Author: Shyam P. Murarka
Publisher: Academic Press
ISBN: 0080570569
Category : Technology & Engineering
Languages : en
Pages : 213
Book Description
Most of the subject matter of this book has previously been available only in the form of research papers and review articles. I have not attempted to refer to all the published papers. The reader may find it advantageous to refer to the references listed.
Silicides for VLSI Applications
Author: Shyam P. Murarka
Publisher: Academic Press
ISBN: 0080570569
Category : Technology & Engineering
Languages : en
Pages : 213
Book Description
Most of the subject matter of this book has previously been available only in the form of research papers and review articles. I have not attempted to refer to all the published papers. The reader may find it advantageous to refer to the references listed.
Publisher: Academic Press
ISBN: 0080570569
Category : Technology & Engineering
Languages : en
Pages : 213
Book Description
Most of the subject matter of this book has previously been available only in the form of research papers and review articles. I have not attempted to refer to all the published papers. The reader may find it advantageous to refer to the references listed.
Silicides for VLSI Applications
Author: S. P. Murarka
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 200
Book Description
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 200
Book Description
Proceedings of the Workshop on Silicides and Metals for VLSI Applications V
Author: Workshop on Silicides and Metals for VLSI Applications (5, 1987, San Juan Bautista, Calif.)
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Proceedings of the Workshop on Silicides and Metals for VLSI Applications
Author: Michael D. Strathman
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Fundamental Aspects and Some Applications of Metals and Metal Silicides in VLSI Technology
Author: Shi-Li Zhang
Publisher:
ISBN: 9789171700353
Category :
Languages : en
Pages : 190
Book Description
Publisher:
ISBN: 9789171700353
Category :
Languages : en
Pages : 190
Book Description
Silicides: Fundamentals & Applications
Author: Francois D'heurle
Publisher: World Scientific
ISBN: 9814492183
Category : Science
Languages : en
Pages : 390
Book Description
Silicides were introduced into the technology of electronic devices some thirty years ago; since then, they have been continuously used to form both ohmic and rectifying contacts to silicon. Silicides are also important for other applications (thermoelectric devices and structural applications, such as jet engines), but it is not easy to find an updated reference containing both their basic properties, either chemical or physical, and the latest applications.The 16th Course of the International School of Solid State Physics, held in Erice (Italy) in the late spring of 1999, was intended to break artificial barriers between disciplines, and to gather people concerned with the properties and applications of silicides, regardless of the formal fields to which they belong, or of the practical goals they pursue. This book is therefore concerned with theory as well as applications, metallurgy as well as physics, and materials science as well as microelectronics.
Publisher: World Scientific
ISBN: 9814492183
Category : Science
Languages : en
Pages : 390
Book Description
Silicides were introduced into the technology of electronic devices some thirty years ago; since then, they have been continuously used to form both ohmic and rectifying contacts to silicon. Silicides are also important for other applications (thermoelectric devices and structural applications, such as jet engines), but it is not easy to find an updated reference containing both their basic properties, either chemical or physical, and the latest applications.The 16th Course of the International School of Solid State Physics, held in Erice (Italy) in the late spring of 1999, was intended to break artificial barriers between disciplines, and to gather people concerned with the properties and applications of silicides, regardless of the formal fields to which they belong, or of the practical goals they pursue. This book is therefore concerned with theory as well as applications, metallurgy as well as physics, and materials science as well as microelectronics.
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
Author: John E.J. Schmitz
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 264
Book Description
Publisher description.
Publisher: William Andrew
ISBN:
Category : Computers
Languages : en
Pages : 264
Book Description
Publisher description.
Proceedings of the Workshop on Silicides and Metals for VLSI Applications V, 11-14 May 1987, San Juan Bautista, California
Author: Michael D. Strathman
Publisher:
ISBN:
Category :
Languages : en
Pages : 1759
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 1759
Book Description
Rapid thermal processing and self-aligned silicide technology for VLSI application
Author: Yen-Hui Ku
Publisher:
ISBN:
Category : Metals
Languages : en
Pages : 212
Book Description
Publisher:
ISBN:
Category : Metals
Languages : en
Pages : 212
Book Description
A Characterization of Refractory Metals and Refractory Metal Silicides for VLSI Circuit Applications
Author: Phu Hiep Luong
Publisher:
ISBN:
Category : Heat resistant alloys
Languages : en
Pages : 396
Book Description
Publisher:
ISBN:
Category : Heat resistant alloys
Languages : en
Pages : 396
Book Description