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Author: I. H. Hutchinson
Publisher: Cambridge University Press
ISBN: 9780521675741
Category : Science
Languages : en
Pages : 460
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Book Description
This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.
Author: I. H. Hutchinson
Publisher: Cambridge University Press
ISBN: 9780521675741
Category : Science
Languages : en
Pages : 460
Get Book Here
Book Description
This book provides a systematic introduction to the physics of plasma diagnostics measurements. It develops from first principles the concepts needed to plan, execute and interpret plasma measurements, making it a suitable book for graduate students and professionals with little plasma physics background. The book will also be a valuable reference for seasoned plasma physicists, both experimental and theoretical, as well as those with an interest in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field.
Author: I. H. Hutchinson
Publisher: Cambridge University Press
ISBN: 0521803896
Category : Science
Languages : en
Pages : 460
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Book Description
This book provides a systematic introduction to the physics behind measurements on plasmas. It develops from first principles the concepts needed to plan, execute, and interpret plasma diagnostics. The book is therefore accessible to graduate students and professionals with little specific plasma physics background, but is also a valuable reference for seasoned plasma physicists. Most of the examples are taken from laboratory plasma research, but the focus on principles makes the treatment useful to all experimental and theoretical plasma physicists, including those interested in space and astrophysical applications. This second edition is thoroughly revised and updated, with new sections and chapters covering recent developments in the field. Specific areas of added coverage include neutral-beam-based diagnostics, flow measurement with mach probes, equilibrium of strongly shaped plasmas and fusion product diagnostics.
Author: Francis F. Chen
Publisher: Springer Science & Business Media
ISBN: 1461501814
Category : Science
Languages : en
Pages : 213
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Book Description
Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Author: Hans R. Griem
Publisher:
ISBN: 9780521455046
Category : Science
Languages : en
Pages : 366
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Book Description
This is a comprehensive description of the theoretical foundations and experimental applications of spectroscopic methods in plasma physics research. It introduces the classical and quantum theory of radiation, with detailed descriptions of line strengths and high density effects, and describes theoretical and experimental aspects of spectral line broadening. The book illustrates the concepts of continuous spectra, level kinetics and cross sections, thermodynamic equilibrium relations, radiative energy transfer, and radiative energy losses. The basics of plasma spectroscopy to density and temperature measurements and to the determination of some other plasma properties are also explored. Over one thousand references not only guide the reader to original research covered in the chapters, but also to experimental details and instrumentation.
Author: NN Misra
Publisher: Academic Press
ISBN: 012801489X
Category : Technology & Engineering
Languages : en
Pages : 382
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Book Description
Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications. Food scientists and food engineers interested in understanding the theory and application of nonthermal plasma for food will find this book valuable because it provides a roadmap for future developments in this emerging field. This reference is also useful for biologists, chemists, and physicists who wish to understand the fundamentals of plasma physics, chemistry, and technology and their biological interactions through applying novel plasma sources to food and other sensitive biomaterials. - Examines the topic of cold plasma technology for food applications - Demonstrates state-of-the-art developments in plasma technology and potential solutions to improve food safety and quality - Presents a solid introduction for readers on the topics of plasma physics and chemistry that are required to understand biological applications for foods - Serves as a roadmap for future developments for food scientists, food engineers, and biologists, chemists, and physicists working in this emerging field
Author: Mark A. Heald
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 478
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Book Description
Author: Richard H. Huddlestone
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 652
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Book Description
Author: Nader Rifai
Publisher: Elsevier
ISBN: 0128160624
Category : Science
Languages : en
Pages : 424
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Book Description
Principles and Applications of Molecular Diagnostics serves as a comprehensive guide for clinical laboratory professionals applying molecular technology to clinical diagnosis. The first half of the book covers principles and analytical concepts in molecular diagnostics such as genomes and variants, nucleic acids isolation and amplification methods, and measurement techniques, circulating tumor cells, and plasma DNA; the second half presents clinical applications of molecular diagnostics in genetic disease, infectious disease, hematopoietic malignancies, solid tumors, prenatal diagnosis, pharmacogenetics, and identity testing. A thorough yet succinct guide to using molecular testing technology, Principles and Applications of Molecular Diagnostics is an essential resource for laboratory professionals, biologists, chemists, pharmaceutical and biotech researchers, and manufacturers of molecular diagnostics kits and instruments. - Explains the principles and tools of molecular biology - Describes standard and state-of-the-art molecular techniques for obtaining qualitative and quantitative results - Provides a detailed description of current molecular applications used to solve diagnostics tasks
Author: T. D. Lee
Publisher: University of Washington Press
ISBN: 9780295965192
Category : Science
Languages : en
Pages : 86
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Book Description
Discusses mirror symmetry, a symmetries, time reversal, vacuum as a physical medium, spontaneous symmetry breaking, particles, and quarks.
Author: Evgeny V. Shun'ko
Publisher: Universal-Publishers
ISBN: 1599429357
Category : Science
Languages : en
Pages : 251
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Book Description
From flat-panel televisions to thermonuclear fusion for energy production, plasmas currently have numerous and wide applications in sciences and industry. A diversity of plasma diagnostics is available to physicists and engineers to measure and control plasma parameters. Among them, the Langmuir probe is the most inexpensive and most popular instrument and method. The Langmuir probe is a small electrode which is submerged in plasma in order to measure the probe current-voltage characteristic. The same characteristic is processed further to derive the electron and ion concentration, the electron distribution function, and the plasma potential at the probe location. Langmuir probe diagnostics afford rapid measurements of the electron distribution function and plasma potential at a good time resolution, 10-8 seconds in a wide range of plasma densities 10+3 - 10+14 cm-3, and the electron energy from the room temperature to hundreds of electron-volts - qualities which are essential for researchers. In view of these facts, Langmuir probe diagnostics are applied very frequently to measuring plasma parameters. This book will be useful in teaching plasma diagnostics to undergraduate and graduate students in plasma physics courses. And it will also serve as a practical reference manual for physicists and engineers working in the growing area of plasma physics. The reader of this book will learn what kind of plasma parameters the Langmuir probe can measure, how to develop the probe diagnostics for specific cases, and how the probe data obtained should be processed to deduce reliable plasma parameters. In this book, the reader can find not only the basic physics information important to understanding the principles of probe operation, but also how the "real" probe disturbs plasma, and how it is possible to reconstruct undisturbed plasma parameters with available probe data.
