Sensitivity Analysis for a Radio Frequency Atmospheric Pressure Plasma Discharge Simulation PDF Download
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Author: Kyle Joseph Lange
Publisher:
ISBN:
Category : Numerical analysis
Languages : en
Pages : 222
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Author: Kyle Joseph Lange
Publisher:
ISBN:
Category : Numerical analysis
Languages : en
Pages : 222
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Author: Tanvir Iqbal Farouk
Publisher:
ISBN:
Category : Mechanical engineering
Languages : en
Pages : 640
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Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 692
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Author: Douglas Paul Breden
Publisher:
ISBN:
Category :
Languages : en
Pages : 382
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Book Description
This document presents a study of the numerical simulation of non-equilibrium plasma discharges in air mixtures in the atmospheric pressure regime. Such plasma is formed by applying a very high electric field over a very short time duration (nano-microsecond) which preferentially heats the electrons to very high temperatures (10 electron Volts or more) while preventing thermalization of the gas. Preferentially heating the electrons to very high temperatures allows the discharge to efficiently and rapidly ionize and dissociate the gas mixture without losing too much energy to thermalization or vibrational excitation. Consequently, two useful characteristics of these discharges are low gas temperatures and rapid electron chemistry. This study focuses on two applications of interest: ignition of fuel-air mixtures and plasma enhanced medicine. For ignition, there are two situations that arise where it is difficult for traditional spark ignition systems to operate. The first is at the supersonic flow regime where the residence time of the flow in the engine is low. The second is high pressure ignition of lean fuel-air mixtures. For plasma medicine and surface treatment, non-equilibrium plasma is an effective means of delivering reactive radical species to the surface while limiting damage due to thermal heating. The problems of interest are characterized by the formation of weakly ionized plasma in the presence of flow fields such as supersonic boundary layers or low speed jets. To simulate the coupled plasma-fluid flow physics of these discharges, two numerical tools are utilized. The first is a two-temperature, multiple species, self-consistent plasma solver with finite rate chemistry which is used to simulate the plasma as it forms in a neutral background gas. The second tool is a multiple-species compressible flow solver which calculates the flow field properties of the background gas mixture.
Author: Anton Nikiforov
Publisher: BoD – Books on Demand
ISBN: 1838802495
Category : Science
Languages : en
Pages : 146
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Book Description
Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.
Author: I︠U︡riĭ Petrovich Raĭzer
Publisher: Springer
ISBN:
Category : Science
Languages : en
Pages : 472
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Book Description
![Documentation of Plasma Physics. Pt. 1, Experimental Plasma Physics [and] Theoretical Plasma Physics PDF](https://books.google.com/books/content/images/frontcover/Vg0wAQAAIAAJ?fife=w80-h100)
Author:
Publisher:
ISBN:
Category : Plasma (Ionized gases)
Languages : en
Pages : 532
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Author: XinPei Lu
Publisher: CRC Press
ISBN: 0429620721
Category : Science
Languages : en
Pages : 388
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Book Description
Nonequilibrium atmospheric pressure plasma jets (N-APPJs) generate plasma in open space rather than in a confined chamber and can be utilized for applications in medicine. This book provides a complete introduction to this fast-emerging field, from the fundamental physics, to experimental approaches, to plasma and reactive species diagnostics. It provides an overview of the development of a wide range of plasma jet devices and their fundamental mechanisms. The book concludes with a discussion of the exciting application of plasmas for cancer treatment. The book provides details on experimental methods including expert tips and caveats. covers novel devices driven by various power sources and the impact of operating conditions on concentrations and fluxes of the reactive species. discusses the latest advances including theory, modeling, and simulation approaches. gives an introduction, overview and details on state of the art diagnostics of small scale high gradient atmospheric pressure plasmas. covers the use of N-APPJs for cancer applications, including discussion of destruction of cancer cells, mechanisms of action, and selectivity studies. XinPei Lu is a Chair Professor in the School of Electrical and Electronic Engineering at Huazhong University of Science and Technology. Stephan Reuter is currently Visiting Professor at Université Paris-Saclay. In a recent Alexander von Humboldt research fellowship at Princeton University, he performed ultrafast laser spectroscopy on cold plasmas. Mounir Laroussi is Professor of Electrical and Computer Engineering and director of the Plasma Engineering and Medicine Institute at Old Dominion University. He is a Fellow of IEEE and recipient of an IEEE Merit Award. DaWei Liu is Professor in the School of Electrical and Electronic Engineering at Huazhong University of Science and Technology.
Author: Defense Documentation Center (U.S.)
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1032
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Author: Toshiaki Makabe
Publisher: CRC Press
ISBN: 1420012274
Category : Science
Languages : en
Pages : 355
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Book Description
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition,
