Piezoresistivity of Indium Tin Oxide Thin Films Prepared by Pulsed Laser Deposition

Piezoresistivity of Indium Tin Oxide Thin Films Prepared by Pulsed Laser Deposition PDF Author: Hui Fang
Publisher:
ISBN:
Category : Indium compounds
Languages : en
Pages : 150

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Piezoresistivity of Indium Tin Oxide Thin Films Prepared by Pulsed Laser Deposition

Piezoresistivity of Indium Tin Oxide Thin Films Prepared by Pulsed Laser Deposition PDF Author: Hui Fang
Publisher:
ISBN:
Category : Indium compounds
Languages : en
Pages : 150

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Transparent Conducting Pure and Tin Doped Indium Oxide Films - Preparation and Characterization

Transparent Conducting Pure and Tin Doped Indium Oxide Films - Preparation and Characterization PDF Author: Dr. B. Radhakrishna
Publisher: Lulu.com
ISBN: 0359510280
Category : Education
Languages : en
Pages : 132

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Badeker in 1907 observed that some materials are optically transparent in the visible light and electrically conducting [1]. Because of the increasing interest in electrically and electronically active materials, the search for materials and the techniques for producing semi-transparent electrically conducting films have gained much importance. In an intrinsic stoichiometric material, it is not possible to have simultaneously high transparency (>80%%) in the visible region and high electrical conductivity (>103 Ω cm-1). A variety of metals in thin film form (

Study of Indium Tin Oxide (ITO) Thin Films Prepared by Pulsed DC Facing-target Sputtering (FTS)

Study of Indium Tin Oxide (ITO) Thin Films Prepared by Pulsed DC Facing-target Sputtering (FTS) PDF Author: Chi Keung Fung
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages :

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Fabrication, Metrology and Modeling of Protective Coatings on Metallic MEMS Components

Fabrication, Metrology and Modeling of Protective Coatings on Metallic MEMS Components PDF Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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This project provided a proof-of-concept that indium tin oxide (ITO) thin films can be prepared on surfaces by pulsed laser deposition and configured as miniature strain gauges. The degree of piezoresistivity of the films is related to the oxygen content, with larger gauge factors correlated with oxygen excess. Typical gauge factors of order 10 were observed. Gauges as small as 20x 100 microns were fabricated by focused ion beam milling and characterized. Radiation effects from ion beam milling were observed and measured. Structures encapsulated with silicon dioxide protective films retailed their piezoresistive coefficient and were less susceptible to damage by focused ion beam imaging.

Indium Tin Oxide Films Deposited by Pulsed-laser Ablation at Room Temperature

Indium Tin Oxide Films Deposited by Pulsed-laser Ablation at Room Temperature PDF Author: Manuel Angel Morales Paliza
Publisher:
ISBN:
Category : Indium compounds
Languages : en
Pages : 158

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Wettability of oxide thin films prepared by pulsed laser deposition

Wettability of oxide thin films prepared by pulsed laser deposition PDF Author: Saurav Prakash
Publisher:
ISBN:
Category :
Languages : en
Pages : 0

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Preparation and Post-Annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films

Preparation and Post-Annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films PDF Author: Rongxin Wang
Publisher: Open Dissertation Press
ISBN: 9781361207796
Category :
Languages : en
Pages :

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This dissertation, "Preparation and Post-annealing Effects on the Optical Properties of Indium Tin Oxide Thin Films" by Rongxin, Wang, 王榮新, was obtained from The University of Hong Kong (Pokfulam, Hong Kong) and is being sold pursuant to Creative Commons: Attribution 3.0 Hong Kong License. The content of this dissertation has not been altered in any way. We have altered the formatting in order to facilitate the ease of printing and reading of the dissertation. All rights not granted by the above license are retained by the author. Abstract: Abstract of thesis entitled PREPARATION AND POST-ANNEALING EFFECTS ON THE OPTICAL PROPERTIES OF INDIUM TIN OXIDE THIN FILMS Submitted by WANG Rong Xin for the degree of Doctor of Philosophy at The University of Hong Kong in April 2005 Many opto-electronic devices, such as III-V compound devices, liquid crystal displays, solar cells, organic and inorganic light emitting devices, and ultraviolet photodetectors, demand transparent electrode materials simultaneously having high electrical conductance. To meet the requirements for particular applications, a great deal of basic research and studies have been carried out on the electrical and optical properties of these materials. As a most promising candidate for such materials, indium tin oxide (ITO) has attracted interest in recent years. Furthermore, ITO has many unique properties such as excellent adhesion on the substrate, thermal stability and ease of patterning. The deposition of high-quality ITO thin films is a key step for successful application of ITO thin films as transparent electrode materials. To obtain optimal electrical and optical properties of ITO films, the growth parameters and conditions must be determined. Moreover, the optical and electrical properties of ITO contact layers, which can either be on the top side or the bottom side of a device, are influenced by various post-deposition treatments. For the present work, ITO thin films were deposited on glass and quartz substrates using e-beam evaporation with different deposition rates. The influence of substrate material, deposition rate, deposition gas environment and post-deposition annealing on the optical properties of the films was investigated in detail. Atomic force microscopy, X-ray diffraction and X-ray photoemission spectroscopy was employed to obtain information on the chemical state and crystallization of the films. Analysis of these data suggests that the substrate material, deposition rate, deposition gas environment and post-deposition annealing conditions strongly affect the chemical composition and the microstructure of the ITO films and these in turn influence the optical properties of the film. Oxygen incorporation transfers the In O phase to the In O phase and removes metallic In to form both indium oxide 2 3-x 2 3 phases. Both of these reactions are beneficial for the optical transmittance of ITO thin films. Moreover, it was found that the incorporation and decomposition reactions of oxygen can be controlled so as to change the optical properties of the ITO thin films reversibly. DOI: 10.5353/th_b3154617 Subjects: Thin films - Optical properties Indium compounds Annealing of metals

