Author: Babu Suryadevara
Publisher: Woodhead Publishing
ISBN: 0128218193
Category : Technology & Engineering
Languages : en
Pages : 650
Book Description
Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. - Reviews the most relevant techniques and processes for CMP of dielectric and metal films - Includes chapters devoted to CMP for current and emerging materials - Addresses consumables and process control for improved CMP, including post-CMP
Advances in Chemical Mechanical Planarization (CMP)
Author: Babu Suryadevara
Publisher: Woodhead Publishing
ISBN: 0128218193
Category : Technology & Engineering
Languages : en
Pages : 650
Book Description
Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. - Reviews the most relevant techniques and processes for CMP of dielectric and metal films - Includes chapters devoted to CMP for current and emerging materials - Addresses consumables and process control for improved CMP, including post-CMP
Publisher: Woodhead Publishing
ISBN: 0128218193
Category : Technology & Engineering
Languages : en
Pages : 650
Book Description
Advances in Chemical Mechanical Planarization (CMP), Second Edition provides the latest information on a mainstream process that is critical for high-volume, high-yield semiconductor manufacturing, and even more so as device dimensions continue to shrink. The second edition includes the recent advances of CMP and its emerging materials, methods, and applications, including coverage of post-CMP cleaning challenges and tribology of CMP. This important book offers a systematic review of fundamentals and advances in the area. Part one covers CMP of dielectric and metal films, with chapters focusing on the use of current and emerging techniques and processes and on CMP of various materials, including ultra low-k materials and high-mobility channel materials, and ending with a chapter reviewing the environmental impacts of CMP processes. New content addressed includes CMP challenges with tungsten, cobalt, and ruthenium as interconnect and barrier films, consumables for ultralow topography and CMP for memory devices. Part two addresses consumables and process control for improved CMP and includes chapters on CMP pads, diamond disc pad conditioning, the use of FTIR spectroscopy for characterization of surface processes and approaches for defection characterization, mitigation, and reduction. Advances in Chemical Mechanical Planarization (CMP), Second Edition is an invaluable resource and key reference for materials scientists and engineers in academia and R&D. - Reviews the most relevant techniques and processes for CMP of dielectric and metal films - Includes chapters devoted to CMP for current and emerging materials - Addresses consumables and process control for improved CMP, including post-CMP
Chemical-Mechanical Planarization of Semiconductor Materials
Author: M.R. Oliver
Publisher: Springer Science & Business Media
ISBN: 9783540431817
Category : Technology & Engineering
Languages : en
Pages : 444
Book Description
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.
Publisher: Springer Science & Business Media
ISBN: 9783540431817
Category : Technology & Engineering
Languages : en
Pages : 444
Book Description
This book contains a comprehensive review of CMP (Chemical-Mechanical Planarization) technology, one of the most exciting areas in the field of semiconductor technology. It contains detailed discussions of all aspects of the technology, for both dielectrics and metals. The state of polishing models and their relation to experimental results are covered. Polishing tools and consumables are also covered. The leading edge issues of damascene and new dielectrics as well as slurryless technology are discussed.
Chemical Oxidation Applications for Industrial Wastewaters
Author: Olcay Tunay
Publisher: IWA Publishing
ISBN: 1843393077
Category : Science
Languages : en
Pages : 361
Book Description
This book covers the most recent scientific and technological developments (state-of-the-art) in the field of chemical oxidation processes applicable for the efficient treatment of biologically-difficult-to-degrade, toxic and/or recalcitrant effluents originating from different manufacturing processes. It is a comprehensive review of process and pollution profiles as well as conventional, advanced and emerging treatment processes & technologies developed for the most relevant and pollution (wet processing)-intensive industrial sectors. It addresses chemical/photochemical oxidative treatment processes, case-specific treatability problems of major industrial sectors, emerging (novel) as well as pilot/full-scale applications, process integration, treatment system design & sizing criteria (figure-of-merits), cost evaluation and success stories in the application of chemical oxidative treatment processes. Chemical Oxidation Applications for Industrial Wastewaters is an essential reference for lecturers, researchers, industrial and environmental engineers and practitioners working in the field of environmental science and engineering. Visit the IWA WaterWiki to read and share material related to this title: http://www.iwawaterwiki.org/xwiki/bin/view/Articles/CHEMICALOXIDATIONAPPLICATIONSFORINDUSTRIALWASTEWATERS Authors: Professor Olcay Tünay, Professor Isik Kabdasli, Associate Professor Idil Arslan-Alaton and Assistant Professor Tugba Ölmez-Hanci, Environmental Engineering Department, Istanbul Technical University, Turkey.
