed through long years of trial and error. * DWDM (Dense Wavelength Division Multiplexing) and SONET (Synchronous Optical NETwork) rules * Information Transmission, fiber optics, and systems rules
Publisher: McGraw Hill Professional
ISBN: 0071500901
Category : Technology & Engineering
Languages : en
Pages : 450
Book Description
This engineering tool provides over 200 time and cost saving rules of thumb--short cuts, tricks, and methods that optical communications veterans have developed through long years of trial and error. * DWDM (Dense Wavelength Division Multiplexing) and SONET (Synchronous Optical NETwork) rules * Information Transmission, fiber optics, and systems rules
SPIE 1991 Publications Index
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 780
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 780
Book Description
Discovering Light
Author: Sara Aissati
Publisher:
ISBN: 9781510639355
Category : Light
Languages : en
Pages : 0
Book Description
What is light? Where are optics and photonics present in our lives and in nature? What lies behind different optical phenomena? What is an optical instrument? How does the eye resemble an optical instrument? How can we explain human vision? This book, written by a group of young scientists, answers these questions and many more.
Publisher:
ISBN: 9781510639355
Category : Light
Languages : en
Pages : 0
Book Description
What is light? Where are optics and photonics present in our lives and in nature? What lies behind different optical phenomena? What is an optical instrument? How does the eye resemble an optical instrument? How can we explain human vision? This book, written by a group of young scientists, answers these questions and many more.
Integrated Optomechanical Analysis
Author: Keith B. Doyle
Publisher: SPIE Press
ISBN: 9780819446091
Category : Technology & Engineering
Languages : en
Pages : 252
Book Description
This tutorial presents optomechanical modeling techniques to effectively design and analyze high-performance optical systems. It discusses thermal and structural modeling methods that use finite-element analysis to predict the integrity and performance of optical elements and optical support structures. Includes accompanying CD-ROM with examples.
Publisher: SPIE Press
ISBN: 9780819446091
Category : Technology & Engineering
Languages : en
Pages : 252
Book Description
This tutorial presents optomechanical modeling techniques to effectively design and analyze high-performance optical systems. It discusses thermal and structural modeling methods that use finite-element analysis to predict the integrity and performance of optical elements and optical support structures. Includes accompanying CD-ROM with examples.
Polarized Light and Optical Systems
Author: Russell Chipman
Publisher: CRC Press
ISBN: 1498700578
Category : Science
Languages : en
Pages : 1037
Book Description
Polarized Light and Optical Systems presents polarization optics for undergraduate and graduate students in a way which makes classroom teaching relevant to current issues in optical engineering. This curriculum has been developed and refined for a decade and a half at the University of Arizona’s College of Optical Sciences. Polarized Light and Optical Systems provides a reference for the optical engineer and optical designer in issues related to building polarimeters, designing displays, and polarization critical optical systems. The central theme of Polarized Light and Optical Systems is a unifying treatment of polarization elements as optical elements and optical elements as polarization elements. Key Features Comprehensive presentation of Jones calculus and Mueller calculus with tables and derivations of the Jones and Mueller matrices for polarization elements and polarization effects Classroom-appropriate presentations of polarization of birefringent materials, thin films, stress birefringence, crystal polarizers, liquid crystals, and gratings Discussion of the many forms of polarimeters, their trade-offs, data reduction methods, and polarization artifacts Exposition of the polarization ray tracing calculus to integrate polarization with ray tracing Explanation of the sources of polarization aberrations in optical systems and the functional forms of these polarization aberrations Problem sets to build students’ problem-solving capabilities.
Publisher: CRC Press
ISBN: 1498700578
Category : Science
Languages : en
Pages : 1037
Book Description
Polarized Light and Optical Systems presents polarization optics for undergraduate and graduate students in a way which makes classroom teaching relevant to current issues in optical engineering. This curriculum has been developed and refined for a decade and a half at the University of Arizona’s College of Optical Sciences. Polarized Light and Optical Systems provides a reference for the optical engineer and optical designer in issues related to building polarimeters, designing displays, and polarization critical optical systems. The central theme of Polarized Light and Optical Systems is a unifying treatment of polarization elements as optical elements and optical elements as polarization elements. Key Features Comprehensive presentation of Jones calculus and Mueller calculus with tables and derivations of the Jones and Mueller matrices for polarization elements and polarization effects Classroom-appropriate presentations of polarization of birefringent materials, thin films, stress birefringence, crystal polarizers, liquid crystals, and gratings Discussion of the many forms of polarimeters, their trade-offs, data reduction methods, and polarization artifacts Exposition of the polarization ray tracing calculus to integrate polarization with ray tracing Explanation of the sources of polarization aberrations in optical systems and the functional forms of these polarization aberrations Problem sets to build students’ problem-solving capabilities.
