Author: Alfred Akpoveta Susu
Publisher:
ISBN:
Category : Germanium crystals
Languages : en
Pages : 598
Book Description
Reactive Scattering of Atomic and Molecular Gases from Clean Elemental Semiconductor Surfaces
Author: Alfred Akpoveta Susu
Publisher:
ISBN:
Category : Germanium crystals
Languages : en
Pages : 598
Book Description
Publisher:
ISBN:
Category : Germanium crystals
Languages : en
Pages : 598
Book Description
Reactive Scattering from Elemental Semiconductor Surfaces with a Modulated Molecular Beam Technique
Author: James Alan Schwarz
Publisher:
ISBN:
Category : Scattering (Physics)
Languages : en
Pages : 388
Book Description
Publisher:
ISBN:
Category : Scattering (Physics)
Languages : en
Pages : 388
Book Description
Kinetic Studies in GeO2/Ge System
Author: Sheng-Kai Wang
Publisher: CRC Press
ISBN: 1000581365
Category : Technology & Engineering
Languages : en
Pages : 157
Book Description
Kinetic Studies in GeO2/Ge System: A Retrospective from 2021 investigates reaction kinetics in GeO2/Ge systems, aiming to demonstrate the fundamentals of the GeO2/Ge interface and to give insight into the distinctive features and performance of Ge (germanium) applied to advanced complementary metal oxide semiconductor (CMOS) devices. This book first reviews the development of MOS technology and discusses the potentials of emerging Ge and the challenges facing it as a contentious channel material, once promising to replace Si (silicon) for advanced nodes. The study systematically analyzes the following aspects of GeO2/Ge stacks that will shed light on the characteristics and reaction principles of the system: GeO2/Ge degradation, Ge passivation techniques, desorption kinetics of GeO from GeO2/Ge, the relationship between GeO2 crystallization and GeO2/Ge interface reaction, and the oxidation kinetics of Ge. Based on findings from the intrinsic properties of GeO2/Ge, the author also compares it with prevalent SiO2/Si systems and demonstrates the essential differences between the two, contributing to quality control, process optimization, and technology advancements of GeO2/Ge. The book will be a useful reference for researchers, professionals, and students interested in electronic materials, condenser matter physics, microelectronic engineering, and semiconductors.
Publisher: CRC Press
ISBN: 1000581365
Category : Technology & Engineering
Languages : en
Pages : 157
Book Description
Kinetic Studies in GeO2/Ge System: A Retrospective from 2021 investigates reaction kinetics in GeO2/Ge systems, aiming to demonstrate the fundamentals of the GeO2/Ge interface and to give insight into the distinctive features and performance of Ge (germanium) applied to advanced complementary metal oxide semiconductor (CMOS) devices. This book first reviews the development of MOS technology and discusses the potentials of emerging Ge and the challenges facing it as a contentious channel material, once promising to replace Si (silicon) for advanced nodes. The study systematically analyzes the following aspects of GeO2/Ge stacks that will shed light on the characteristics and reaction principles of the system: GeO2/Ge degradation, Ge passivation techniques, desorption kinetics of GeO from GeO2/Ge, the relationship between GeO2 crystallization and GeO2/Ge interface reaction, and the oxidation kinetics of Ge. Based on findings from the intrinsic properties of GeO2/Ge, the author also compares it with prevalent SiO2/Si systems and demonstrates the essential differences between the two, contributing to quality control, process optimization, and technology advancements of GeO2/Ge. The book will be a useful reference for researchers, professionals, and students interested in electronic materials, condenser matter physics, microelectronic engineering, and semiconductors.
Catalog of Copyright Entries. Third Series
Author: Library of Congress. Copyright Office
Publisher: Copyright Office, Library of Congress
ISBN:
Category : Copyright
Languages : en
Pages : 1786
Book Description
Publisher: Copyright Office, Library of Congress
ISBN:
Category : Copyright
Languages : en
Pages : 1786
Book Description
Scientific and Technical Aerospace Reports
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1572
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1572
Book Description
Eleventh Annual Technical Report: July 1971 to June 1972
Author: Stanford University. Center for Materials Research
Publisher:
ISBN:
Category :
Languages : en
Pages : 340
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 340
Book Description
Chemical Engineering Progress
Author:
Publisher:
ISBN:
Category : Chemistry, Technical
Languages : en
Pages : 904
Book Description
Publisher:
ISBN:
Category : Chemistry, Technical
Languages : en
Pages : 904
Book Description
Ninth Annual Technical Report: July 1969 to June 1970
Author: Stanford University. Center for Materials Research
Publisher:
ISBN:
Category :
Languages : en
Pages : 328
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 328
Book Description
Eighth Annual Technical Report: July 1968 to June 1969
Author: Stanford University. Center for Materials Research
Publisher:
ISBN:
Category :
Languages : en
Pages : 320
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 320
Book Description
Directory of Graduate Research
Author: American Chemical Society. Committee on Professional Training
Publisher:
ISBN:
Category : Biochemistry
Languages : en
Pages : 826
Book Description
Faculties, publications and doctoral theses in departments or divisions of chemistry, chemical engineering, biochemistry and pharmaceutical and/or medicinal chemistry at universities in the United States and Canada.
Publisher:
ISBN:
Category : Biochemistry
Languages : en
Pages : 826
Book Description
Faculties, publications and doctoral theses in departments or divisions of chemistry, chemical engineering, biochemistry and pharmaceutical and/or medicinal chemistry at universities in the United States and Canada.