Publisher: IWA Publishing
ISBN: 1843393077
Category : Science
Languages : en
Pages : 361
Book Description
This book covers the most recent scientific and technological developments (state-of-the-art) in the field of chemical oxidation processes applicable for the efficient treatment of biologically-difficult-to-degrade, toxic and/or recalcitrant effluents originating from different manufacturing processes. It is a comprehensive review of process and pollution profiles as well as conventional, advanced and emerging treatment processes & technologies developed for the most relevant and pollution (wet processing)-intensive industrial sectors. It addresses chemical/photochemical oxidative treatment processes, case-specific treatability problems of major industrial sectors, emerging (novel) as well as pilot/full-scale applications, process integration, treatment system design & sizing criteria (figure-of-merits), cost evaluation and success stories in the application of chemical oxidative treatment processes. Chemical Oxidation Applications for Industrial Wastewaters is an essential reference for lecturers, researchers, industrial and environmental engineers and practitioners working in the field of environmental science and engineering. Visit the IWA WaterWiki to read and share material related to this title: http://www.iwawaterwiki.org/xwiki/bin/view/Articles/CHEMICALOXIDATIONAPPLICATIONSFORINDUSTRIALWASTEWATERS Authors: Professor Olcay Tünay, Professor Isik Kabdasli, Associate Professor Idil Arslan-Alaton and Assistant Professor Tugba Ölmez-Hanci, Environmental Engineering Department, Istanbul Technical University, Turkey.
The Craft and Science of Coffee
Author: Britta Folmer
Publisher: Academic Press
ISBN: 0128035587
Category : Technology & Engineering
Languages : en
Pages : 558
Book Description
The Craft and Science of Coffee follows the coffee plant from its origins in East Africa to its current role as a global product that influences millions of lives though sustainable development, economics, and consumer desire.For most, coffee is a beloved beverage. However, for some it is also an object of scientifically study, and for others it is approached as a craft, both building on skills and experience. By combining the research and insights of the scientific community and expertise of the crafts people, this unique book brings readers into a sustained and inclusive conversation, one where academic and industrial thought leaders, coffee farmers, and baristas are quoted, each informing and enriching each other.This unusual approach guides the reader on a journey from coffee farmer to roaster, market analyst to barista, in a style that is both rigorous and experience based, universally relevant and personally engaging. From on-farming processes to consumer benefits, the reader is given a deeper appreciation and understanding of coffee's complexity and is invited to form their own educated opinions on the ever changing situation, including potential routes to further shape the coffee future in a responsible manner. - Presents a novel synthesis of coffee research and real-world experience that aids understanding, appreciation, and potential action - Includes contributions from a multitude of experts who address complex subjects with a conversational approach - Provides expert discourse on the coffee calue chain, from agricultural and production practices, sustainability, post-harvest processing, and quality aspects to the economic analysis of the consumer value proposition - Engages with the key challenges of future coffee production and potential solutions
Publisher: Academic Press
ISBN: 0128035587
Category : Technology & Engineering
Languages : en
Pages : 558
Book Description
The Craft and Science of Coffee follows the coffee plant from its origins in East Africa to its current role as a global product that influences millions of lives though sustainable development, economics, and consumer desire.For most, coffee is a beloved beverage. However, for some it is also an object of scientifically study, and for others it is approached as a craft, both building on skills and experience. By combining the research and insights of the scientific community and expertise of the crafts people, this unique book brings readers into a sustained and inclusive conversation, one where academic and industrial thought leaders, coffee farmers, and baristas are quoted, each informing and enriching each other.This unusual approach guides the reader on a journey from coffee farmer to roaster, market analyst to barista, in a style that is both rigorous and experience based, universally relevant and personally engaging. From on-farming processes to consumer benefits, the reader is given a deeper appreciation and understanding of coffee's complexity and is invited to form their own educated opinions on the ever changing situation, including potential routes to further shape the coffee future in a responsible manner. - Presents a novel synthesis of coffee research and real-world experience that aids understanding, appreciation, and potential action - Includes contributions from a multitude of experts who address complex subjects with a conversational approach - Provides expert discourse on the coffee calue chain, from agricultural and production practices, sustainability, post-harvest processing, and quality aspects to the economic analysis of the consumer value proposition - Engages with the key challenges of future coffee production and potential solutions
Applications of Process Engineering Principles in Materials Processing, Energy and Environmental Technologies
Author: Shijie Wang
Publisher: Springer
ISBN: 3319510916
Category : Technology & Engineering
Languages : en
Pages : 549
Book Description
This collection offers new research findings, innovations, and industrial technological developments in extractive metallurgy, energy and environment, and materials processing. Technical topics included in the book are thermodynamics and kinetics of metallurgical reactions, electrochemical processing of materials, plasma processing of materials, composite materials, ionic liquids, thermal energy storage, energy efficient and environmental cleaner technologies and process modeling. These topics are of interest not only to traditional base ferrous and non-ferrous metal industrial processes but also to new and upcoming technologies, and they play important roles in industrial growth and economy worldwide.