Field Guide to Atmospheric Optics
Author: Larry C. Andrews
Publisher: Society of Photo Optical
ISBN: 9780819453181
Category : Technology & Engineering
Languages : en
Pages : 96
Book Description
The material in this Field Guide is a condensed version of similar material found in two textbooks: Laser Beam Propagation through Random Media (SPIE Vol. PM53) and Laser Beam Scintillation with Applications (SPIE Vol. PM99). Topics chosen for this concise presentation include a review of classical Kolmogorov turbulence theory, Gaussian-beam waves in free space, and atmospheric effects on a propagating optical wave. These atmospheric effects have great importance in a variety of applications like imaging, free space optical communications, laser radar, and remote sensing. This Guide presents tractable mathematical models from which the practitioner can readily determine beam spreading, beam wander, spatial coherence radius (Fried's parameter), angle of arrival fluctuations, scintillation, aperture averaging effects, fade probabilities, bit error-rates, and enhanced backscatter effects, among others.
Publisher: Society of Photo Optical
ISBN: 9780819453181
Category : Technology & Engineering
Languages : en
Pages : 96
Book Description
The material in this Field Guide is a condensed version of similar material found in two textbooks: Laser Beam Propagation through Random Media (SPIE Vol. PM53) and Laser Beam Scintillation with Applications (SPIE Vol. PM99). Topics chosen for this concise presentation include a review of classical Kolmogorov turbulence theory, Gaussian-beam waves in free space, and atmospheric effects on a propagating optical wave. These atmospheric effects have great importance in a variety of applications like imaging, free space optical communications, laser radar, and remote sensing. This Guide presents tractable mathematical models from which the practitioner can readily determine beam spreading, beam wander, spatial coherence radius (Fried's parameter), angle of arrival fluctuations, scintillation, aperture averaging effects, fade probabilities, bit error-rates, and enhanced backscatter effects, among others.
Optical Glass
Author: Peter Hartmann
Publisher:
ISBN: 9781628412932
Category : Glass
Languages : en
Pages : 158
Book Description
For more than 400 years, optical glass has provided mankind with a window into both the hidden microcosm and vast outer cosmos of the known universe, transforming philosophy, science, and engineering through its visage and, thus, shaping modern civilization. Its high transmittance, homogeneity, and precisely defined light refraction properties are the preconditions for highly resolved true-color imaging, making it an intrinsic component of technology in general. From consumer products, such as cameras and binoculars, to microscopes and telescopes-the most essential tools of research in many fields-the role of optical glass is integral to the very foundations of modern science and industry.
Publisher:
ISBN: 9781628412932
Category : Glass
Languages : en
Pages : 158
Book Description
For more than 400 years, optical glass has provided mankind with a window into both the hidden microcosm and vast outer cosmos of the known universe, transforming philosophy, science, and engineering through its visage and, thus, shaping modern civilization. Its high transmittance, homogeneity, and precisely defined light refraction properties are the preconditions for highly resolved true-color imaging, making it an intrinsic component of technology in general. From consumer products, such as cameras and binoculars, to microscopes and telescopes-the most essential tools of research in many fields-the role of optical glass is integral to the very foundations of modern science and industry.
EUV Lithography
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : ru
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : ru
Pages : 704
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Optical Coating Technology
Author: Philip Baumeister
Publisher: SPIE Press
ISBN: 9780819453136
Category : Technology & Engineering
Languages : en
Pages : 848
Book Description
Baumeister organizes this book around the key subjects associated with functions of optical thin film performance, and provides a valuable resource in the field of thin film technology. The information is widely backed up with citations to patents and published literature. The author draws from 25 years of experience teaching classes at the UCLA Extension Program, and at companies worldwide to answer questions, such as: what are the conventions for a given analysis formalism? and, what other design approaches have been tried for this application?
Publisher: SPIE Press
ISBN: 9780819453136
Category : Technology & Engineering
Languages : en
Pages : 848
Book Description
Baumeister organizes this book around the key subjects associated with functions of optical thin film performance, and provides a valuable resource in the field of thin film technology. The information is widely backed up with citations to patents and published literature. The author draws from 25 years of experience teaching classes at the UCLA Extension Program, and at companies worldwide to answer questions, such as: what are the conventions for a given analysis formalism? and, what other design approaches have been tried for this application?