Optical Characterization of Low-Scatter, Plasma-Deposited Thin Films PDF Download
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Author: JM. Bennett
Publisher:
ISBN:
Category : Laser beams
Languages : en
Pages : 9
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Book Description
Plasma-deposited thin films, sometimes called plasma CVD or plasma-enhanced CVD, are deposited in a low pressure gas phase reaction that is controlled by a glow discharge plasma. Substrate temperatures of 200 - 300°C, low compared to conventional CVD processes, are typical for plasma-coating processes. This new coating method has wide possible applications in the optics area. In this paper we will describe studies that have been made to determine if the films are suitable for critical optical applications requiring highly uniform, low-scatter films that, for example, could be used as mirror coatings or as graded index antireflection coatings. We have evaluated the surface quality of SiO2 and Si3N4 films approximately 1000 Å thick, plasma-deposited onto silicon and silicon carbide substrates. Evaluation techniques have included surface profiling using a Talystep instrument, Nomarski microscopy, and total integrated scattering. In all cases, comparisons have been made between the coated and uncoated substrates. The best Si3N4 films have been found to contour the very smooth surfaces onto which they were deposited, while the SiO2 films added only a minimal additional roughness, of the order of 2.8 Å rms. Some problems have been encountered, however, with particulates contained in the films; techniques for minimizing these effects will be discussed.
Author: JM. Bennett
Publisher:
ISBN:
Category : Laser beams
Languages : en
Pages : 9
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Book Description
Plasma-deposited thin films, sometimes called plasma CVD or plasma-enhanced CVD, are deposited in a low pressure gas phase reaction that is controlled by a glow discharge plasma. Substrate temperatures of 200 - 300°C, low compared to conventional CVD processes, are typical for plasma-coating processes. This new coating method has wide possible applications in the optics area. In this paper we will describe studies that have been made to determine if the films are suitable for critical optical applications requiring highly uniform, low-scatter films that, for example, could be used as mirror coatings or as graded index antireflection coatings. We have evaluated the surface quality of SiO2 and Si3N4 films approximately 1000 Å thick, plasma-deposited onto silicon and silicon carbide substrates. Evaluation techniques have included surface profiling using a Talystep instrument, Nomarski microscopy, and total integrated scattering. In all cases, comparisons have been made between the coated and uncoated substrates. The best Si3N4 films have been found to contour the very smooth surfaces onto which they were deposited, while the SiO2 films added only a minimal additional roughness, of the order of 2.8 Å rms. Some problems have been encountered, however, with particulates contained in the films; techniques for minimizing these effects will be discussed.
Author:
Publisher: ASTM International
ISBN:
Category :
Languages : en
Pages : 586
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Book Description
Author: Harold Earl Bennett
Publisher: ASTM International
ISBN:
Category : Laser materials
Languages : en
Pages : 586
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Book Description
Author: Orlando Auciello
Publisher: John Wiley & Sons
ISBN: 9780471241416
Category : Science
Languages : en
Pages : 282
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Book Description
An in-depth look at the state of the art of in situ real-time monitoring and analysis of thin films With thin film deposition becoming increasingly critical in the production of advanced electronic and optical devices, scientists and engineers working in this area are looking for in situ, real-time, structure-specific analytical tools for characterizing phenomena occurring at surfaces and interfaces during thin film growth. This volume brings together contributed chapters from experts in the field, covering proven methods for in situ real-time analysis of technologically important materials such as multicomponent oxides in different environments. Background information and extensive references to the current literature are also provided. Readers will gain a thorough understanding of the growth processes and become acquainted with both emerging and more established methods that can be adapted for in situ characterization. Methods and their most useful applications include: * Low-energy time-of-flight ion scattering and direct recoil spectroscopy (TOF-ISRAS) for studying multicomponent oxide film growth processes * Reflection high-energy electron diffraction (RHEED) for determining the nature of chemical reactions at film surfaces * Spectrometric ellipsometry (SE) for use in the analysis of semiconductors and other multicomponent materials * Reflectance spectroscopy and transmission electron microscopy for monitoring epitaxial growth processes * X-ray fluorescence spectroscopy for studying surface and interface structures * And other cost-effective techniques for industrial application
Author:
Publisher:
ISBN:
Category : Ion Implantation
Languages : en
Pages : 588
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Book Description
Author:
Publisher:
ISBN:
Category : Laser materials
Languages : en
Pages : 424
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Book Description
Author: Mitsuharu Konuma
Publisher: Springer Science & Business Media
ISBN: 3642845118
Category : Science
Languages : en
Pages : 234
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Book Description
Properties of thin films depend strongly upon the deposition technique and conditions chosen. In order to achieve the desired film, optimum deposition conditions have to be found by carrying out experiments in a trial-and error fashion with varying parameters. The data obtained on one growth apparatus are often not transferable to another. This is especially true for film deposition processes using a cold plasma because of our poor under standing of the mechanisms. Relatively precise studies have been carried out on the role that physical effects play in film formation such as sputter deposition. However, there are many open questions regarding processes that involve chemical reactions, for example, reactive sputter deposition or plasma enhanced chemical vapor deposition. Much further research is re quired in order to understand the fundamental deposition processes. A sys tematic collection of basic data, some of which may be readily available in other branches of science, for example, reaction cross sections for gases with energetic electrons, is also required. The need for pfasma deposition techniques is felt strongly in industrial applications because these techniques are superior to traditional thin-film deposition techniques in many ways. In fact, plasma deposition techniques have developed rapidly in the semiconductor and electronics industries. Fields of possible application are still expanding. A reliable plasma reactor with an adequate in situ system for monitoring the deposition conditions and film properties must be developed to improve reproducibility and pro ductivity at the industrial level.
Author:
Publisher:
ISBN:
Category : Laser beams
Languages : en
Pages : 580
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Book Description
Author: Mort
Publisher: CRC Press
ISBN: 1351084267
Category : Technology & Engineering
Languages : en
Pages : 253
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Book Description
In Summary, the objective of this book is to present in one volume a review of the plasma deposition process and the present understanding of the most important and widely used plasma deposited thin film materials, devices and their applications.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
