Plasma Enhanced Chemical Vapor Deposition of In-situ Doped Epitaxial Silicon from Silane at Low Temperatures PDF Download
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Author: James Hartfiel Comfort
Publisher:
ISBN:
Category :
Languages : en
Pages : 352
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Book Description
Author: James Hartfiel Comfort
Publisher:
ISBN:
Category :
Languages : en
Pages : 352
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Author: Joel Thornton Irby
Publisher:
ISBN:
Category : Silicon
Languages : en
Pages : 118
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Author: Electrochemical Society. High Temperature Materials Division
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 1296
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Author: L. R. Reif
Publisher:
ISBN:
Category :
Languages : en
Pages : 12
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Book Description
A reactor system has been developed to deposit specular epitaxial silicon films at temperatures as low as 620 C using a low pressure chemical vapor deposition process both with and without plasma enhancement. This represents the lowest silicon epitaxial deposition temperature ever reported for a thermally driven chemical vapor deposition process. Experiments performed at 775 C indicate that the predeposition in-situ cleaning of the substrate surface is the critical step in determining whether epitaxial deposition will occur. Surface cleaning in these experiments was done by sputtering in an argon plasma ambient at the deposition temperature while applying a dc bias to the susceptor. This is the lowest pre-epitaxial cleaning temperature ever reported for a thermally driven chemical vapor deposition. (Author).
Author: Hugh O. Pierson
Publisher: William Andrew
ISBN: 1437744885
Category : Technology & Engineering
Languages : en
Pages : 458
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Book Description
Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Author: McD. Robinson
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 828
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Author: W. R. Burger
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 22
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Book Description
Author: Mac E. Van Valkenburg
Publisher: Newnes
ISBN: 9780750672917
Category : Technology & Engineering
Languages : en
Pages : 1696
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Book Description
This standard handbook for engineers covers the fundamentals, theory and applications of radio, electronics, computers, and communications equipment. It provides information on essential, need-to-know topics without heavy emphasis on complicated mathematics. It is a "must-have" for every engineer who requires electrical, electronics, and communications data. Featured in this updated version is coverage on intellectual property and patents, probability and design, antennas, power electronics, rectifiers, power supplies, and properties of materials. Useful information on units, constants and conversion factors, active filter design, antennas, integrated circuits, surface acoustic wave design, and digital signal processing is also included. This work also offers new knowledge in the fields of satellite technology, space communication, microwave science, telecommunication, global positioning systems, frequency data, and radar.
Author:
Publisher:
ISBN:
Category : Materials
Languages : en
Pages : 440
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Book Description
Author: T. J. Donahue
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 22
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Book Description