Semiconducting Properties of Oxide Thin Films Prepared by Pulsed Laser Deposition

Semiconducting Properties of Oxide Thin Films Prepared by Pulsed Laser Deposition PDF Author: Ching-yee Lam
Publisher:
ISBN:
Category : Pulsed laser deposition
Languages : en
Pages : 328

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Electrical, Optical and Structural Properties of Indium Tin Oxide Thin Films Deposited on Glass, Pet and Polycarbonate Substrates by Rf Sputtering

Electrical, Optical and Structural Properties of Indium Tin Oxide Thin Films Deposited on Glass, Pet and Polycarbonate Substrates by Rf Sputtering PDF Author: Teck-Shiun Lim
Publisher:
ISBN:
Category :
Languages : en
Pages : 140

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Development of Lead-free Piezoelectric Thin Films by Pulsed Laser Deposition

Development of Lead-free Piezoelectric Thin Films by Pulsed Laser Deposition PDF Author: Maryam Abazari Torghabeh
Publisher:
ISBN:
Category : Ferroelectric devices
Languages : en
Pages : 193

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As a high performance piezoelectric material widely used in sensors, actuators and other electronic devices, lead zirconate titanate (PZT) ceramics have been the center of attention for many years. However, the toxicity of these materials and their exposure to the environment during processing steps, such as calcination, sintering, machining as well as problems in recycling and disposal have been major concerns regarding their usage all around the globe for the past couple of decades. Consequently, utilizing lead-based materials for many commercial applications have been recently restricted in Europe and Asia and measures are being taken in United States as well. Therefore, there is an urgent need for lead-free piezoelectrics whose properties are comparable to those of well-known PZT materials. Recently, the discovery of ultra-high piezoelectric activity in the ternary lead-free KNaNbO3-LiTaO3-LiSbO3 (KNN-LT-LS) and (Bi, Na)TiO3-(Bi, K)TiO3-BaTiO3 (BNT-BKT-BT) systems have given hope for alternatives to PZT. Furthermore, the demand for new generation of environment-friendly functional devices, utilizing piezoelectric materials, inspired a new surge in lead-free piezoelectric thin film research. In this study, an attempt has been made to explore the development of lead-free piezoelectric thin films by Pulsed Laser Deposition (PLD) on SrTiO3 substrate. While the growth and development process of KNN-LT-LS thin films was the primary goal of this thesis, a preliminary effort was also made to fabricate and characterize BNT-BKT-BT thin films. In a comprehensive and systematic process optimization study in conjunction with X-ray diffractometry, the phase evolution, stoichiometry, and growth orientation of the films are monitored as a function of deposition conditions including temperature and ambient oxygen partial pressure. Processing parameters such as substrate temperature and pressure are shown to be highly dominant in determining the phase and composition of the films. Oxygen partial pressure has shown to control the chemical composition of the films through solid-gaseous phase equilibrium and substrate temperature has mostly influenced the growth mode and microstructure. Findings of this study has shown that 300-500 nm single-phase epitaxial KNN-LT-LS and BNT-BKT-BT thin films could indeed be obtained at a temperature of 700-750 oC and 300-400 mTorr of oxygen partial pressure. Following a series of studies on effect of doping, it was revealed that addition of 1 mol% Mn to KNN-LT-LS composition resulted in a significant suppression of leakage current and enhancement of polarization saturation. A remanent polarization of 16 æC/cm2 and coercive field of 20 kV/cm were measured for such thin film, which are comparable to those of hard PZT counterparts. Also, a high remanent polarization and coercive field of 30 æC/cm2 and 95 kV/cm were achieved in 350 nm BNT-BKT-BT thin films. Longitudinal (d33) and transverse (e31, f) piezoelectric coefficients of KNN-LT-LS thin films were found to be 55 pm/V and -4.5 C/m2 respectively, prepared at the optimized conditions, whereas 350 nm BNT-BKT-BT thin films exhibited an e31, f of -2.25 C/m2. The results of this study present the great potential of KNN-LT-LS and BNT-BKT-BT thin films for piezoelectric MEMS devices and provide a baseline for future investigations on lead-free piezoelectric thin films.