Publisher: Springer
ISBN: 3319510916
Category : Technology & Engineering
Languages : en
Pages : 549
Book Description
This collection offers new research findings, innovations, and industrial technological developments in extractive metallurgy, energy and environment, and materials processing. Technical topics included in the book are thermodynamics and kinetics of metallurgical reactions, electrochemical processing of materials, plasma processing of materials, composite materials, ionic liquids, thermal energy storage, energy efficient and environmental cleaner technologies and process modeling. These topics are of interest not only to traditional base ferrous and non-ferrous metal industrial processes but also to new and upcoming technologies, and they play important roles in industrial growth and economy worldwide.
Chemical Mechanical Planarization of Microelectronic Materials
Author: Joseph M. Steigerwald
Publisher: John Wiley & Sons
ISBN: 3527617752
Category : Science
Languages : en
Pages : 337
Book Description
Chemical Mechanical Planarization (CMP) plays an important role in today's microelectronics industry. With its ability to achieve global planarization, its universality (material insensitivity), its applicability to multimaterial surfaces, and its relative cost-effectiveness, CMP is the ideal planarizing medium for the interlayered dielectrics and metal films used in silicon integrated circuit fabrication. But although the past decade has seen unprecedented research and development into CMP, there has been no single-source reference to this rapidly emerging technology-until now. Chemical Mechanical Planarization of Microelectronic Materials provides engineers and scientists working in the microelectronics industry with unified coverage of both the fundamental mechanisms and engineering applications of CMP. Authors Steigerwald, Murarka, and Gutmann-all leading CMP pioneers-provide a historical overview of CMP, explain the various chemical and mechanical concepts involved, describe CMP materials and processes, review the latest scientific data on CMP worldwide, and offer examples of its uses in the microelectronics industry. They provide detailed coverage of the CMP of various materials used in the making of microcircuitry: tungsten, aluminum, copper, polysilicon, and various dielectric materials, including polymers. The concluding chapter describes post-CMP cleaning techniques, and most chapters feature problem sets to assist readers in developing a more practical understanding of CMP. The only comprehensive reference to one of the fastest growing integrated circuit manufacturing technologies, Chemical Mechanical Planarization of Microelectronic Materials is an important resource for research scientists and engineers working in the microelectronics industry. An indispensable resource for scientists and engineers working in the microelectronics industry Chemical Mechanical Planarization of Microelectronic Materials is the only comprehensive single-source reference to one of the fastest growing integrated circuit manufacturing technologies. It provides engineers and scientists who work in the microelectronics industry with unified coverage of both the fundamental mechanisms and engineering applications of CMP, including: * The history of CMP * Chemical and mechanical underpinnings of CMP * CMP materials and processes * Applications of CMP in the microelectronics industry * The CMP of tungsten, aluminum, copper, polysilicon, and various dielectrics, including polymers used in integrated circuit fabrication * Post-CMP cleaning techniques * Chapter-end problem sets are also included to assist readers in developing a practical understanding of CMP.
