Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1002
Book Description
Scientific and Technical Aerospace Reports
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1002
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1002
Book Description
Modern Developments in Vacuum Electron Sources
Author: Georg Gaertner
Publisher: Springer Nature
ISBN: 3030472914
Category : Technology & Engineering
Languages : en
Pages : 609
Book Description
This book gives an overview of modern cathodes and electron emitters for vacuum tubes and vacuum electron devices in general. It covers the latest developments in field emission theory as well as new methods towards improving thermionic and cold cathodes. It addresses thermionic cathodes, such as oxide cathodes, impregnated and scandate cathodes, as well as photocathodes and field emitters – the latter comprising carbon nanotubes, graphene and Spindt-type emitter arrays. Despite the rise and fall of the once dominant types of vacuum tubes, such as radio valves and cathode ray tubes, cathodes are continually being improved upon as new applications with increased demands arise, for example in electron beam lithography, high-power and high-frequency microwave tubes, terahertz imaging and electron sources for accelerators. Written by 17 experts in the field, the book presents the latest developments in cathodes needed for these applications, discussing the state of the art and addressing future trends.
Publisher: Springer Nature
ISBN: 3030472914
Category : Technology & Engineering
Languages : en
Pages : 609
Book Description
This book gives an overview of modern cathodes and electron emitters for vacuum tubes and vacuum electron devices in general. It covers the latest developments in field emission theory as well as new methods towards improving thermionic and cold cathodes. It addresses thermionic cathodes, such as oxide cathodes, impregnated and scandate cathodes, as well as photocathodes and field emitters – the latter comprising carbon nanotubes, graphene and Spindt-type emitter arrays. Despite the rise and fall of the once dominant types of vacuum tubes, such as radio valves and cathode ray tubes, cathodes are continually being improved upon as new applications with increased demands arise, for example in electron beam lithography, high-power and high-frequency microwave tubes, terahertz imaging and electron sources for accelerators. Written by 17 experts in the field, the book presents the latest developments in cathodes needed for these applications, discussing the state of the art and addressing future trends.
Solid-State Photoemission and Related Methods
Author: Wolfgang Schattke
Publisher: John Wiley & Sons
ISBN: 3527621008
Category : Science
Languages : en
Pages : 515
Book Description
Photoemission is one of the principal techniques for the characterization and investigation of condensed matter systems. The field has experienced many developments in recent years, which may also be put down to important achievements in closely related areas. This timely and up-to-date handbook is written by experts in the field who provide the background needed by both experimentalists and theorists. It represents an interesting framework for showing the connection between theory and experiment by bringing together different concepts in the investigation of the properties of materials. The work addresses the geometric and electronic structure of solid surfaces and interfaces, theoretical methods for direct computation of spectra, experimental techniques for data acquisition, and physical models for direct data interpretation. It also includes such recent developments as full hemisphere acceptance in photoemission, two-electron photoemission, (e, 2e) electron diffraction, and photoelectron-electron/hole interaction.
Publisher: John Wiley & Sons
ISBN: 3527621008
Category : Science
Languages : en
Pages : 515
Book Description
Photoemission is one of the principal techniques for the characterization and investigation of condensed matter systems. The field has experienced many developments in recent years, which may also be put down to important achievements in closely related areas. This timely and up-to-date handbook is written by experts in the field who provide the background needed by both experimentalists and theorists. It represents an interesting framework for showing the connection between theory and experiment by bringing together different concepts in the investigation of the properties of materials. The work addresses the geometric and electronic structure of solid surfaces and interfaces, theoretical methods for direct computation of spectra, experimental techniques for data acquisition, and physical models for direct data interpretation. It also includes such recent developments as full hemisphere acceptance in photoemission, two-electron photoemission, (e, 2e) electron diffraction, and photoelectron-electron/hole interaction.
Iron-Based Superconducting Thin Films
Author: Silvia Haindl
Publisher: Springer Nature
ISBN: 3030751325
Category : Technology & Engineering
Languages : en
Pages : 403
Book Description
This book provides a modern introduction to the growth, characterization, and physics of iron-based superconducting thin films. Iron pnictide and iron chalcogenide compounds have become intensively studied key materials in condensed matter physics due to their potential for high temperature superconductivity. With maximum critical temperatures of around 60 K, the new superconductors rank first after the celebrated cuprates, and the latest announcements on ultrathin films promise even more. Thin film synthesis of these superconductors began in 2008 immediately after their discovery, and this growing research area has seen remarkable progress up to the present day, especially with regard to the iron chalcogenides FeSe and FeSe1-xTex, the iron pnictide BaFe2-xCoxAs2 and iron-oxyarsenides. This essential volume provides comprehensive, state-of-the-art coverage of iron-based superconducting thin films in topical chapters with detailed information on thin film synthesis and growth, analytical film characterization, interfaces, and various aspects on physics and materials properties. Current efforts towards technological applications and functional films are outlined and discussed. The development and latest results for monolayer FeSe films are also presented. This book serves as a key reference for students, lecturers, industry engineers, and academic researchers who would like to gain an overview of this complex and growing research area.
