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Author:
Publisher:
ISBN:
Category : Optics
Languages : en
Pages : 720
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Book Description
Author:
Publisher:
ISBN:
Category : Optics
Languages : en
Pages : 720
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Book Description
Author: Franklin S. Harris
Publisher: Society of Photo Optical
ISBN: 9780819406453
Category : Optics
Languages : en
Pages : 634
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 762
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Book Description
Author: S P I E-International Society for Optical Engineering
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9780819406453
Category :
Languages : en
Pages : 634
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Book Description
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 780
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Book Description
Author: John Lester Miller
Publisher: McGraw Hill Professional
ISBN: 0071500901
Category : Technology & Engineering
Languages : en
Pages : 450
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Book Description
This engineering tool provides over 200 time and cost saving rules of thumb--short cuts, tricks, and methods that optical communications veterans have developed through long years of trial and error. * DWDM (Dense Wavelength Division Multiplexing) and SONET (Synchronous Optical NETwork) rules * Information Transmission, fiber optics, and systems rules
Author: Keith B. Doyle
Publisher: SPIE Press
ISBN: 9780819446091
Category : Technology & Engineering
Languages : en
Pages : 252
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Book Description
This tutorial presents optomechanical modeling techniques to effectively design and analyze high-performance optical systems. It discusses thermal and structural modeling methods that use finite-element analysis to predict the integrity and performance of optical elements and optical support structures. Includes accompanying CD-ROM with examples.
Author: SPIE (Society of Photo-optical Instrumentation Engineers) the International Society for Optical Engineering
Publisher:
ISBN: 9780819413413
Category :
Languages : en
Pages : 0
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Book Description
Author: Alan Symmons
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9781510640658
Category : Infrared equipment
Languages : en
Pages : 0
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Book Description
"Today's SWIR, MWIR, LWIR and multispectral technologies cover a wide range of commercial and military applications and continue to rapidly expand in almost every aspect of our lives. This Field Guide focuses on the most common infrared crystals and glasses used in these systems, from their manufacturing methods through modern optical fabrication technologies to the end-use applications. Detailed optical, crystallographic, mechanical, chemical, and thermal properties of the most popular infrared materials are reviewed in detail along with process flows and relative comparisons. The Field Guide to Infrared Optical Materials provides a concise and convenient resource for those interested in the materials used in infrared optical systems"--
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : ru
Pages : 704
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Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