Publisher: John Wiley & Sons
ISBN: 3527617752
Category : Science
Languages : en
Pages : 337
Book Description
Chemical Mechanical Planarization (CMP) plays an important role in today's microelectronics industry. With its ability to achieve global planarization, its universality (material insensitivity), its applicability to multimaterial surfaces, and its relative cost-effectiveness, CMP is the ideal planarizing medium for the interlayered dielectrics and metal films used in silicon integrated circuit fabrication. But although the past decade has seen unprecedented research and development into CMP, there has been no single-source reference to this rapidly emerging technology-until now. Chemical Mechanical Planarization of Microelectronic Materials provides engineers and scientists working in the microelectronics industry with unified coverage of both the fundamental mechanisms and engineering applications of CMP. Authors Steigerwald, Murarka, and Gutmann-all leading CMP pioneers-provide a historical overview of CMP, explain the various chemical and mechanical concepts involved, describe CMP materials and processes, review the latest scientific data on CMP worldwide, and offer examples of its uses in the microelectronics industry. They provide detailed coverage of the CMP of various materials used in the making of microcircuitry: tungsten, aluminum, copper, polysilicon, and various dielectric materials, including polymers. The concluding chapter describes post-CMP cleaning techniques, and most chapters feature problem sets to assist readers in developing a more practical understanding of CMP. The only comprehensive reference to one of the fastest growing integrated circuit manufacturing technologies, Chemical Mechanical Planarization of Microelectronic Materials is an important resource for research scientists and engineers working in the microelectronics industry. An indispensable resource for scientists and engineers working in the microelectronics industry Chemical Mechanical Planarization of Microelectronic Materials is the only comprehensive single-source reference to one of the fastest growing integrated circuit manufacturing technologies. It provides engineers and scientists who work in the microelectronics industry with unified coverage of both the fundamental mechanisms and engineering applications of CMP, including: * The history of CMP * Chemical and mechanical underpinnings of CMP * CMP materials and processes * Applications of CMP in the microelectronics industry * The CMP of tungsten, aluminum, copper, polysilicon, and various dielectrics, including polymers used in integrated circuit fabrication * Post-CMP cleaning techniques * Chapter-end problem sets are also included to assist readers in developing a practical understanding of CMP.
Wastewater Characteristics, Treatment and Disposal
Author: Marcos Von Sperling
Publisher: IWA Publishing
ISBN: 1843391619
Category : Science
Languages : en
Pages : 305
Book Description
Wastewater Characteristics, Treatment and Disposal is the first volume in the series Biological Wastewater Treatment, presenting an integrated view of water quality and wastewater treatment. The book covers the following topics: wastewater characteristics (flow and major constituents) impact of wastewater discharges to rivers and lakes overview of wastewater treatment systems complementary items in planning studies. This book, with its clear and practical approach, lays the foundations for the topics that are analysed in more detail in the other books of the series. About the series: The series is based on a highly acclaimed set of best selling textbooks. This international version is comprised by six textbooks giving a state-of-the-art presentation of the science and technology of biological wastewater treatment. Other titles in the series are: Volume 2: Basic Principles of Wastewater Treatment; Volume 3: Waste Stabilisation Ponds; Volume 4: Anaerobic Reactors; Volume 5: Activated Sludge and Aerobic Biofilm Reactors; Volume 6: Sludge Treatment and Disposal
Publisher: IWA Publishing
ISBN: 1843391619
Category : Science
Languages : en
Pages : 305
Book Description
Wastewater Characteristics, Treatment and Disposal is the first volume in the series Biological Wastewater Treatment, presenting an integrated view of water quality and wastewater treatment. The book covers the following topics: wastewater characteristics (flow and major constituents) impact of wastewater discharges to rivers and lakes overview of wastewater treatment systems complementary items in planning studies. This book, with its clear and practical approach, lays the foundations for the topics that are analysed in more detail in the other books of the series. About the series: The series is based on a highly acclaimed set of best selling textbooks. This international version is comprised by six textbooks giving a state-of-the-art presentation of the science and technology of biological wastewater treatment. Other titles in the series are: Volume 2: Basic Principles of Wastewater Treatment; Volume 3: Waste Stabilisation Ponds; Volume 4: Anaerobic Reactors; Volume 5: Activated Sludge and Aerobic Biofilm Reactors; Volume 6: Sludge Treatment and Disposal
Nanotechnology Research Directions: IWGN Workshop Report
Author: R.S. Williams
Publisher: Springer Science & Business Media
ISBN: 9401595763
Category : Technology & Engineering
Languages : en
Pages : 367
Book Description
energy production, environmental management, transportation, communication, computation, and education. As the twenty-first century unfolds, nanotechnology's impact on the health, wealth, and security of the world's people is expected to be at least as significant as the combined influences in this century of antibiotics, the integrated circuit, and human-made polymers. Dr. Neal Lane, Advisor to the President for Science and Technology and former National Science Foundation (NSF) director, stated at a Congressional hearing in April 1998, "If I were asked for an area of science and engineering that will most likely produce the breakthroughs of tomorrow, I would point to nanoscale science and engineering. " Recognizing this potential, the White House Office of Science and Technology Policy (OSTP) and the Office of Management and Budget (OMB) have issued a joint memorandum to Federal agency heads that identifies nanotechnology as a research priority area for Federal investment in fiscal year 2001. This report charts "Nanotechnology Research Directions," as developed by the Interagency W orking Group on Nano Science, Engineering, and Technology (IWGN) of the National Science and Technology Council (NSTC). The report incorporates the views of leading experts from government, academia, and the private sector. It reflects the consensus reached at an IWGN-sponsored workshop held on January 27-29, 1999, and detailed in contributions submitted thereafter by members of the V. S. science and engineering community. (See Appendix A for a list of contributors.