Publisher: Springer Nature
ISBN: 3030751325
Category : Technology & Engineering
Languages : en
Pages : 403
Book Description
This book provides a modern introduction to the growth, characterization, and physics of iron-based superconducting thin films. Iron pnictide and iron chalcogenide compounds have become intensively studied key materials in condensed matter physics due to their potential for high temperature superconductivity. With maximum critical temperatures of around 60 K, the new superconductors rank first after the celebrated cuprates, and the latest announcements on ultrathin films promise even more. Thin film synthesis of these superconductors began in 2008 immediately after their discovery, and this growing research area has seen remarkable progress up to the present day, especially with regard to the iron chalcogenides FeSe and FeSe1-xTex, the iron pnictide BaFe2-xCoxAs2 and iron-oxyarsenides. This essential volume provides comprehensive, state-of-the-art coverage of iron-based superconducting thin films in topical chapters with detailed information on thin film synthesis and growth, analytical film characterization, interfaces, and various aspects on physics and materials properties. Current efforts towards technological applications and functional films are outlined and discussed. The development and latest results for monolayer FeSe films are also presented. This book serves as a key reference for students, lecturers, industry engineers, and academic researchers who would like to gain an overview of this complex and growing research area.
In Situ Characterization of Thin Film Growth
Author: Gertjan Koster
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 295
Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. - Chapters review electron diffraction techniques, including the methodology for observations and measurements - Discusses the principles and applications of photoemission techniques - Examines alternative in situ characterisation techniques
Publisher: Elsevier
ISBN: 0857094955
Category : Technology & Engineering
Languages : en
Pages : 295
Book Description
Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research.Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth.With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. - Chapters review electron diffraction techniques, including the methodology for observations and measurements - Discusses the principles and applications of photoemission techniques - Examines alternative in situ characterisation techniques
High-k Gate Dielectrics for CMOS Technology
Author: Gang He
Publisher: John Wiley & Sons
ISBN: 3527646361
Category : Technology & Engineering
Languages : en
Pages : 560
Book Description
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
Publisher: John Wiley & Sons
ISBN: 3527646361
Category : Technology & Engineering
Languages : en
Pages : 560
Book Description
A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
High Tc Superconductor Thin Films
Author: L. Correra
Publisher: Elsevier
ISBN: 0444600256
Category : Technology & Engineering
Languages : en
Pages : 908
Book Description
Interdisciplinary research on superconducting oxides is the main focus of the contributions in this volume. Several aspects of the thin film field from fundamental properties to applications are examined. Interesting results for the Bi system are also reviewed. The 132 papers, including 8 invited, report mainly on the 1-2-3 system, indicating that the Y-Ba-Cu-O and related compounds are still the most intensively studied materials in this field. The volume attests to the significant progress that has been made in this field, as well as reporting on the challenging problems that still remain to be solved.
Publisher: Elsevier
ISBN: 0444600256
Category : Technology & Engineering
Languages : en
Pages : 908
Book Description
Interdisciplinary research on superconducting oxides is the main focus of the contributions in this volume. Several aspects of the thin film field from fundamental properties to applications are examined. Interesting results for the Bi system are also reviewed. The 132 papers, including 8 invited, report mainly on the 1-2-3 system, indicating that the Y-Ba-Cu-O and related compounds are still the most intensively studied materials in this field. The volume attests to the significant progress that has been made in this field, as well as reporting on the challenging problems that still remain to be solved.
Applications of Laser Ablation
Author: Dongfang Yang
Publisher: BoD – Books on Demand
ISBN: 9535128116
Category : Technology & Engineering
Languages : en
Pages : 430
Book Description
Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.
Publisher: BoD – Books on Demand
ISBN: 9535128116
Category : Technology & Engineering
Languages : en
Pages : 430
Book Description
Laser ablation refers to the phenomenon in which a low wavelength and short pulse (ns-fs) duration of laser beam irradiates the surface of a target to induce instant local vaporization of the target material generating a plasma plume consisting of photons, electrons, ions, atoms, molecules, clusters, and liquid or solid particles. This book covers various aspects of using laser ablation phenomenon for material processing including laser ablation applied for the deposition of thin films, for the synthesis of nanomaterials, and for the chemical compositional analysis and surface modification of materials. Through the 18 chapters written by experts from international scientific community, the reader will have access to the most recent research and development findings on laser ablation through original research studies and literature reviews.
Energy Research Abstracts
Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 366
Book Description
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 366
Book Description
Infrared Antireflective and Protective Coatings
Author: Jiaqi Zhu
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 3110489511
Category : Technology & Engineering
Languages : en
Pages : 504
Book Description
This book is a comprehensive introduction on infrared anti-transparent materials and their applications in anti-reflective and protective coatings. Optical, mechanical and thermal properties and preparations of various kinds of films, such as amorphous diamond films, germanium carbide films, boron phosphide films, alumina films and yttrium oxide film are discussed in detail making it suitable for material scientists and industrial engineers.
Publisher: Walter de Gruyter GmbH & Co KG
ISBN: 3110489511
Category : Technology & Engineering
Languages : en
Pages : 504
Book Description
This book is a comprehensive introduction on infrared anti-transparent materials and their applications in anti-reflective and protective coatings. Optical, mechanical and thermal properties and preparations of various kinds of films, such as amorphous diamond films, germanium carbide films, boron phosphide films, alumina films and yttrium oxide film are discussed in detail making it suitable for material scientists and industrial engineers.