Proceedings of the Symposium on High Speed III-V Electronics for Wireless Applications and the Twenty-Fifth State-of-the-Art Program on Compound Semiconductors (SOTAPOCS XXV) PDF Download
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Author: F. Ren
Publisher: The Electrochemical Society
ISBN: 9781566771658
Category : Science
Languages : en
Pages : 364
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Book Description
Author: F. Ren
Publisher: The Electrochemical Society
ISBN: 9781566771658
Category : Science
Languages : en
Pages : 364
Get Book
Book Description
Author: British Library. Document Supply Centre
Publisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 938
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Author:
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ISBN:
Category : American literature
Languages : en
Pages : 990
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Author: A. G. Baca
Publisher: The Electrochemical Society
ISBN: 9781566772853
Category : Technology & Engineering
Languages : en
Pages : 230
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Book Description
The proceedings were published before the two symposia actually took place, and some of the papers presented were not received in time. The 21 that did make it discuss compound semiconductors from perspectives of recent developments in materials, growth, characterization, processing, device fabrication, and reliability. Among the specific topics are the non-crystallographic wet etching of gallium arsenide, fabricating an integrated optics One to Two optical switch, and the fabrication and materials characterization of pulsed laser deposited nickel silicide ohmic contacts to 4H n-SiC. Annotation copyrighted by Book News, Inc., Portland, OR
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Category : Electrical engineering
Languages : en
Pages : 2304
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Author:
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Category : Engineering
Languages : en
Pages : 422
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Author:
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Category : Compound semiconductors
Languages : en
Pages : 554
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Book Description
Author: Electrochemical Society. Meeting
Publisher: The Electrochemical Society
ISBN: 9781566773751
Category : Science
Languages : en
Pages : 538
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Book Description
Author: Francis F. Chen
Publisher: Springer Science & Business Media
ISBN: 1461501814
Category : Science
Languages : en
Pages : 213
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Book Description
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Author: Markus-Christian Amann
Publisher: Artech House Optoelectronics L
ISBN: 9780890069639
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
This comprehensive reference discusses the underlying physics, operational principles, and performance and applications of tunable laser diodes. The book is supplemented with practical examples and helpful notations.