Publisher: Springer Science & Business Media
ISBN: 9401595763
Category : Technology & Engineering
Languages : en
Pages : 367
Book Description
energy production, environmental management, transportation, communication, computation, and education. As the twenty-first century unfolds, nanotechnology's impact on the health, wealth, and security of the world's people is expected to be at least as significant as the combined influences in this century of antibiotics, the integrated circuit, and human-made polymers. Dr. Neal Lane, Advisor to the President for Science and Technology and former National Science Foundation (NSF) director, stated at a Congressional hearing in April 1998, "If I were asked for an area of science and engineering that will most likely produce the breakthroughs of tomorrow, I would point to nanoscale science and engineering. " Recognizing this potential, the White House Office of Science and Technology Policy (OSTP) and the Office of Management and Budget (OMB) have issued a joint memorandum to Federal agency heads that identifies nanotechnology as a research priority area for Federal investment in fiscal year 2001. This report charts "Nanotechnology Research Directions," as developed by the Interagency W orking Group on Nano Science, Engineering, and Technology (IWGN) of the National Science and Technology Council (NSTC). The report incorporates the views of leading experts from government, academia, and the private sector. It reflects the consensus reached at an IWGN-sponsored workshop held on January 27-29, 1999, and detailed in contributions submitted thereafter by members of the V. S. science and engineering community. (See Appendix A for a list of contributors.
Organic Solvent Nanofiltration
Author: Andrew Livingston
Publisher: Newnes
ISBN: 9780444537447
Category : Science
Languages : en
Pages : 0
Book Description
Separation of molecules present in organic solvents by membrane (nano)filtration has great potential in industries ranging from refining to fine chemical and pharmaceutical synthesis and is currently an area of intensive studies. This will be the first concise reference book offering a critical analysis on this topic. Nanofiltration, is a pressure driven membrane process used to remove solutes with molecular weight in the range of 200-1,000 g mol-1 typically from aqueous streams. A recent innovation is the extension of nanofiltration processes to organic solvents an emerging technology referred to as Organic Solvent Nanofiltration (OSN). Separation of molecules present in organic solvents by nanofiltration has great potential in various processes such as petroleum refining, fine chemical and pharmaceutical synthesis, catalyst recycle, enrichment of aromatics etc. This book summarizes the developments in the field of OSN. It describes materials and methods used for the preparation of organic solvent stable membranes. Various techniques for manufacturing of OSN membranes, their physico-chemical and performance related characterization and membrane transport mechanisms will be discussed and critically evaluated. A summary of the commercially available OSN membranes, their separation properties and manufacturers will also be presented. Finally a detailed overview of the OSN applications in various industrial and laboratory scale processes as well as their future prospective will be presented. Complete coverage of the field of organic Solvent Nanofiltration: theory and industrial applications Provides all you want to know in this fast developing application of membranes in industrial filtration and water purification Applications of membranes - summary of the existing applications and proposed new applications; review and critical analysis of the data on currently available OSN membranes. The benefit of this feature to the users is outlined in the comment of one referee: "I use these types of books as an instant reference, resource and fact checker when I am writing or researching topics in membrane technology. I also read the content carefully to keep myself at the state-of-the-art in the technology. R&D is an expensive and time consuming endeavor so anything learned from the literature is valuable when it helps to guide my efforts". Contains a large number of diagrams /figures (60 approx) which offer graphical explanations of the processes and the mechanisms underlying the processess provides practical and easy to understand examples of practical applications. The user can easily adapt these to his/her specific application Worked examples 15 (approx) Guide the reader through the various parameters, and show the reader the effect of these parameters in the overall design of the process Includes multimedia content, videos and active tables and diagrams Enable the user to add his/her own data and conditions and get results relevant to his/her situation. Tables (25 approx) Provides review and critical analysis of the data on currently available OSN membranes Glossary Summary of the main terms used in OSN
Publisher: Newnes
ISBN: 9780444537447
Category : Science
Languages : en
Pages : 0
Book Description
