Proceedings of the Symposia on Interconnects, Contact Metallization, and Multilevel Metallization and Reliability for Semiconductor Devices, Interconnects, and Thin Insulator Materials PDF Download
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Author: T. O. Herndon
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 520
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Author: T. O. Herndon
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 520
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Book Description
Author:
Publisher: The Electrochemical Society
ISBN: 9781566772594
Category : Technology & Engineering
Languages : en
Pages : 636
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Author: Karen A. Reinhardt
Publisher: John Wiley & Sons
ISBN: 1118099516
Category : Technology & Engineering
Languages : en
Pages : 596
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Book Description
Provides an In-depth discussion of surface conditioning for semiconductor applications The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications provides an in-depth discussion of surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet processing is reviewed as well as surface and colloidal aspects of cleaning and etching. Topics covered in this new reference include: Front end line (FEOL) and back end of line (BEOL) cleaning applications such as high-k/metal gate post-etch cleaning and pore sealing, high-dose implant stripping and cleaning, and germanium, and silicon passivation Formulation development practices, methodology and a new directions are presented including chemicals used for preventing corrosion of copper lines, cleaning aluminium lines, reclaiming wafers, and water bonding, as well as the filtering and recirculating of chemicals including reuse and recycling Wetting, cleaning, and drying of features, such as high aspect ratio features and hydrophilic surface states, especially how to dry without watermarks, the abilities to wet hydrophobic surfaces and to remove liquid from deep features The chemical reactions and mechanisms of silicon dioxide etching with hydrofluoric acid, particle removal with ammonium hydroxide/hydrogen peroxide mixture, and metal removal with hydrochloric acid The Handbook of Cleaning for Semiconductor Manufacturing: Fundamentals and Applications is a valuable resource for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. Engineers working for semiconductor manufacturing, capital equipment, chemicals, or other industries that assures cleanliness of chemicals, material, and equipment in the manufacturing area will also find this handbook an indispensible reference.
Author:
Publisher:
ISBN:
Category : Semiconductor wafers
Languages : en
Pages : 636
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Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 324
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Author:
Publisher:
ISBN:
Category : Conference proceedings
Languages : en
Pages : 976
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Author: Zhiqiang Li
Publisher:
ISBN:
Category :
Languages : en
Pages : 234
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Author: James R. Lloyd
Publisher:
ISBN:
Category : Electrodiffusion
Languages : en
Pages : 214
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Author: American Chemical Society. Chemical Abstracts Service
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2064
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Book Description
A key source to journal and conference abbreviations in the sciences. Although it focuses on chemistry, other scientific and engineering disciplines are also well represented. In addition to the abbreviation and full title, each entry also contains publishing info, title changes, language and frequency of publication, and libraries owning that title. Over 130,000 entries representing more than 70,000 publications dating back to 1907 are included.
Author:
Publisher:
ISBN:
Category : American literature
Languages : en
Pages : 3310
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