Separation of molecules present in organic solvents by membrane (nano)filtration has great potential in industries ranging from refining to fine chemical and pharmaceutical synthesis and is currently an area of intensive studies. This will be the first concise reference book offering a critical analysis on this topic. Nanofiltration, is a pressure driven membrane process used to remove solutes with molecular weight in the range of 200-1,000 g mol-1 typically from aqueous streams. A recent innovation is the extension of nanofiltration processes to organic solvents an emerging technology referred to as Organic Solvent Nanofiltration (OSN). Separation of molecules present in organic solvents by nanofiltration has great potential in various processes such as petroleum refining, fine chemical and pharmaceutical synthesis, catalyst recycle, enrichment of aromatics etc. This book summarizes the developments in the field of OSN. It describes materials and methods used for the preparation of organic solvent stable membranes. Various techniques for manufacturing of OSN membranes, their physico-chemical and performance related characterization and membrane transport mechanisms will be discussed and critically evaluated. A summary of the commercially available OSN membranes, their separation properties and manufacturers will also be presented. Finally a detailed overview of the OSN applications in various industrial and laboratory scale processes as well as their future prospective will be presented. Complete coverage of the field of organic Solvent Nanofiltration: theory and industrial applications Provides all you want to know in this fast developing application of membranes in industrial filtration and water purification Applications of membranes - summary of the existing applications and proposed new applications; review and critical analysis of the data on currently available OSN membranes. The benefit of this feature to the users is outlined in the comment of one referee: "I use these types of books as an instant reference, resource and fact checker when I am writing or researching topics in membrane technology. I also read the content carefully to keep myself at the state-of-the-art in the technology. R&D is an expensive and time consuming endeavor so anything learned from the literature is valuable when it helps to guide my efforts". Contains a large number of diagrams /figures (60 approx) which offer graphical explanations of the processes and the mechanisms underlying the processess provides practical and easy to understand examples of practical applications. The user can easily adapt these to his/her specific application Worked examples 15 (approx) Guide the reader through the various parameters, and show the reader the effect of these parameters in the overall design of the process Includes multimedia content, videos and active tables and diagrams Enable the user to add his/her own data and conditions and get results relevant to his/her situation. Tables (25 approx) Provides review and critical analysis of the data on currently available OSN membranes Glossary Summary of the main terms used in OSN
Postharvest Handling
Author: Nigel H. Banks
Publisher: Academic Press
ISBN: 0080920780
Category : Technology & Engineering
Languages : en
Pages : 637
Book Description
Consideration of the interactions between decisions made at one point in the supply chain and its effects on the subsequent stages is the core concept of a systems approach. Postharvest Handling is unique in its application of this systems approach to the handling of fruits and vegetables, exploring multiple aspects of this important process through chapters written by experts from a variety of backgrounds.Newly updated and revised, this second edition includes coverage of the logistics of fresh produce from multiple perspectives, postharvest handing under varying weather conditions, quality control, changes in consumer eating habits and other factors key to successful postharvest handling.The ideal book for understanding the economic as well as physical impacts of postharvest handling decisions.Key Features:*Features contributions from leading experts providing a variety of perspectives*Updated with 12 new chapters*Focuses on application-based information for practical implementation*System approach is unique in the handling of fruits and vegetables
Publisher: Academic Press
ISBN: 0080920780
Category : Technology & Engineering
Languages : en
Pages : 637
Book Description
Consideration of the interactions between decisions made at one point in the supply chain and its effects on the subsequent stages is the core concept of a systems approach. Postharvest Handling is unique in its application of this systems approach to the handling of fruits and vegetables, exploring multiple aspects of this important process through chapters written by experts from a variety of backgrounds.Newly updated and revised, this second edition includes coverage of the logistics of fresh produce from multiple perspectives, postharvest handing under varying weather conditions, quality control, changes in consumer eating habits and other factors key to successful postharvest handling.The ideal book for understanding the economic as well as physical impacts of postharvest handling decisions.Key Features:*Features contributions from leading experts providing a variety of perspectives*Updated with 12 new chapters*Focuses on application-based information for practical implementation*System approach is unique in the handling of fruits and vegetables